Additions and Modifications to the Entity List; Removals From the Validated End-User (VEU) Program, 96830-96854 [2024-28267]
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Special Conditions for STA
DEPARTMENT OF COMMERCE
STA: License Exception STA may not be
used to ship or transmit ‘‘technology’’
specified in this ECCN to any of the
destinations listed in Country Group A:5 or
A:6 (see supplement no. 1 to part 740 of
the EAR).
List of Items Controlled
*
*
*
*
3E994 ‘‘Technology’’ for the
‘‘development’’ or ‘‘production’’ of
commodities specified in 3B994 and
‘‘technology’’ as follows (see List of
Items Controlled).
License Requirements
Reason for Control: RS, AT
Country chart
(see Supp. No. 1
to part 738)
Control(s)
RS applies to entire
entry.
AT applies to entire
entry.
See § 742.6(a)(11) of
the EAR.
AT Column 1.
List Based License Exceptions (See Part 740
for a Description of All License Exceptions)
TSR: N/A
Special Conditions for STA
STA: License Exception STA may not be
used to ship or transmit ‘‘technology’’
specified in this ECCN to any of the
destinations listed in Country Group A:5 or
A:6 (see supplement no. 1 to part 740 of
the EAR).
List of Items Controlled
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Related Controls: For additional controls that
apply to this ECCN, see also
§ 744.11(a)(2)(v) and (a)(3) and
§ 744.23(a)(4)(iii) of the EAR.
Related Definitions: N/A
Items: The list of items controlled is
contained in the ECCN heading.
*
*
*
*
*
Matthew S. Borman,
Principal Deputy Assistant Secretary for
Strategic Trade and Technology Security.
[FR Doc. 2024–28270 Filed 12–2–24; 8:45 am]
BILLING CODE 3510–33–P
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15 CFR Parts 744 and 748
[Docket No. 241126–0303]
RIN 0694–AJ77
Related Controls: For additional controls that
apply to this ECCN, see also
§ 744.11(a)(2)(v) and (a)(3) and
§ 744.23(a)(4)(iii) of the EAR.
Related Definitions: N/A
Items:
a. ‘‘Technology’’ for the ‘‘development’’ or
‘‘production’’ of commodities specified by
3B993.
b. ‘‘Technology’’ designed or modified to
increase the number of wafers processed per
hour, averaged over any time interval, by
greater than 1%, of equipment specified in
3B001.f.1 or 3B993.f.1.
*
Bureau of Industry and Security
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Additions and Modifications to the
Entity List; Removals From the
Validated End-User (VEU) Program
Bureau of Industry and
Security, Commerce.
ACTION: Final rule.
AGENCY:
In this final rule, the Bureau
of Industry and Security (BIS) amends
the Export Administration Regulations
(EAR) by adding 140 entities to the
Entity List. These entries are listed on
the Entity List under the destinations of
China, People’s Republic of (China),
Japan, South Korea, and Singapore and
have been determined by the U.S.
Government to be acting contrary to the
national security and foreign policy
interests of the United States. This final
rule also modifies 14 existing entries on
the Entity List, consisting of revisions to
14 entries under China. This final rule
publishes concurrently with BIS’s
interim final rule, ‘‘Foreign-Produced
Direct Product Rule Additions, and
Refinements to Controls for Advanced
Computing and Semiconductor
Manufacturing Items’’ (0694–AJ74),
which makes additional changes to the
EAR controls on advanced computing
items and semiconductor manufacturing
items. This final rule is part of this
larger effort to ensure that appropriate
EAR controls are in place on these
items, including in connection with
transactions destined to or otherwise
involving the entities being added to the
Entity List, as well as for existing entries
on the Entity List that are being
modified. All of these entities (those
newly added and those being modified)
are involved with the development and
production of ‘‘advanced-node
integrated circuits’’ (‘‘advanced-node
ICs’’) and/or semiconductor
manufacturing items, and/or have
supported the Chinese government’s
Military-Civil Fusion (MCF)
Development Strategy. Additionally,
this final rule designates nine of these
entities being added and seven of the
entries being modified as entities for
which entity-specific restrictions
involving foreign-produced items apply.
This final rule also amends the EAR by
removing three entities from the
Validated End-User (VEU) Program.
DATES:
SUMMARY:
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Effective date: This rule is effective
December 2, 2024.
Compliance date: The changes being
made in this final rule that pertain to
Entity List license requirements and
other Entity List-related requirements
linked to Footnote 5 designations have
a compliance date of December 31,
2024.
For
questions on the Entity List and VEU
Program changes in this final rule,
contact Chair, End-User Review
Committee, Office of the Assistant
Secretary for Export Administration,
Bureau of Industry and Security,
Department of Commerce, Phone: (202)
482–5991, Email: ERC@bis.doc.gov.
FOR FURTHER INFORMATION CONTACT:
SUPPLEMENTARY INFORMATION:
I. Background
A. Entity List and End-User Review
Committee (ERC)
The Entity List (supplement no. 4 to
part 744 of the EAR (15 CFR parts 730
through 774)) identifies entities for
which there is reasonable cause to
believe, based on specific and
articulable facts, that the entities have
been involved, are involved, or pose a
significant risk of being or becoming
involved in activities contrary to the
national security or foreign policy
interests of the United States, pursuant
to § 744.11(b). The EAR imposes
additional license requirements on, and
limit the availability of, most license
exceptions for exports, reexports, and
transfers (in-country) when an entity
listed on the Entity List is a party to the
transaction. The license review policy
for each listed entity is identified in the
‘‘License Review Policy’’ column on the
Entity List, and the impact on the
availability of license exceptions is
described in the relevant Federal
Register document that added the entity
to the Entity List. BIS places entities on
the Entity List pursuant to parts 744
(Control Policy: End-User and End-Use
Based) and 746 (Embargoes and Other
Special Controls) of the EAR.
The ERC, composed of representatives
of the Departments of Commerce
(Chair), State, Defense, Energy and,
where appropriate, the Treasury, makes
all decisions regarding additions to,
removals from, or other modifications to
the Entity List. The ERC makes all
decisions to add an entry to the Entity
List by majority vote and makes all
decisions to remove or modify an entry
by unanimous vote.
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Federal Register / Vol. 89, No. 234 / Thursday, December 5, 2024 / Rules and Regulations
B. Addressing National Security and
Foreign Policy Concerns Involving
Advanced Computing and
Semiconductor Manufacturing Items
This final rule is published
concurrently with the interim final rule,
‘‘Foreign-Produced Direct Product Rule
Additions, and Refinements to Controls
for Advanced Computing and
Semiconductor Manufacturing Items’’
(0694–AJ74) (FDP IFR), which makes
additional changes to the EAR controls
on advanced computing items or
semiconductor manufacturing items,
including new Foreign Direct Product
(FDP) rules for certain commodities to
impair the capability of certain
destinations or entities of concern to
produce ‘‘advanced-node ICs.’’ This
final rule is part of the larger effort
reflected in the FDP IFR to ensure
appropriate EAR controls are in place
on advanced computing items and
semiconductor manufacturing items,
including in connection with the
entities being added to the Entity List,
as well as for existing Entity List entries
that are being modified. All of these
entities, both those being added and
those whose entries are being modified,
are involved with the development and
production of these ‘‘advanced-node
ICs’’ and/or semiconductor
manufacturing items, and/or have
supported the Chinese government’s
MCF Development Strategy, activities
that have been determined to be
contrary to U.S. national security and
foreign policy interests. The FDP IFR
also adds one new FDP rule to § 734.9
(Foreign-Direct Product Rules) that will
be set forth in paragraph (e)(3) (Entity
List FDP rule: Footnote 5). BIS has
designated nine of the 140 entities being
added to the Entity List in this rule with
a Footnote 5, which extends the Entity
List license requirements to foreign
direct products subject to the EAR on
the basis of § 734.9(e)(3). Foreign-made
items specified in certain ECCNs that
are destined to an entity with a Footnote
5 designation may also be subject to the
EAR on the basis of the de minimis
provision described in § 734.4(a)(9).
Entities designated with a Footnote 5
designation have been determined by
the ERC to be involved in, or risk
becoming involved in, the development
or production of ‘‘advance-node ICs’’
that would otherwise require a license
under § 744.23(a)(2). Section
744.23(a)(2) imposes a license
requirement for any item subject to the
EAR when you know the items will be
used in the ‘‘development’’ or
‘‘production’’ of ICs destined to a
‘‘facility’’ located in Macau or a
destination specified in Country Group
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D:5 where ‘‘production’’ of ‘‘advancednode ICs’’ occurs.
II. Entity List Decisions
A. Additions to the Entity List
The ERC determined to add the
following 106 entities to the Entity List:
ACM Research (Shanghai); Beijing ETown Semiconductor Technology Co.,
Ltd.; Beijing Guowei Integration
Technology Co., Ltd.; Beijing Huada
Jiutian Technology Co., Ltd.; Beijing
Kaishitong Semiconductor Co., Ltd.;
Beijing Naura Microelectronics
Equipment Co., Ltd.; Beijing Naura
Semiconductor Equipment Co., Ltd.;
Beijing Sevenstar Flowmeter Co., Ltd.;
Beijing Sevenstar Integrated Circuit
Equipment Co., Ltd.; Beijing Shuoke
Zhongkexin Electronic Equipment Co.,
Ltd.; Beijing Skyverse Technology Co.,
Ltd.; Beijing Zhongke Xin Electronic
Equipment; Changsha Zhichun
Application Technology Co., Ltd.;
Chengdu Huada Jiutianke Technology
Co., Ltd.; Chengdu Skyverse Technology
Co., Ltd.; Guangzhou Huada Jiutian
Technology Co., Ltd.; Guangzhou
Skyverse Technology Co., Ltd.; Guowei
Group (Shenzhen) Co., Ltd.; Hefei
Kaishitong Semiconductor Co., Ltd.;
Hefei Naura Microelectronics
Equipment Co., Ltd.; Hefei Zhihui
Semiconductor Application Technology
Co., Ltd.; Hefei Zhiwei Microelectronics
Co., Ltd.; Hefei Zhiwei Semiconductor
Co., Ltd.; Hwa Tsing (Beijing)
Technology Co., Ltd.; Hwa Tsing
(Guangzhou) Semiconductor Co., Ltd.;
Hwa Tsing (Shanghai) Semiconductor
Co., Ltd.; Hwa Tsing Technology Co.,
Ltd.; Jiangsu Nata Optoelectronic
Material Co., Ltd.; Jiangsu Qiwei
Semiconductor Equipment Co., Ltd.;
Jiangsu Zhichun System Integration Co.,
Ltd.; Kingstone Technology Hong Kong
Limited; Nanda Optoelectronic
Semiconductor Materials Co., Ltd.;
Nanjing Huada Jiutianke Technology
Co., Ltd.; Naura Technology Group Co.,
Ltd.; Ningbo Nanda Optoelectronic
Materials Ltd.; Piotech; Piotech (Beijing)
Co., Ltd.; Piotech (Shanghai) Co., Ltd.;
Piotech Chuangyi (Shenyang)
Semiconductor Equipment Co., Ltd.;
Piotech Jianke (Haining) Semiconductor
Equipment Co., Ltd.; Qingxin
Technology Co., Ltd.; Quanjiao Nanda
Optoelectronic Materials Ltd.; Raintree
Scientific Instruments (Shanghai)
Corporation; Ruili Microelectronics
Equipment (Shanghai) Co., Ltd.;
Shandong Feiyuan Gas Co., Ltd.;
Shanghai AGM Gas Co., Ltd.; Shanghai
Aipusi Precision Equipment Co., Ltd.;
Shanghai Huada Jiutian Information
Technology Co., Ltd.; Shanghai Jingce
Semiconductor Technology Co., Ltd.;
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Shanghai Jingzhuo Information
Technology Co., Ltd.; Shanghai
Kaishitong Semiconductor Co., Ltd.;
Shanghai Lingang Kaishitong
Semiconductor Co., Ltd.; Shanghai Lizhi
Technology Co., Ltd.; Shanghai Modern
Advanced Ultra-Precision
Manufacturing Center Co., Ltd.;
Shanghai Nanpre Mechanics Co., Ltd.;
Shanghai Naura Microelectronics
Equipment Co., Ltd.; Shanghai Siwave
Technology Co., Ltd.; Shanghai
Skyverse Semiconductor Technology
Co., Ltd.; Shanghai Xinsheng Jingrui
Semiconductor Technology Co., Ltd.;
Shanghai Xinsheng Jingtou
Semiconductor Technology Co., Ltd.;
Shanghai Xinsheng Jinko
Semiconductor Technology Co., Ltd.;
Shanghai Xinsheng Semiconductor
Technology Co., Ltd.; Shanghai
Yanquan Technology Co., Ltd.;
Shanghai Yuwei Semiconductor
Technology Co., Ltd; Shanghai Zhichun
Alloy Manufacturing Co., Ltd.; Shanghai
Zhichun Electronic Technology Co.,
Ltd.; Shanghai Zhichun Optoelectronic
Equipment Co., Ltd.; Shanghai Zhichun
Precision Gas Co., Ltd.; Shanghai
Zhichun Precision Manufacturing Co.,
Ltd.; Shanghai Zhichun Purification
System Technology Co., Ltd.; Shanghai
Zhichun Semiconductor Equipment Co.,
Ltd; Shanghai Zhichun System
Integration Co., Ltd.; Shanghai Zhijia
Semiconductor Gas Co., Ltd.; Shanghai
Zixi Optical Technology Co., Ltd.;
Shengmei Semiconductor Equipment
(Beijing) Co., Ltd.; Shengmei
Semiconductor Equipment Wuxi Co.,
Ltd.; Shengwei Semiconductor
Equipment (Shanghai) Co., Ltd.;
Shenyang Xinyuan Micro Business
Development Co., Ltd.; Shenyang
Xinyuan Microelectronic Equipment
Co., Ltd.; Shenzhen Guowei Hongbo
Technology Co., Ltd.; Shenzhen Guowei
Sensing Technology Co., Ltd.; Shenzhen
Guoweichip Technology Co., Ltd.;
Shenzhen Huada Jiutianke Technology
Co., Ltd.; Shenzhen Naura
Microelectronics Equipment Co., Ltd.;
Shenzhen Qianhai Skyverse
Semiconductor Technology Co., Ltd.;
Skyverse; Skyverse Limited; Suzhou
Nanda Optoelectronic Materials Co.,
Ltd.; Taiyuan Jinke Semiconductor
Technology Co., Ltd.; Ulanqab Nanda
Microelectronics Materials Co., Ltd.;
Wuhan Naura Microelectronics
Equipment Co., Ltd.; Wuhan Skyverse
Semiconductor Technology Co., Ltd.;
Wuhan Yiguang Technology Co., Ltd.;
Wuxi Kaishitong Technology Co., Ltd.;
Wuxi Naura Microelectronics
Equipment Co., Ltd.; Xiamen Skyverse
Technology Co., Ltd.; Xi’an Huada
Jiutian Technology Co., Ltd.; Xi’an
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Naura Microelectronics Equipment Co.,
Ltd.; Yusheng Micro Semiconductor
(Shanghai) Co., Ltd.; Yuwei
Semiconductor Technology Co., Ltd.;
Zhejiang Shenqihang Technology Co.,
Ltd.; Zhejiang Zhichun Precision
Manufacturing Co., Ltd.; Zhiwei
Semiconductor (Shanghai) Co., Ltd.;
Zhiyi High Purity Electronic Materials
(Shanghai) Ltd.; Zhuhai Skyverse
Technology Co., Ltd.; and Zibo
Keyuanxin Fluorine Trading Ltd. under
the destination of China. The ERC
determined to add Kingsemi Japan K.K.
under the destination of Japan. The ERC
determined to add Skyverse Pte. Ltd.
under the destination of Singapore. The
ERC determined to add ACM Research
Korea Co., Ltd. and Empyrean Korea
under the destination of South Korea.
These entities aid in the development or
production of ICs for military end use,
activity that is contrary to the national
security and foreign policy interests of
the United States under § 744.11 of the
EAR. A license will be required for all
items subject to the EAR, and a license
application review policy of a
presumption of denial will apply.
The ERC also determined to add
Shanghai Integrated Circuit Equipment
& Materials Industry Innovation Center
Co., Ltd. and Zhangjiang Laboratory,
both under the destination of China, to
the Entity List, with a Footnote 5
designation. These entities aid in the
development or production of ICs for
military end use and are involved in the
development or production of
‘‘advanced-node ICs,’’ activity that is
contrary to the national security and
foreign policy interests of the United
States under §§ 744.11 and 744.23 of the
EAR. A license will be required for all
items subject to the EAR, including
those specified under § 734.9(e)(3),
which require a license under
§ 744.11(a)(2)(v) (Footnote 5). The
license application review policy is a
presumption of denial.
The ERC determined to add Northern
Integrated Circuit Technology
Innovation Center (Beijing) Co., Ltd.,
and SMIC Advanced Technology R&D
(Shanghai) Corporation, both under the
destination of China, to the Entity List
with a Footnote 5 designation. These
entities have acquired or attempted to
acquire U.S. tools or components, which
risk supporting the production of
‘‘advanced-node ICs’’ at facilities of
entities that are on the Entity List. This
activity is contrary to the national
security and foreign policy interests of
the United States under §§ 744.11 and
744.23 of the EAR. A license will be
required for all items subject to the EAR.
Notably, this requirement applies to
items specified under § 734.9(e)(3),
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which require a license under
§ 744.11(a)(2)(v). A license review
policy of presumption of denial will
apply.
The ERC determined to add
Changguang Jizhi Optical Technology
Co., Ltd.; Shanghai Feiai Technology
Co., Ltd.; Shanghai Yuliangsheng
Technology Co., Ltd.; Shenzhen
Pengxinxu Technology Co., Ltd.;
Shenzhen SiCarrier Technologies Co.,
Ltd.; Shenzhen Xinkailai Industrial
Machinery Co., Ltd.; Shenzhen Zhangge
Instrument Co., Ltd.; Si’En Qingdao Co.
Ltd.; SwaySure Technology Co., Ltd.;
and Zhuhai Cornerstone Technology
Co., Ltd., all under the destination of
China, to the Entity List because they
are, or pose a significant risk of
becoming, involved in activities
contrary to the national security or
foreign policy interests of the United
States. Specifically, these entities pose a
significant risk of contributing to the
efforts of Huawei Technologies Co.,
Ltd., a party on the Entity List, to
support China’s government’s goal of
indigenous production of ‘‘advancednode ICs’’ to support its military
modernization. This significant risk is a
criterion for adding entities to the Entity
List under § 744.11(b) of the EAR. For
Shenzhen Pengxinxu Technology Co.,
Ltd., Si’En Qingdao Co. Ltd., and
SwaySure Technology Co., Ltd., a
license will be required for all items
subject to the EAR, including those
specified under § 734.9(e)(3), which
require a license under § 744.11(a)(2)(v)
(Footnote 5). For Shenzhen Pengxinxu
Technology Co., Ltd. and SwaySure
Technology Co., Ltd., the license
application review policy is a
presumption of denial, except case-bycase for review for applications
involving items not described in ECCN
3B001.a.4, .c, .d, f.1.b.2, .k to .p;
3B002.c, 3B993, or 3B994. For Si’En
Qingdao Co. Ltd., the license
application review policy is a
presumption of denial. For Changguang
Jizhi Optical Technology Co., Ltd.,
Shanghai Feiai Technology Co., Ltd.,
Shanghai Yuliangsheng Technology Co.,
Ltd., Shenzhen SiCarrier Technologies
Co., Ltd., Shenzhen Xinkailai Industrial
Machinery Co., Ltd., Shenzhen Zhangge
Instrument Co., Ltd., and Zhuhai
Cornerstone Technology Co., Ltd., a
license will be required for all items
subject to the EAR. The license
application review policy will be a
presumption of denial.
The ERC determined to add Wuhan
Xinxin Semiconductor Manufacturing
Company Limited, under the
destination of China, to the Entity List
with a Footnote 5 designation, for
posing a significant risk of becoming
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involved in activities contrary to the
national security and foreign policy
interests of the United States under
§§ 744.11 and 744.23 of the EAR. This
determination is based on information
that this company poses a significant
risk of becoming involved in the
development or production of
‘‘advanced-node ICs.’’ A license will be
required for all items subject to the EAR,
including those specified under
§ 734.9(e)(3), which require a license
under § 744.11(a)(2)(v) (Footnote 5). The
license review standards set forth in
§§ 744.11 and 744.23(d) will apply. This
entity will be eligible for license
exception Restricted Fabrication Facility
(RFF) (§ 740.26), a new license
exception added to part 740 (License
Exceptions) of the EAR pursuant to the
FDP IFR published concurrently with
this final rule. License Exception RFF
authorizes the export, reexport, and incountry transfer of items described in
ECCNs 3B991 (except 3B991.b.2.a
through .b) and 3B992 that are not
described in ECCN 3B001.a.4, .c, .d,
f.1.b.2, .k to .p; 3B002.c, 3B993, or
3B994, subject to the requirements of
§ 740.26.
The ERC determined to add JAC
Capital, Wingtech Technology Co., Ltd.,
and Wise Road Capital under the
destination of China to the Entity List.
These additions are being made because
of these entities’ involvement in aiding
China’s government’s efforts to acquire
entities with sensitive semiconductor
manufacturing capability critical to the
defense industrial bases of the United
States and its allies with the objective of
relocating these entities to China to help
indigenize a semiconductor
manufacturing ecosystem. This activity
is contrary to the national security and
foreign policy interests of the United
States under § 744.11 of the EAR. A
license will be required for all items
subject to the EAR, and a license review
policy of a presumption of denial will
apply.
The ERC determined to add Beijing
Guangke Xintu Technology Co., Ltd.;
Beijing Jingyuan Microelectronics
Technology Co., Ltd.; Dongfang
Jingyuan Electron Co., Ltd.; Oriental
Crystal Microelectronics Technology
(Qingdao) Co., Ltd.; Oriental Crystal
Microelectronics Technology (Shanghai)
Co., Ltd.; Shenzhen Jingyuan
Information Technology Co., Ltd.; and
Xinlian Rongchuang Integrated Circuit
Industry Development (Beijing) Co., Ltd.
under the destination of China to the
Entity List for activities contrary to the
national security and foreign policy
interests of the United States under
§ 744.11 of the EAR. Specifically, these
entities are co-developing lithography
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technology with advanced-node
fabrication facilities that produce chips
for military end use. A license will be
required for all items subject to the EAR,
and a license review policy of a
presumption of denial will apply.
The ERC determined to add the
Chinese Academy of Sciences Institute
of Microelectronics to the Entity List
under the destination of China with a
Footnote 5 designation for its support of
China’s ‘‘advanced-node ICs’’ and
military modernization efforts,
including the development or
production of ‘‘advanced-node ICs’’ for
military end use and collaboration with
parties on the Entity List. This activity
is contrary to the national security and
foreign policy interests of the United
States under §§ 744.11 and 744.23 of the
EAR. A license will be required for all
items subject to the EAR, including
those specified under § 734.9(e)(3),
which require a license under
§ 744.11(a)(2)(v) (Footnote 5). A license
review policy of presumption of denial
will apply.
The ERC determined to add AccoTest
Technology Co., Ltd. (Hong Kong),
Beijing Huafeng Electronic Equipment
Co., Ltd., Beijing Huafeng Test & Control
Technology Co., Ltd., and Huafeng Test
& Control Technology (Tianjin) Co.,
Ltd., all under the destination of China,
to the Entity List. These additions are
being made because these entities
present a risk of diversion of U.S.-origin
items to parties on the Entity List,
including entities that play a significant
role in China’s military modernization.
This activity is contrary to the national
security and foreign policy interests of
the United States under § 744.11 of the
EAR. A license will be required for all
items subject to the EAR, and the
license review policy will be a
presumption of denial.
BIS estimates these additions to the
Entity List will result in an additional
200 license applications submitted to
BIS annually.
For the reasons described above, this
final rule adds the following 140 entities
to the Entity List and includes, where
appropriate, aliases:
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China
• AccoTest Technology Co., Ltd.
(Hong Kong);
• ACM Research (Shanghai);
• Beijing E-Town Semiconductor
Technology Co., Ltd.;
• Beijing Guangke Xintu Technology
Co., Ltd.;
• Beijing Guowei Integration
Technology Co., Ltd.;
• Beijing Huada Jiutian Technology
Co., Ltd.;
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• Beijing Huafeng Electronic
Equipment Co., Ltd.;
• Beijing Huafeng Test & Control
Technology Co., Ltd.;
• Beijing Jingyuan Microelectronics
Technology Co., Ltd.;
• Beijing Kaishitong Semiconductor
Co., Ltd.;
• Beijing Naura Microelectronics
Equipment Co., Ltd.;
• Beijing Naura Semiconductor
Equipment Co., Ltd.;
• Beijing Sevenstar Flowmeter Co.,
Ltd.;
• Beijing Sevenstar Integrated Circuit
Equipment Co., Ltd.;
• Beijing Shuoke Zhongkexin
Electronic Equipment Co., Ltd.;
• Beijing Skyverse Technology Co.,
Ltd.;
• Beijing Zhongke Xin Electronic
Equipment;
• Changguang Jizhi Optical
Technology Co., Ltd.;
• Changsha Zhichun Application
Technology Co., Ltd.;
• Chengdu Huada Jiutianke
Technology Co., Ltd.;
• Chengdu Skyverse Technology Co.,
Ltd.;
• Chinese Academy of Sciences
Institute of Microelectronics;
• Dongfang Jingyuan Electron Co.,
Ltd.;
• Guangzhou Huada Jiutian
Technology Co., Ltd.;
• Guangzhou Skyverse Technology
Co., Ltd.;
• Guowei Group (Shenzhen) Co., Ltd.;
• Hefei Kaishitong Semiconductor
Co., Ltd.;
• Hefei Naura Microelectronics
Equipment Co., Ltd.;
• Hefei Zhihui Semiconductor
Application Technology Co., Ltd.;
• Hefei Zhiwei Microelectronics Co.,
Ltd.;
• Hefei Zhiwei Semiconductor Co.,
Ltd.;
• Huafeng Test & Control Technology
(Tianjin) Co., Ltd.;
• Hwa Tsing (Beijing) Technology
Co., Ltd.;
• Hwa Tsing (Guangzhou)
Semiconductor Co., Ltd.;
• Hwa Tsing (Shanghai)
Semiconductor Co., Ltd.;
• Hwa Tsing Technology Co., Ltd.;
• JAC Capital;
• Jiangsu Nata Optoelectronic
Material Co., Ltd.;
• Jiangsu Qiwei Semiconductor
Equipment Co., Ltd.;
• Jiangsu Zhichun System Integration
Co., Ltd.;
• Kingstone Technology Hong Kong
Limited;
• Nanda Optoelectronic
Semiconductor Materials Co., Ltd.;
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• Nanjing Huada Jiutianke
Technology Co., Ltd.;
• Naura Technology Group Co., Ltd.;
• Ningbo Nanda Optoelectronic
Materials Ltd.;
• Northern Integrated Circuit
Technology Innovation Center (Beijing)
Co., Ltd.;
• Oriental Crystal Microelectronics
Technology (Qingdao) Co., Ltd.;
• Oriental Crystal Microelectronics
Technology (Shanghai) Co., Ltd.;
• Piotech;
• Piotech (Beijing) Co., Ltd.;
• Piotech (Shanghai) Co., Ltd.;
• Piotech Chuangyi (Shenyang)
Semiconductor Equipment Co., Ltd.;
• Piotech Jianke (Haining)
Semiconductor Equipment Co., Ltd.;
• Qingxin Technology Co., Ltd.;
• Quanjiao Nanda Optoelectronic
Materials Ltd.;
• Raintree Scientific Instruments
(Shanghai) Corporation;
• Ruili Microelectronics Equipment
(Shanghai) Co., Ltd.;
• Shandong Feiyuan Gas Co., Ltd.;
• Shanghai AGM Gas Co., Ltd.;
• Shanghai Aipusi Precision
Equipment Co., Ltd.;
• Shanghai Feiai Technology Co.,
Ltd.;
• Shanghai Huada Jiutian Information
Technology Co., Ltd.;
• Shanghai Integrated Circuit
Equipment & Materials Industry
Innovation Center Co., Ltd.;
• Shanghai Jingce Semiconductor
Technology Co., Ltd.;
• Shanghai Jingzhuo Information
Technology Co., Ltd.;
• Shanghai Kaishitong
Semiconductor Co., Ltd.;
• Shanghai Lingang Kaishitong
Semiconductor Co., Ltd.;
• Shanghai Lizhi Technology Co.,
Ltd.;
• Shanghai Modern Advanced UltraPrecision Manufacturing Center Co.,
Ltd.;
• Shanghai Nanpre Mechanics Co.,
Ltd.;
• Shanghai Naura Microelectronics
Equipment Co., Ltd.;
• Shanghai Siwave Technology Co.,
Ltd.;
• Shanghai Skyverse Semiconductor
Technology Co., Ltd.;
• Shanghai Xinsheng Jingrui
Semiconductor Technology Co., Ltd.;
• Shanghai Xinsheng Jingtou
Semiconductor Technology Co., Ltd.;
• Shanghai Xinsheng Jinko
Semiconductor Technology Co., Ltd.;
• Shanghai Xinsheng Semiconductor
Technology Co., Ltd.;
• Shanghai Yanquan Technology Co.,
Ltd.;
• Shanghai Yuliangsheng Technology
Co., Ltd.;
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• Shanghai Yuwei Semiconductor
Technology Co., Ltd.;
• Shanghai Zhichun Alloy
Manufacturing Co., Ltd.;
• Shanghai Zhichun Electronic
Technology Co., Ltd.;
• Shanghai Zhichun Optoelectronic
Equipment Co., Ltd.;
• Shanghai Zhichun Precision Gas
Co., Ltd.;
• Shanghai Zhichun Precision
Manufacturing Co., Ltd.;
• Shanghai Zhichun Purification
System Technology Co., Ltd.;
• Shanghai Zhichun Semiconductor
Equipment Co., Ltd;
• Shanghai Zhichun System
Integration Co., Ltd.;
• Shanghai Zhijia Semiconductor Gas
Co., Ltd.;
• Shanghai Zixi Optical Technology
Co., Ltd.;
• Shengmei Semiconductor
Equipment (Beijing) Co., Ltd.;
• Shengmei Semiconductor
Equipment Wuxi Co., Ltd.;
• Shengwei Semiconductor
Equipment (Shanghai) Co., Ltd.;
• Shenyang Xinyuan Micro Business
Development Co., Ltd.;
• Shenyang Xinyuan Microelectronic
Equipment Co., Ltd.;
• Shenzhen Guowei Hongbo
Technology Co., Ltd.;
• Shenzhen Guowei Sensing
Technology Co., Ltd.;
• Shenzhen Guoweichip Technology
Co., Ltd.;
• Shenzhen Huada Jiutianke
Technology Co., Ltd.;
• Shenzhen Jingyuan Information
Technology Co., Ltd.;
• Shenzhen Naura Microelectronics
Equipment Co., Ltd.;
• Shenzhen Pengxinxu Technology
Co., Ltd.;
• Shenzhen Qianhai Skyverse
Semiconductor Technology Co., Ltd.;
• Shenzhen SiCarrier Technologies
Co., Ltd.;
• Shenzhen Xinkailai Industrial
Machinery Co., Ltd.;
• Shenzhen Zhangge Instrument Co.,
Ltd.;
• Si’En Qingdao Co. Ltd.;
• Skyverse;
• Skyverse Limited;
• SMIC Advanced Technology R&D
(Shanghai) Corporation;
• Suzhou Nanda Optoelectronic
Materials Co., Ltd.;
• SwaySure Technology Co., Ltd.,
• Taiyuan Jinke Semiconductor
Technology Co., Ltd.;
• Ulanqab Nanda Microelectronics
Materials Co., Ltd.;
• Wingtech Technology Co., Ltd.;
• Wise Road Capital;
• Wuhan Naura Microelectronics
Equipment Co., Ltd.;
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16:58 Dec 04, 2024
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• Wuhan Skyverse Semiconductor
Technology Co., Ltd.;
• Wuhan Xinxin Semiconductor
Manufacturing Company Limited;
• Wuhan Yiguang Technology Co.,
Ltd.;
• Wuxi Kaishitong Technology Co.,
Ltd.;
• Wuxi Naura Microelectronics
Equipment Co., Ltd.;
• Xiamen Skyverse Technology Co.,
Ltd.;
• Xi’an Huada Jiutian Technology
Co., Ltd.;
• Xi’an Naura Microelectronics
Equipment Co., Ltd.;
• Xinlian Rongchuang Integrated
Circuit Industry Development (Beijing)
Co., Ltd.;
• Yusheng Micro Semiconductor
(Shanghai) Co., Ltd.;
• Yuwei Semiconductor Technology
Co., Ltd.;
• Zhangjiang Laboratory;
• Zhejiang Shenqihang Technology
Co., Ltd.;
• Zhejiang Zhichun Precision
Manufacturing Co., Ltd.;
• Zhiwei Semiconductor (Shanghai)
Co., Ltd.;
• Zhiyi High Purity Electronic
Materials (Shanghai) Ltd.;
• Zhuhai Cornerstone Technology
Co., Ltd.;
• Zhuhai Skyverse Technology Co.,
Ltd.; and
• Zibo Keyuanxin Fluorine Trading
Ltd.
Japan
• Kingsemi Japan K.K.
Singapore
• Skyverse Pte. Ltd.
South Korea
• ACM Research Korea Co., Ltd.; and
• Empyrean Korea.
B. Modifications to the Entity List
This final rule implements the
decision of the ERC, or agency members
of the ERC, to modify certain entries by
adding Footnote 5 designations,
updating addresses, and/or revising
license application review policy.
Footnote 5 designations are added to
seven entities under the destination of
China: Fujian Jinhua Integrated Circuit
Company, Ltd.; PXW Semiconductor
Manufactory Co., Ltd.; Semiconductor
Manufacturing International (Beijing)
Corporation; Semiconductor
Manufacturing International
Corporation (SMIC); Semiconductor
Manufacturing South China
Corporation; Shanghai Integrated Circuit
Research and Development Center; and
SMIC Northern Integrated Circuit
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Manufacturing (Beijing) Co., Ltd. The
ERC has determined that these
modifications for these entities are
needed to further restrict their ability to
obtain foreign-produced items that
could support the production of
‘‘advanced-node ICs’’ as defined in
§ 772.1 and referenced in § 744.23.
China’s indigenous ‘‘advanced-node
ICs’’ and are associated with diversion
or military modernization risks.
Inclusion on the Entity List under
§ 744.11 of the EAR is warranted, as
these entities have been involved in
activities that are contrary to the
national security and foreign policy
interests of the United States.
This rule also modifies the addresses
for two entities under the destination of
China: Fujian Jinhua Integrated Circuit
Company, Ltd. and Semiconductor
Manufacturing South China
Corporation, to update existing
addresses and/or include additional
addresses associated with these entities.
In addition, this rule implements the
decision of the ERC, or agency members
of the ERC, to modify the license review
policy for Semiconductor
Manufacturing International (Beijing)
Corporation; Semiconductor
Manufacturing South China
Corporation; and SMIC Northern
Integrated Circuit Manufacturing
(Beijing) Co., Ltd., to adopt a
presumption of denial license review
policy. Lastly, this rule implements the
decision of the ERC to modify the
license review policy for Semiconductor
Manufacturing International
Corporation (SMIC), also under the
destination of China, to adopt a license
review policy of a presumption of
denial for all items subject to the EAR,
including items described in ECCN
3B001.a.4, .c, .d, .f.1.b.2, .k to .p;
3B002.c, 3B993, or 3B994. Case-by-case
will apply for items used for production
of 200mm wafers destined to a 200mm
production facility.
The ERC also determined to modify
the license review policy for seven
SMIC entries on the Entity List under
the destination of China: Ningbo
Semiconductor International
Corporation (NSI); Semiconductor
Manufacturing International (Shenzhen)
Corporation; Semiconductor
Manufacturing International (Tianjin)
Corporation; SJ Semiconductor; SMIC
Holdings Limited; SMIC Hong Kong
International Company Limited; and
SMIC Semiconductor Manufacturing
(Shanghai) Co. The license review
policy further restricts these parties’
‘‘development’’ or ‘‘production’’ of
‘‘advanced-node ICs’’ at semiconductor
fabrication ‘‘facilities’’ in China. The
license review standards set forth in
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§§ 744.11 and 744.23(d) will apply. The
license review policy is presumption of
denial, except case-by-case when
§ 744.23(d)(3) of the EAR applies.
III. Validated End-User (VEU) Program
Decisions
A. Authorization Validated End-User
(VEU)
Validated End-Users (VEUs) are
designated entities located in eligible
destinations to which eligible items
subject to the EAR may be exported,
reexported, or transferred (in-country)
under a general EAR authorization
instead of a license (see § 748.15
(Authorization Validated End-User
(VEU)). The names of the VEUs, as well
as the dates they were designated, and
the associated eligible destinations (i.e.,
facilities) and items are identified in
supplement no. 7 to part 748 of the
EAR. Pursuant to § 748.15, VEU-eligible
destinations may obtain eligible items
without the need for the VEU’s supplier
to obtain an export, reexport, or transfer
(in-country) license from BIS. VEUeligible items vary among VEUs and
may include commodities, software,
and/or technology, apart from items
controlled for missile technology or
crime control reasons on the Commerce
Control List (CCL) (supplement no. 1 to
part 774 of the EAR).
VEUs are reviewed and approved by
the U.S. Government in accordance with
the provisions of § 748.15 and
supplement nos. 8 and 9 to part 748 of
the EAR. The ERC is responsible for
administering the VEU program. BIS
amended the EAR in a final rule
published on June 19, 2007 (72 FR
33646) to create Authorization VEU.
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Pursuant to § 748.15 and supplement
no. 9 to part 748 of the EAR, the ERC
determined to remove CSMC
Technologies Corporation (CSMC);
Shanghai Huahong Grace
Semiconductor Manufacturing
Corporation (HHGrace); and Advanced
Micro-Fabrication Equipment, Inc.,
China, a.k.a., Advanced MicroElectronics Corporation (AMEC). AMEC
also requested to be removed from the
VEU Program. This final rule
accordingly removes these three
entities’ entries from supplement no. 7
to part 748 (Authorization Validated
End-User (VEU): List of Validated EndUsers, Respective Items Eligible for
Export, Reexport and Transfer (InCountry), and Eligible Destinations).
16:58 Dec 04, 2024
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For the changes being made in this
final rule, apart from the Entity List
license requirements and other Entity
List-related requirements linked to
Footnote 5 designations, shipments of
items removed from eligibility for a
license exception or export, reexport, or
transfer (in-country) without a license
(NLR) as a result of this regulatory
action that were en route aboard a
carrier to a port of export, reexport, or
transfer (in-country), on December 2,
2024, pursuant to actual orders for
export, reexport, or transfer (in-country)
to or within a foreign destination, may
proceed to that destination under the
previous eligibility for a License
Exception or export, reexport, or
transfer (in-country) without a license
(NLR), provided the export, reexport, or
transfer (in-country) is completed no
later than on January 2, 2025.
For the changes being made in this
final rule that pertain to Entity List
license requirements and other Entity
List-related requirements linked to
Footnote 5 designations, shipments of
items removed from eligibility for a
license exception or export, reexport, or
transfer (in-country) without a license
(NLR) as a result of this regulatory
action that were en route aboard a
carrier to a port of export, reexport, or
transfer (in-country), on January 2, 2025,
pursuant to actual orders for export,
reexport, or transfer (in-country) to or
within a foreign destination, may
proceed to that destination under the
previous eligibility for a license
exception or export, reexport, or transfer
(in-country) without a license (NLR),
provided the export, reexport, or
transfer (in-country) is completed no
later than on January 31, 2025.
Export Control Reform Act of 2018
B. Removals From the VEU Program
Under China
VerDate Sep<11>2014
Savings Clause
On August 13, 2018, the President
signed into law the John S. McCain
National Defense Authorization Act for
Fiscal Year 2019, which included the
Export Control Reform Act of 2018
(ECRA) (codified, as amended, at 50
U.S.C. 4801–4852). ECRA provides the
legal basis for BIS’s principal authorities
and serves as the authority under which
BIS issues this rule. In particular,
Section 1753 of ECRA (50 U.S.C. 4812)
authorizes the regulation of exports,
reexports, and transfers (in-country) of
items subject to U.S. jurisdiction.
Further, Section 1754(a)(1)–(16) of
ECRA (50 U.S.C. 4813(a)(1)–(16))
authorizes, inter alia, establishing and
maintaining a list of foreign persons and
end uses that are determined to be a
threat to the national security and
foreign policy of the United States
PO 00000
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96835
pursuant to the policy set forth in
Section 1752(2)(A), and restricting
exports, reexports, and in-country
transfers of any controlled items to any
foreign person or end-use so listed;
apprising the public of changes in
policy, regulations, and procedures; and
any other action necessary to carry out
ECRA that is not otherwise prohibited
by law. Pursuant to Section 1762(a) of
ECRA (50 U.S.C. 4821(a)), these changes
can be imposed in a final rule without
prior notice and comment.
Rulemaking Requirements
Executive Orders 12866, 13563, and
14094 direct agencies to assess all costs
and benefits of available regulatory
alternatives and, if regulation is
necessary, to select regulatory
approaches that maximize net benefits
(including potential economic,
environmental, public health and safety
effects and distributive impacts and
equity). Executive Order 13563
emphasizes the importance of
quantifying both costs and benefits and
of reducing costs, harmonizing rules,
and promoting flexibility. This rule has
been determined to be not significant for
purposes of Executive Order 12866.
2. Notwithstanding any other
provision of law, no person is required
to respond to, nor shall any person be
subject to a penalty for failure to comply
with, a collection of information subject
to the requirements of the Paperwork
Reduction Act of 1995 (PRA) (44 U.S.C.
3501 et seq.), unless that collection of
information displays a currently valid
Office of Management and Budget
(OMB) Control Number. This rule
involves the following OMB-approved
collections of information subject to the
PRA:
• 0694–0088, ‘‘Simple Network
Application Process and Multipurpose
Application Form,’’ which carries a
burden hour estimate of 29.4 minutes
for a manual or electronic submission;
• 0694–0096 ‘‘Five Year Records
Retention Period,’’ which carries a
burden hour estimate of less than 1
minute; and
• 0607–0152 ‘‘Automated Export
System (AES) Program,’’ which carries a
burden hour estimate of 3 minutes per
electronic submission.
BIS estimates that these Entity List
additions and modifications and three
removals of entities from the VEU
Program under the EAR will result in an
increase of 200 license applications
submitted annually to BIS. However, the
additional burden falls within the
existing estimates currently associated
with these control numbers. Additional
information regarding these collections
of information, including all
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background materials, can be found at:
https://www.reginfo.gov/public/do/
PRAMain by using the search function
to enter either the title of the collection
or the OMB Control Number.
3. This rule does not contain policies
with federalism implications as that
term is defined in Executive Order
13132.
4. Pursuant to section 1762 of the
Export Control Reform Act of 2018, this
action is exempt from the
Administrative Procedure Act (APA) (5
U.S.C. 553) requirements for notice of
proposed rulemaking, opportunity for
public participation, and delay in
effective date. While Section 1762 of
ECRA provides sufficient authority for
such an exemption, this action is also
independently exempt from these APA
requirements because it involves a
military or foreign affairs function of the
United States (5 U.S.C. 553(a)(1)).
5. Because a notice of proposed
rulemaking and an opportunity for
public comment are not required to be
given for this rule by 5 U.S.C. 553, or
by any other law, the analytical
requirements of the Regulatory
Flexibility Act (5 U.S.C. 601, et seq.) are
not applicable. Accordingly, no
regulatory flexibility analysis is
required, and none has been prepared.
List of Subjects
15 CFR Part 744
Exports, Reporting and recordkeeping
requirements, Terrorism.
15 CFR Part 748
Administrative practice and
procedure, Exports, Reporting and
recordkeeping requirements.
Accordingly, parts 744 and 748 of the
Export Administration Regulations (15
CFR parts 730 through 774) are
amended as follows:
PART 744—CONTROL POLICY: ENDUSER AND END-USE BASED
1. The authority citation for part 744
continues to read as follows:
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■
Authority: 50 U.S.C. 4801–4852; 50 U.S.C.
4601 et seq.; 50 U.S.C. 1701 et seq.; 22 U.S.C.
3201 et seq.; 42 U.S.C. 2139a; 22 U.S.C. 7201
et seq.; 22 U.S.C. 7210; E.O. 12058, 43 FR
20947, 3 CFR, 1978 Comp., p. 179; E.O.
12851, 58 FR 33181, 3 CFR, 1993 Comp., p.
608; E.O. 12938, 59 FR 59099, 3 CFR, 1994
Comp., p. 950; E.O. 13026, 61 FR 58767, 3
CFR, 1996 Comp., p. 228; E.O. 13099, 63 FR
45167, 3 CFR, 1998 Comp., p. 208; E.O.
13222, 66 FR 44025, 3 CFR, 2001 Comp., p.
783; E.O. 13224, 66 FR 49079, 3 CFR, 2001
Comp., p. 786; Notice of September 18, 2024,
89 FR 77011 (September 20, 2024); Notice of
November 7, 2024, 89 FR 88867 (November
8, 2024).
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16:58 Dec 04, 2024
Jkt 265001
2. Amend supplement no. 4 to part
744 by:
■ a. Under CHINA, PEOPLE’S
REPUBLIC OF, by:
■ i. Adding, in alphabetical order,
entries for ‘‘AccoTest Technology Co.,
Ltd. (Hong Kong)’’; ‘‘ACM Research
(Shanghai)’’; ‘‘Beijing E-Town
Semiconductor Technology Co., Ltd.’’;
‘‘Beijing Guangke Xintu Technology Co.,
Ltd.’’; ‘‘Beijing Guowei Integration
Technology Co., Ltd.’’; ‘‘Beijing Huada
Jiutian Technology Co., Ltd.’’; ‘‘Beijing
Huafeng Electronic Equipment Co.,
Ltd.’’; ‘‘Beijing Huafeng Test & Control
Technology Co., Ltd.’’; ‘‘Beijing
Jingyuan Microelectronics Technology
Co., Ltd.’’; ‘‘Beijing Kaishitong
Semiconductor Co., Ltd.’’; ‘‘Beijing
Naura Microelectronics Equipment Co.,
Ltd.’’; ‘‘Beijing Naura Semiconductor
Equipment Co., Ltd.’’; ‘‘Beijing
Sevenstar Flowmeter Co., Ltd.’’;
‘‘Beijing Sevenstar Integrated Circuit
Equipment Co., Ltd.’’; ‘‘Beijing Shuoke
Zhongkexin Electronic Equipment Co.,
Ltd.’’; ‘‘Beijing Skyverse Technology
Co., Ltd.’’; ‘‘Beijing Zhongke Xin
Electronic Equipment’’; ‘‘Changguang
Jizhi Optical Technology Co., Ltd.’’;
‘‘Changsha Zhichun Application
Technology Co., Ltd.’’; ‘‘Chengdu Huada
Jiutianke Technology Co., Ltd.’’;
‘‘Chengdu Skyverse Technology Co.,
Ltd.’’; ‘‘Chinese Academy of Sciences
Institute of Microelectronics’’; and
‘‘Dongfang Jingyuan Electron Co., Ltd.’’;
■ ii. Revising the entry for ‘‘Fujian
Jinhua Integrated Circuit Company,
Ltd.’’;
■ iii. Adding, in alphabetical order,
entries for ‘‘Guangzhou Huada Jiutian
Technology Co., Ltd.’’; ‘‘Guangzhou
Skyverse Technology Co., Ltd.’’;
‘‘Guowei Group (Shenzhen) Co., Ltd.’’;
‘‘Hefei Kaishitong Semiconductor Co.,
Ltd.’’; ‘‘Hefei Naura Microelectronics
Equipment Co., Ltd.’’; ‘‘Hefei Zhihui
Semiconductor Application Technology
Co., Ltd.’’; ‘‘Hefei Zhiwei
Microelectronics Co., Ltd.’’; ‘‘Hefei
Zhiwei Semiconductor Co., Ltd.’’;
‘‘Huafeng Test & Control Technology
(Tianjin) Co., Ltd.’’; ‘‘Hwa Tsing
(Beijing) Technology Co., Ltd.’’; ‘‘Hwa
Tsing (Guangzhou) Semiconductor Co.,
Ltd.’’; ‘‘Hwa Tsing (Shanghai)
Semiconductor Co., Ltd.’’; ‘‘Hwa Tsing
Technology Co., Ltd.’’; ‘‘JAC Capital’’;
‘‘Jiangsu Nata Optoelectronic Material
Co., Ltd.’’; ‘‘Jiangsu Qiwei
Semiconductor Equipment Co., Ltd.’’;
‘‘Jiangsu Zhichun System Integration
Co., Ltd.’’; ‘‘Kingstone Technology Hong
Kong Limited’’; ‘‘Nanda Optoelectronic
Semiconductor Materials Co., Ltd.’’;
‘‘Nanjing Huada Jiutianke Technology
Co., Ltd.’’; ‘‘Naura Technology Group
■
PO 00000
Frm 00048
Fmt 4701
Sfmt 4700
Co., Ltd.’’; and ‘‘Ningbo Nanda
Optoelectronic Materials Ltd.’’;
■ iv. Revising the entry for ‘‘Ningbo
Semiconductor International
Corporation (NSI)’’;
■ v. Adding, in alphabetical order,
entries for ‘‘Northern Integrated Circuit
Technology Innovation Center (Beijing)
Co., Ltd.’’; ‘‘Oriental Crystal
Microelectronics Technology (Qingdao)
Co., Ltd.’’; ‘‘Oriental Crystal
Microelectronics Technology (Shanghai)
Co., Ltd.’’; ‘‘Piotech’’; ‘‘Piotech (Beijing)
Co., Ltd.’’; ‘‘Piotech (Shanghai) Co.,
Ltd.’’; ‘‘Piotech Chuangyi (Shenyang)
Semiconductor Equipment Co., Ltd.;
and ‘‘Piotech Jianke (Haining)
Semiconductor Equipment Co., Ltd.’’;
■ vi. Revising the entry for ‘‘PXW
Semiconductor Manufactory Co., Ltd.’’;
■ vii. Adding, in alphabetical order,
entries for ‘‘Qingxin Technology Co.,
Ltd.’’; ‘‘Quanjiao Nanda Optoelectronic
Materials Ltd.’’; ‘‘Raintree Scientific
Instruments (Shanghai) Corporation’’;
‘‘Ruili Microelectronics Equipment
(Shanghai) Co., Ltd.’’; and ‘‘S2C
Limited’’;
■ viii. Revising the entries for
‘‘Semiconductor Manufacturing
International (Beijing) Corporation’’;
‘‘Semiconductor Manufacturing
International Corporation (SMIC)’’;
‘‘Semiconductor Manufacturing
International (Shenzhen) Corporation’’;
‘‘Semiconductor Manufacturing
International (Tianjin) Corporation’’;
and ‘‘Semiconductor Manufacturing
South China Corporation’’;
■ ix. Adding, in alphabetical order,
entries for ‘‘Shandong Feiyuan Gas Co.,
Ltd.’’; ‘‘Shanghai AGM Gas Co., Ltd.’’;
‘‘Shanghai Aipusi Precision Equipment
Co., Ltd.’’; ‘‘Shanghai Feiai Technology
Co., Ltd.’’; ‘‘Shanghai Huada Jiutian
Information Technology Co., Ltd.’’; and
‘‘Shanghai Integrated Circuit Equipment
& Materials Industry Innovation Center
Co., Ltd.’’;
■ x. Revising the entry for ‘‘Shanghai
Integrated Circuit Research and
Development Center’’;
■ xi. Adding, in alphabetical order,
entries for ‘‘Shanghai Jingce
Semiconductor Technology Co., Ltd.’’;
‘‘Shanghai Jingzhuo Information
Technology Co., Ltd.’’; ‘‘Shanghai
Kaishitong Semiconductor Co., Ltd.’’;
‘‘Shanghai Lingang Kaishitong
Semiconductor Co., Ltd.’’; ‘‘Shanghai
Lizhi Technology Co., Ltd.’’;
■ xii. Revising the entry for ‘‘Shanghai
Micro Electronics Equipment (Group)
Co., Ltd.’’;
■ xiii. Adding, in alphabetical order,
entries for ‘‘Shanghai Modern Advanced
Ultra-Precision Manufacturing Center
Co., Ltd.’’; ‘‘Shanghai Nanpre
Mechanics Co., Ltd.’’; ‘‘Shanghai Naura
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Microelectronics Equipment Co., Ltd.’’;
‘‘Shanghai Siwave Technology Co.,
Ltd.’’; ‘‘Shanghai Skyverse
Semiconductor Technology Co., Ltd.’’;
‘‘Shanghai Xinsheng Jingrui
Semiconductor Technology Co., Ltd.’’;
‘‘Shanghai Xinsheng Jingtou
Semiconductor Technology Co., Ltd.’’;
‘‘Shanghai Xinsheng Jinko
Semiconductor Technology Co., Ltd.’’;
‘‘Shanghai Xinsheng Semiconductor
Technology Co., Ltd.’’; ‘‘Shanghai
Yanquan Technology Co., Ltd.’’;
‘‘Shanghai Yuliangsheng Technology
Co.’’, Ltd.’’; ‘‘Shanghai Yuwei
Semiconductor Technology Co., Ltd’’;
‘‘Shanghai Zhichun Alloy
Manufacturing Co., Ltd.’’; ‘‘Shanghai
Zhichun Electronic Technology Co.,
Ltd.’’; ‘‘Shanghai Zhichun
Optoelectronic Equipment Co., Ltd.’’;
‘‘Shanghai Zhichun Precision Gas Co.,
Ltd.’’; ‘‘Shanghai Zhichun Precision
Manufacturing Co., Ltd.’’; ‘‘Shanghai
Zhichun Purification System
Technology Co., Ltd.’’; ‘‘Shanghai
Zhichun Semiconductor Equipment Co.,
Ltd’’; ‘‘Shanghai Zhichun System
Integration Co., Ltd.’’; ‘‘Shanghai Zhijia
Semiconductor Gas Co., Ltd.’’;
‘‘Shanghai Zixi Optical Technology Co.,
Ltd.’’; ‘‘Shengmei Semiconductor
Equipment (Beijing) Co., Ltd.’’;
‘‘Shengmei Semiconductor Equipment
Wuxi Co., Ltd.’’; ‘‘Shengwei
Semiconductor Equipment (Shanghai)
Co., Ltd.’’; ‘‘Shenyang Xinyuan Micro
Business Development Co., Ltd.’’,
‘‘Shenyang Xinyuan Microelectronic
Equipment Co., Ltd.’’; ‘‘Shenzhen
Guowei Hongbo Technology Co., Ltd.’’;
‘‘Shenzhen Guowei Sensing Technology
Country
License
requirement
Entity
*
*
CHINA, PEOPLE’S
REPUBLIC OF.
khammond on DSK9W7S144PROD with RULES2
Co., Ltd.’’; ‘‘Shenzhen Guoweichip
Technology Co., Ltd.’’; ‘‘Shenzhen
Huada Jiutianke Technology Co., Ltd.’’;
‘‘Shenzhen Jingyuan Information
Technology Co., Ltd.’’; ‘‘Shenzhen
Naura Microelectronics Equipment Co.,
Ltd.’’; ‘‘Shenzhen Pengxinxu
Technology Co., Ltd.’’; ‘‘Shenzhen
Qianhai Skyverse Semiconductor
Technology Co., Ltd.’’; ‘‘Shenzhen
SiCarrier Technologies Co., Ltd.’’;
‘‘Shenzhen Xinkailai Industrial
Machinery Co., Ltd.’’; ‘‘Shenzhen
Zhangge Instrument Co., Ltd.’’; and
‘‘Si’En Qingdao Co. Ltd.’’;
■ xiv. Revising the entry for ‘‘SJ
Semiconductor’’;
■ xv. Adding, in alphabetical order,
entries for ‘‘Skyverse’’; ‘‘Skyverse
Limited’’; and ‘‘SMIC Advanced
Technology R&D (Shanghai)
Corporation’’;
■ xvi. Revising the entries for ‘‘SMIC
Holdings Limited’’; ‘‘SMIC Hong Kong
International Company Limited’’;
‘‘SMIC Northern Integrated Circuit
Manufacturing (Beijing) Co., Ltd.’’; and
‘‘SMIC Semiconductor Manufacturing
(Shanghai) Co., Ltd.’’; and
■ xvii. Adding, in alphabetical order,
entries for ‘‘Suzhou Nanda
Optoelectronic Materials Co., Ltd.’’;
‘‘SwaySure Technology Co., Ltd.’’;
‘‘Taiyuan Jinke Semiconductor
Technology Co., Ltd.’’; ‘‘Ulanqab Nanda
Microelectronics Materials Co., Ltd.’’;
‘‘Wingtech Technology Co., Ltd.’’;
‘‘Wise Road Capital’’; ‘‘Wuhan Naura
Microelectronics Equipment Co., Ltd.’’,
‘‘Wuhan Skyverse Semiconductor
Technology Co., Ltd.’’; ‘‘Wuhan Xinxin
Semiconductor Manufacturing
*
*
*
*
AccoTest Technology Co., Ltd. (Hong Kong),
Rm. 211 2/F MIRROR CTR, Tsim Sha Tsui
East, Hong Kong.
*
*
ACM Research (Shanghai), a.k.a., the following
four aliases:
—Shengmei Shanghai;
—ACM Shanghai;
—Shengmei Semiconductor Equipment (Shanghai) Co., Ltd.; and
—ACMSH.
Building 4, No. 1690 Cailun Road, Zhangjiang
High-Tech Park, Shanghai, China; and 604–1
IC Design Building, No. 33 Xinda Road, Wuxi,
China; and About 170 meters northeast of the
intersection of Luwu Highway and Xinyuan
South Road, Pudong New District, Shanghai,
China.
*
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Company Limited’’; ‘‘Wuhan Yiguang
Technology Co., Ltd.’’; ‘‘Wuxi
Kaishitong Technology Co., Ltd.’’;
‘‘Wuxi Naura Microelectronics
Equipment Co., Ltd.’’; ‘‘Xiamen
Skyverse Technology Co., Ltd.’’; ‘‘Xi’an
Huada Jiutian Technology Co., Ltd.’’;
and ‘‘Xi’an Naura Microelectronics
Equipment Co., Ltd.’’; Xinlian
Rongchuang Integrated Circuit Industry
Development (Beijing) Co., Ltd.’’;
‘‘Yusheng Micro Semiconductor
(Shanghai) Co., Ltd.’’; ‘‘Yuwei
Semiconductor Technology Co., Ltd.’’;
‘‘Zhangjiang Laboratory’’; ‘‘Zhejiang
Shenqihang Technology Co., Ltd.’’,
‘‘Zhejiang Zhichun Precision
Manufacturing Co., Ltd.’’; ‘‘Zhiwei
Semiconductor (Shanghai) Co., Ltd.’’;
‘‘Zhiyi High Purity Electronic Materials
(Shanghai) Ltd.’’; ‘‘Zhuhai Cornerstone
Technology Co., Ltd.’’; ‘‘Zhuhai
Skyverse Technology Co., Ltd.’’; and
‘‘Zibo Keyuanxin Fluorine Trading
Ltd.’’;
■ b. Under Japan, by adding, in
alphabetical order, an entry for
‘‘Kingsemi Japan K.K.’’;
■ c. Under Singapore, adding, in
alphabetical order, an entry for
‘‘Skyverse Pte. Ltd.’’;
■ d. Under South Korea, adding, in
alphabetical order, entries for ‘‘ACM
Research Korea Co., Ltd.’’; and
‘‘Empyrean Korea’’; and
■ e. Adding Footnote 5.
The additions and revisions read as
follows:
Supplement No. 4 to Part 744—Entity
List
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review policy
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96837
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(See § 744.11 of the EAR).
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Beijing E-Town Semiconductor Technology Co.,
Ltd., a.k.a., the following four aliases:
—BEST;
—BEST Semiconductor;
—Beijing Yitang Semiconductor Technology;
and
—Yitang Semiconductor.
No. 9 Ruihe West 2nd Road, Beijing, China and
Building 8, No. 28 Jinghai 2nd Road, Beijing,
China; and Rooms 610 and 611, 6th Floor,
Main Building, Customs Clearance Service
Center, No. 5 Tonghai 1st Road, Xiliu Street
Office, Xi’an, China; and No. 601 and 605,
Building A, Huaxin Headquarters Base, No.
426 Gaoxin Avenue, Wuhan, China; and
Room 706, IC Design Building A 33–2, Xinda
Road, Xinwu District, Wuxi, China; and Floor
4–5, Building D, Import and Export Commodity Exhibition and Trading Center, at the
intersection of Dongfang Avenue and Dayu
Road, Xinzhan District, Hefei, China.
*
*
Beijing Guangke Xintu Technology Co., Ltd., No.
22, Ronghua Middle Road, Room 3101, 31F,
Building 1, Beijing Economic and Technological Development Zone, Beijing, China and
3101 Floor 31, Building 1, No. 22 Courtyard,
Ronghua M. Road, Beijing Economic Technology Development Zone, Beijing 100000
China.
Beijing Guowei Integration Technology Co., Ltd.,
10th Floor, Building 1, No. 24, Jiuxianqiao
Middle Road, Chaoyang District, Beijing,
China.
*
*
Beijing Huada Jiutian Technology Co., Ltd.,
a.k.a., the following five aliases:
—Empyrean;
—Huada Empyrean;
—Empyrean Technology;
—Huada Jiutian; and
—BGI Jiutian.
2nd Floor, Building A, No. 2, Lizezhong 2nd
Road, Chaoyang District, Beijing, China.
Beijing Huafeng Electronic Equipment Co., Ltd.,
10/F, 2 Bldg., 1# Haiying Rd., Fengtai Dist.,
Beijing, 100070, China.
Beijing Huafeng Test & Control Technology Co.,
Ltd., a.k.a. the following three aliases:
—AccoTEST;
—AccoTEST BU. of Huafeng Test & Control
Co., Ltd.; and
—HFTC.
101, 102, 103, Floor 5, 1, Building 5, No. 9
Courtyard, Fenghao E. Road, Haidian District,
Beijing 100094, China; and Building 5, IC
Park, No. 9 Fenghao East Road, Haidian District, Beijing 100094, China; and 17th Floor,
Building 2, Qimeng Cross-border Xiangfu
Park, No. 116 Xianghong Road, Gongshu District, Hangzhou, Zhejiang Province, China;
and 1102, Tianan Smart City A3, No. 228
Linghu Avenue, Xinwu District, Wuxi, Jiangsu
Province, China; and Room 414, No. 1, 88
Shengrong Road, Pudong New Area, Shanghai, China; and 1603–1604, Mega Plaza, No.
1027 Changning Road, Changning District,
Shanghai, China; and Room A1–309, Tower
Building, Ascendas Innovation Park, No. 388
Xinping Street, Suzhou Industrial Park,
Jiangsu Province, China; and Room 805,
Lianyi Center, No. 83 Mingguang Road,
Weiyang District, Xi’an, Shaanxi Province,
China; and Shenzhen Software Park, Keji
Middle 2nd Road, Nanshan District,
Shenzhen, Guangdong Province, China.
*
*
Beijing Jingyuan Microelectronics Technology
Co., Ltd., a.k.a., the following two aliases:
—Zhongke Jingyuan Microelectronics Technology (Beijing) Co., Ltd.; and
—Casue.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER ] December 5,
2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
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NUMBER] December 5, 2024.
*
*
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(See § 744.11 of the EAR).
*
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*
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NUMBER] December 5, 2024.
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*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
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*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR.
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
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(See § 744.11 of the EAR).
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*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
Entity
No. 156, Jinghai 4th Road, Building 12, 5th
Floor, Beijing Economic and Technological
Development Zone, Beijing, China.
*
*
Beijing Kaishitong Semiconductor Co., Ltd.,
a.k.a., the following one alias:
—Beijing Kingstone Semiconductor.
Floor 1, Building 2, No. 15, Jingsheng South 4th
Street, Beijing Economic and Technological
Development Zone (Tongzhou), Beijing,
China; and 3rd Floor, Block A2, Digital Manor,
No. 1 Disheng West Road, Beijing Economic
and Technological Development Zone, Beijing,
China.
*
*
Beijing Naura Microelectronics Equipment Co.,
Ltd., a.k.a. the following five aliases:
—Beijing Naura;
—Northern Huachuang Microelectronics Equipment;
—Beijing Naura Microele Eq Co.;
—Beifang Huachuang Microelectronics Equipment; and
—Beijing Naura Microelectronics.
No. 8, Wenchang Avenue, Beijing Economic and
Technological Development Zone, Beijing,
China; and No. 1 Jiuxianqiao East Road,
Chaoyang District, Beijing, China; and Room
101, Floor 1 to 4, Building 1, No. 20, Jinshi
Road, Mafang Town, Pinggu District, Beijing,
China.
Beijing Naura Semiconductor Equipment Co.,
Ltd., Room 101, Floor 1 to 4, Building 1, No.
20, Jinshi Road, Mafang Town, Pinggu District, Beijing, China.
*
*
Beijing Sevenstar Flowmeter Co., Ltd., a.k.a.,
the following one alias:
—Beijing Qixing Flowmeter Co., Ltd.
4S01, 4th Floor, Building 1, No. 8 Wenchang
Avenue, Beijing, China.
Beijing Sevenstar Integrated Circuit Equipment
Co., Ltd., a.k.a., the following one alias:
—Beijing Qixing Integrated Circuit Equipment
Co., Ltd.
No. 6 Zhuyuan 3rd Street, Shunyi District, Beijing, China.
Beijing Shuoke Zhongkexin Electronic Equipment Co., Ltd., a.k.a., the following one alias:
—SemiCore ZKX.
1st Floor, Building 1, No. 6, Xingguang 2nd
Street, Tongzhou District, Beijing, China and
Room 2301, Luguyuyuan Entrepreneurship
Building, No. 27 Wenxuan Road, Changsha,
China.
*
*
Beijing Skyverse Technology Co., Ltd., a.k.a.,
the following one alias:
—Beijing Nanolighting Technology Co., Ltd.
Room 101–18, Floor 1, Building B1, No. 3
Disheng Middle Road, Beijing, China.
*
*
Beijing Zhongke Xin Electronic Equipment,
a.k.a., the following three aliases:
—ZKX;
—Zhongkexin; and
—CETC Beijing Zhongke Xin Electronic Equipment.
No. 6, Xingguang 2nd Street, Zhongguancun
Science and Technology Park, Tongzhou District, Beijing, China and Office Building No. 44,
North Gate, No. 20 Fuxing Road, Haidian District, Beijing, China.
*
*
Changguang Jizhi Optical Technology Co., Ltd.,
a.k.a., the following one alias:
—Zetop.
Building 1, No. 3033 Pudong Road, Changchun
Economic and Technological Development
Zone, Changchun, China.
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citation
Changsha Zhichun Application Technology Co.,
Ltd., No. 204, 2nd Floor, Building 1, Peak,
Gushan Sports Park, Jinjiachong Road,
Wangcheng District, Changsha, China.
*
*
Chengdu Huada Jiutianke Technology Co., Ltd.,
a.k.a., the following two aliases:
—Chengdu Huada; and
—Chengdu Empyrean.
No. 518, Guoxin Avenue, Shuangliu District,
Chengdu, China.
Chengdu Skyverse Technology Co., Ltd., a.k.a.,
the following one alias:
—Chengdu Nanolighting Technology Co., Ltd.,
Room 1307, Floor 13, Unit 1, Building 1, No.
99 Tianfu 2nd Street, Chengdu, China
*
*
Chinese Academy of Sciences Institute of Microelectronics, a.k.a., the following 6 aliases:
—CAS IME;
—IME CAS;
—IMECAS;
—CAS Institute of Microelectronics;
—CAS Microelectronics Institute; and
—Institute of Microelectronics of the Chinese
Academy of Sciences.
#3 Beitucheng West Road, Chaoyang District,
Beijing, China; and No. 3, North Tucheng
West Road, Chaoyang District, Beijing, China.
*
*
Dongfang Jingyuan Electron Co., Ltd., a.k.a., the
following five aliases:
—DJEL;
—Dongfang Jingyuan Electron Limited;
—Oriental Crystal Microelectronics Technology
(Beijing Co., Ltd.);
—Dongfang Jingyuan Micro-Electronic Technology (Beijing) Co., Ltd.; and
—Oriental Crystal Source.
No. 156 Jinghai 4th Road, Building 12, Beijing
Economic and Technological Development
Zone, Beijing, China and No. 156 Jinghai 4th
Road, Building A4, Beijing Economic and
Technological Development Zone, Beijing,
China and Room 301F, Block C, Yingdali
Technology Digital Park, Futian Free Trade
Zone, Fubao Street, Futian District, Shenzhen,
China and Building 12, Yard 156, Jinghai 4th
Road, Economic and Technological Development Zone Beijing, 100001, China.
*
*
Fujian Jinhua Integrated Circuit Company, Ltd.,
a.k.a., the following one alias:
—JHICC.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See §§ 734.4(a)(9), 734.9(e)(3),
and 744.11 of the EAR) 5.
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
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For all items subject to the EAR
(See § 744.11 of the EAR).
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Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
*
Presumption of denial
*
83 FR 54521, 10/30/18. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
*
*
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(See § 744.11 of the EAR).
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Presumption of denial
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NUMBER] December 5, 2024.
*
*
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(See § 744.11 of the EAR).
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*
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(See § 744.11 of the EAR).
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Sanchuang Park, Century Avenue Jinjiang City,
Fujian Province, China; and No. 88, Lianhua
Avenue, Jinjiang Integrated Circuit Science
Park, Quanzhou City, Fujian Province, China.
*
*
Guangzhou Huada Jiutian Technology Co., Ltd.,
a.k.a., the following two aliases:
—Guangzhou Huada; and
—Guangzhou Empyrean.
Room 1006, Building A, No. 18 Keke Avenue,
Huangpu District, Guangzhou, China.
*
*
Guangzhou Skyverse Technology Co., Ltd.,
a.k.a., the following one alias:
—Guangzhou Nanolighting Technology Co., Ltd.
Room 406–502, No. 1 Yichuang Street,
Huangpu District, Guangzhou, China.
*
*
Guowei Group (Shenzhen) Co., Ltd., a.k.a., the
following three aliases:
—Guowei Group;
—SMIT Group; and
—SMIT Shenzhen.
Room 22A, Guoshi Building, No. 1801 Shahe
West Road, High-tech Zone Community,
Nanshan District, Shenzhen, China.
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Hefei Kaishitong Semiconductor Co., Ltd., a.k.a.,
the following one alias:
—Hefei Kingstone Semiconductor.
Room 102–3, R&D Building, Xinqiao Integrated
Circuit Technology Park, No. 1 Shuofang
Road, Airport Economic Demonstration Zone,
Hefei, China.
*
*
Hefei Naura Microelectronics Equipment Co.,
Ltd., a.k.a., the following two aliases:
—Hefei Naura; and
—Hefei Naura Microelectronics.
2nd Floor, Building A, Electronic Factory, West
of Tianzhushan Avenue and South of
Shuofang Road, Airport Economic Demonstration Zone, Hefei, China.
Hefei Zhihui Semiconductor Application Technology Co., Ltd., Electronic Factory Building
A, West of Tianzhushan Avenue and South of
Shuofang Road, Hefei Airport Economic Demonstration Zone, Hefei Economic and Technological Development Zone, Hefei, China.
Hefei Zhiwei Microelectronics Co., Ltd., 2nd
Floor, Building B, Hefei Zhiwei Semiconductor
Co., Ltd., No. 3699 Dayu Road, Xinzhan District, Hefei, China.
Hefei Zhiwei Semiconductor Co., Ltd., No. 3699
Dayu Road, Xinzhan District, Hefei, China.
*
*
Huafeng Test & Control Technology (Tianjin)
Co., Ltd., 1201 Chuanbo Road, Zhongxin Ecological City, Binhai, Tianjin, 300480, China;
and 1201 Chuanbo Road, Sino-Singapore
Eco-city, Binhai New Area, Tianjin, China.
*
*
Hwa Tsing (Beijing) Technology Co., Ltd., a.k.a.,
the following three aliases:
—Huahai Qingke (Beijing) Technology Co., Ltd.;
—Beijing Huahai Qingke; and
—Beijing Hwa Tsing.
Room 1107, Floor 11, Building 40, No. 1 Courtyard, Disheng North Street, Beijing, China and
Room 505, Floor 5, Building 40, 1st Courtyard, Disheng North Road, Beijing, China.
Hwa Tsing (Guangzhou) Semiconductor Co.,
Ltd., a.k.a. the following three aliases:
—Huahai Qingke (Guangzhou) Semiconductor
Co., Ltd.;
—Guangzhou Huahai Qingke; and
—Guangzhou Hwa Tsing.
Room 508, Building A, No. 136 Kaiyuan Avenue, Guangzhou, China.
Hwa Tsing (Shanghai) Semiconductor Co., Ltd.,
a.k.a., the following three aliases:
—Huahai Qingke (Shanghai) Semiconductor
Co., Ltd.;
—Shanghai Huahai Qingke; and
—Shanghai Hwa Tsing.
2nd Floor, 979 Yunhan Road, Lingang Innovation Zone, Shanghai, China.
Hwa Tsing Technology Co., Ltd., a.k.a., the following three aliases:
—Huahai Qingke Technology Co., Ltd.;
—Huahai Qingke; and
—Hwa Tsing.
No. 11, Juxing Road, Xianshuigu Town, Jinnan
District, Tianjin, China; and Building 8, Haihe
Creative Center, No. 9 Juxing Road, Jinnan
District, Tianjin, China; and Electronics Factory R&D Building, west of Zhushan Avenue
and south of Shuofang Road, Hefei, China;
and Room 362, Floor 18, Building B4, Wuhan
Future Science and Technology City Overseas Talents Area, 999 Gaoxin Avenue,
Wuhan, China.
*
*
JAC Capital, a.k.a., the following one alias:
—Beijing Jianguang Asset Management Co.,
Ltd.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
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*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
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*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
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Floor 8, Beijing International Club Office Tower
A, No. 21 Jian Wai Avenue, Chaoyang District, Beijing, China and Room 9–46, Building
6, Ronghui Garden, Linkong Economic Core
Zone, Shunyi District, Beijing, China.
*
*
Jiangsu Nata Optoelectronic Material Co., Ltd.,
a.k.a., the following six aliases:
—Nata Optoelectronic;
—Nata;
—Nata Chem;
—Nanda Chem;
—Nanda; and
—Nanda Optoelectronic.
No. 67, Pingsheng Road, Shengpu, Suzhou Industrial Park, Suzhou, China.
Jiangsu Qiwei Semiconductor Equipment Co.,
Ltd., No. 2015, Linyang Road, Qidong Economic Development Zone, Qidong, China.
*
*
Jiangsu Zhichun System Integration Co., Ltd.,
No. 500, Linyang Road, Qidong Economic Development Zone, Qidong, Jiangsu Province,
China.
*
*
Kingstone Technology Hong Kong Limited,
a.k.a., the following one alias:
—Kingstone Hong Kong
Unit 12, 11/F, Metro Centre II, Number 21 Lam
Hing Street, Kowloon Bay, Hong Kong.
*
*
Nanda Optoelectronic Semiconductor Materials
Co., Ltd., a.k.a., the following four aliases:
—Nata Optoelectronic Semiconductor;
—Nata Semiconductor;
—Nanda Semiconductor; and
—Nanda Optoelectronic Semiconductor.
No. 117, Xincheng Avenue, Shitan Industrial
Park, Shizi Town, Quanjiao County, Chuzhou,
Anhui Province, China; and No. 686–688,
Xincheng Avenue, Quanjiao County,
Chuzhou, Anhui Province, China.
*
*
Nanjing Huada Jiutianke Technology Co., Ltd.,
a.k.a., the following two aliases:
—Nanjing Huada; and
—Nanjing Empyrean.
Tower A, 8th floor, Chuangzhi Building, No. 17
Xinghuo Rd., Gaoxin District Nanjing, China.
*
*
Naura Technology Group Co., Ltd., a.k.a., the
following four aliases:
—Northern Huachuang;
—Beifang Huachuang;
—Naura; and
—Naura Science & Technology Group.
No. 1 Jiuxianqiao East Road, Chaoyang District,
Beijing, China.
*
*
Ningbo Nanda Optoelectronic Materials Ltd.,
a.k.a., the following three aliases:
—Ningbo Nata;
—Ningbo NTU; and
—Ningbo NTU Optoelectronics.
No. 233, Yangzhou’ao Road, Chaiqiao Street,
Beilun District, Ningbo, China.
Ningbo Semiconductor International Corporation
(NSI), No. 331–335 Anju Road, Xiaogang
Street, Beilun District, Ningbo, Zhejiang,
China; and 1MC07, Jiuzhou Center, No. 95,
Lane 85, Cailun Road, Pudong New Area,
Shanghai, China.
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*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
See §§ 744.11 and
744.23(d) of the
EAR.
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
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Northern Integrated Circuit Technology Innovation Center (Beijing) Co., Ltd., a.k.a., the following five aliases:
—Semiconductor Technology Innovation Center
(Beijing) Corp.;
—STIC;
—STIC BJ;
—Northern Integrated Circuit Innovation Center;
and
—STIC Northern Integrated Circuit Technology
Innovation Center (Beijing) Co., Ltd.
First Floor, Building 9, No. 18 Wenchang Avenue, Beijing Economic and Technological Development Zone, China; and 34M3 plot of land
in the core area of Beijing Economic and
Technological Development Zone, Beijing,
China.
*
*
Oriental Crystal Microelectronics Technology
(Qingdao) Co., Ltd., a.k.a., the following one
alias:
—Dongfang Jingyuanwei Electronic Science &
Technology (Qingdao) Co., Ltd.
No. 9 Chengye Road, Room 306, 3rd Floor, Office Building, West Coast Comprehensive
Bonded Zone, Qingdao, China and Room
306, Floor 3, No. 9 Chengye Road, Xihaian
Integrated Free Trade Zone, Qingdaopian District, China Pilot Free Trade Zone, Qingdao,
Shandong, 266000, China.
Oriental Crystal Microelectronics Technology
(Shanghai) Co., Ltd., a.k.a., the following one
alias:
—Dongfang Jingyuanwei Electronic Science and
Technology (Shanghai) Co., Ltd.
No. 888, Huanhu West 2nd Road, Building C,
Lingang New Area, Shanghai, China and
Floor C, No. 888 Huanhu W 2nd Road,
Lingang Xinpian District, China Pilot Free
Trade Zone, Shanghai, China.
*
*
Piotech., a.k.a., the following two aliases:
—Tuojing Technology; and
—Shenyang Tuojing Technology Co., Ltd.
No. 900, Shuijia, Hunnan District, Shenyang,
China; and No. 1 Xinyuan Street, Shenyang,
China; and A072, Floor 3, Building 3, International Enterprise Center Phase 3, No. 1
Guanggu Avenue, Wuhan, China; and Room
217, 2nd Floor, Building 6, No. 16 Hongda
North Road, Beijing, China; and Room 403,
Floor 4, Building 1, No. 501 Xuri Road,
Lingang New Area, Shanghai, China.
Piotech (Beijing) Co., Ltd., a.k.a., the following
one alias:
—Tuojing (Beijing) Co., Ltd.
Room 217, Building 6, No. 16 Hongda North
Road, Beijing, China.
Piotech (Shanghai) Co., Ltd., a.k.a., the following one alias:
—Tuojing (Shanghai) Co., Ltd.
Room 304, Building 10, No. 1211 Hongyin
Road, Lingang New Area, Shanghai, China.
Piotech Chuangyi (Shenyang) Semiconductor
Equipment Co., Ltd., a.k.a., the following one
alias:
—Tuojing Chuangyi (Shenyang) Semiconductor
Equipment Co., Ltd.
Building 2 and Building 3, No. 900, Shuijia,
Hunnan District, Shenyang, China.
Piotech Jianke (Haining) Semiconductor Equipment Co., Ltd., a.k.a., the following three
aliases:
—Tuojing Jianke (Haining) Semiconductor
Equipment Co., Ltd.;
—Tuojing Keyscience (Haining) Semiconductor
Equipment Co., Ltd.; and
—Piotech Keyscience (Haining) Semiconductor
Equipment Co., Ltd.
Building 3, No. 8 Xinzhong Road, Haining Economic Development Zone, Jiaxing, China.
*
*
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
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review policy
Federal Register
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PXW Semiconductor Manufactory Co., Ltd.,
a.k.a., the following seven aliases:
—Peng Chip;
—Shenzhen Peng Xin Wei IC Manufacturing;
—Shenzhen Pengxin Micro Integrated Circuit
Manufacturing Co., Ltd.;
—PengXinWei;
—PXW;
—PXWSemi; and
—Pengxin Micro.
Room 727, Shanxia Building, No. 160, Xinxia
Avenue, Shanxia Community, Pinghu Street,
Longgang District, Shenzhen, 518111, China;
and Building D, Zhongke Valley Industrial
Park, Zhonghuan Avenue, Shanxia Community, Pinghu Street, Longgang District,
Shenzhen, China.
*
*
Qingxin Technology Co., Ltd., a.k.a. the following two aliases:
—Clean Chip; and
—Clean Chip HK.
15th Floor, Wan Zhaofeng Centre, 133 Hoi Bun
Road, Kwun Tong, Kowloon, Hong Kong.
Quanjiao Nanda Optoelectronic Materials Ltd.
a.k.a., the following one alias:
—Quanjiao Nata.
No. 686–688, Xincheng Avenue, Shitan Industrial Park, Shizi Town, Quanjiao County,
Chuzhou, China.
*
*
Raintree Scientific Instruments (Shanghai) Corporation, a.k.a., the following two aliases:
—RSIC Scientific Instruments (Shanghai) Co.,
Ltd.; and
—Ruili Scientific Instruments (Shanghai) Co.,
Ltd.
Building 6, Zhangjiang Pioneer Park, No. 68
Huatuo Road, Pudong New Area, Shanghai,
China; and First Floor, Building 2, Chenghe
Innovation Research Center, No. 48 Gubo
Road, Pudong New District, Shanghai, China;
and Building A8 No. 38 Dongsheng Road,
Shanghai Xinfa Chuangyun Industrial Park
(Northeast Gate 2), Pudong New Area,
Shanghai, China; and No. 777, Jianshe West
Road, Binhu District, Jiangsu Zhuosheng
Microelectronics Co., Ltd., Binhu District,
Wuxi, China.
*
*
Ruili Microelectronics Equipment (Shanghai)
Co., Ltd., a.k.a, the following two aliases:
—Raintree Microelectronics; and
—RSIC Microelectronics.
B1, 2nd Floor, No. 88 Taigu Road, Shanghai,
China; and Kailong Technology Building, Lane
3166, Longdong Avenue, Pudong New District, Shanghai, China.
*
*
Semiconductor Manufacturing International (Beijing) Corporation, a.k.a., the following one
alias:
—SMIC Beijing.
No. 18 Wen Chang Road, Beijing EconomicTechnological Development Area, Beijing
100176.
Semiconductor Manufacturing International Corporation (SMIC), a.k.a., the following three
aliases:
—Semiconductor Manufacturing International
(Shanghai) Corporation;
—SMIC Shanghai; and
—Semiconductor Mfg International Corp.
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
Presumption of denial
87 FR 77508, 12/19/2022. 89
FR [INSERT FR PAGE NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
*
Presumption of denial
*
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
Presumption of denial
for all items to include items described in ECCN
3B001.a.4, .c, .d,
f.1.b.2, .k to .p;
3B002.c, 3B993, or
3B994. Case-bycase for items designed for production of 200mm wafers destined to a
200mm wafer production facility.
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
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No. 18 Zhang Jiang Road, Pudong New Area,
Shanghai 201203, China.
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Semiconductor Manufacturing International
(Shenzhen) Corporation, a.k.a., the following
one alias:
—SMIC Shenzhen.
No. 18 Gaoxin Road, Export Processing Zone,
Pingshan New Area, Shenzhen, 518118,
China; and 1st Lanzhu Avenue, Pingshan
Town, Longgang District, Shenzhen,
Guangdong, 518118, China; and Qier Road,
Export Processing Zone, Pingshan New Area,
Shenzhen, China.
Semiconductor Manufacturing International
(Tianjin) Corporation, a.k.a., the following one
alias:
—SMIC Tianjin.
No. 19 Xing Hua Avenue, Xiqing Economic Development Area, Tianjin, 300385, China.
Semiconductor Manufacturing South China Corporation, a.k.a., the following four aliases:
—SMSC;
—SMIC Southern Integrated Circuit Manufacturing Co., Ltd.;
—SMIC South; and
—SMIC Southern.
5th Floor, Building 3, No. 18 Zhang Jiang Road,
China (Shanghai) Pilot Free Trade Zone,
China; and 18 Zhangjiang Road, Pudong New
Area, Shanghai, China.
*
*
Shandong Feiyuan Gas Co., Ltd., a.k.a., the following one alias:
—Feiyuan Gas.
No. 5, Road 4, Gaoqing Chemical Industry Park,
Gaocheng Town, Gaoqing County, Zibo,
China.
*
*
Shanghai AGM Gas Co., Ltd., a.k.a., the following one alias:
—AGM Gas.
Room 220, 2F, No. 1799–6, Wuzhong Road,
Minhang District, Shanghai, China.
*
*
Shanghai Aipusi Precision Equipment Co., Ltd.,
Room 402, Building 1, No. 170 Zihai Road,
Minhang District, Shanghai, China.
*
*
Shanghai Feiai Technology Co., Ltd., Room
204A, Building 5, No. 600, Ningqiao Road,
Shanghai, China.
*
*
Shanghai Huada Jiutian Information Technology
Co., Ltd., a.k.a., the following two aliases:
—Shanghai Huada; and
—Shanghai Empyrean.
Floor 10, Building C, No. 1867, Zhongke Road,
Pudong New Area, Shanghai, China; and
Building C, No. 888, Huanhu West 2nd Road,
Lingang New Area, China.
*
*
Shanghai Integrated Circuit Equipment & Materials Industry Innovation Center Co., Ltd.,
a.k.a., the following five aliases:
—CICEM;
—ICRD Innovation Center;
—National Integrated Circuit Equipment and Materials Industrial Innovation Center;
—ICRD Phase II; and
—ICRD Phase 2.
No. 497, Loulu Road, Jiading District, Shanghai,
China; and No. 497, Gauss Road, Shanghai,
China; and No. 497, Gaosi Road, Shanghai,
China.
Shanghai Integrated Circuit Research and Development Center, a.k.a., the following two
aliases:
—Shanghai IC R&D Center; and
—ICRD.
No. 497, Gaosi Road, Zhangjiang Hi-Tech Park,
Pudong New Area, Shanghai, China; and No.
3000, Longdong Avenue, Pilot Free Trade
Zone, Shanghai, China.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
See §§ 744.11 and
744.23(d) of the
EAR.
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
See §§ 744.11 and
744.23(d) of the
EAR.
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
Presumption of denial
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
Presumption of denial
87 FR 77508, 12/19/2022. 89
FR [INSERT FR PAGE NUMBER] December 5, 2024.
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review policy
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Shanghai Jingce Semiconductor Technology
Co., Ltd., a.k.a., the following three aliases:
—Shanghai Precision Measurement;
—Shanghai Jingce; and
—PMISH.
No. 2875, Huqingping Highway, Qingpu District,
Shanghai, China; and Floor 1 and 3, Building
1, No. 269 and 299, Shuangbang Road,
Xujing Town, Qingpu District, Shanghai, China.
Shanghai Jingzhuo Information Technology Co.,
Ltd., 12th Floor, Building B, No. 1–72, Lane
2855, Huqingping Highway, Zhaoxiang Town,
Qingpu District, Shanghai, China.
Shanghai Kaishitong Semiconductor Co., Ltd.,
a.k.a., the following two aliases:
—Kaishitong Semiconductor; and
—Kingstone Semiconductor.
Unit 1, Building 7, No. 200 Newton Road, China
(Shanghai) Pilot Free Trade Zone, Shanghai,
China; and Unit 1, Building 7, 200 Niudun
Road, Shanghai, China; and 211 Qinqiao
Road, Shanghai, China.
Shanghai Lingang Kaishitong Semiconductor
Co., Ltd., a.k.a., the following two aliases:
—Lingang Kaishitong Semiconductor; and
—Lingang Kingstone Semiconductor.
Area A, Building 1, No. 88 Wansong Road,
Lingang New Area, Shanghai, China; and No.
750, Zhubai Road, Nanhui New Town,
Pudong New Area, Shanghai, China.
Shanghai Lizhi Technology Co., Ltd., Room
0248, 2nd Floor, Ji Building, No. 555
Dongchuan Road, Minhang District, Shanghai,
China.
Shanghai Modern Advanced Ultra-Precision
Manufacturing Center Co., Ltd., a.k.a., the following three aliases:
—Ultra-Precision Manufacturing Center;
—UPEC; and
—SHUPEC.
No. 396, Minfeng Road, Pudong New District,
Shanghai, China and Building 63 East, 100
Handan Road, Shanghai, China.
*
*
Shanghai Nanpre Mechanics Co., Ltd., a.k.a.,
the following four aliases:
—Micro-Yuan Qimi;
—Shanghai Weigao;
—Shanghai Microhigh Precision Mechanical Engineering Co., Ltd.; and
—Shanghai Micro-High Precision Machinery.
No. 1525, Zhangdong Road, Shanghai, China.
Shanghai Naura Microelectronics Equipment
Co., Ltd., a.k.a. the following two aliases:
—Shanghai Naura; and
—Shanghai Naura Microelectronics.
Building C, No. 888, Huanhu West 2nd Road,
Lingang New Area, Shanghai, China.
*
*
Shanghai Siwave Technology Co., Ltd., a.k.a.
the following six aliases:
—Shanghai Xinwu Technology Co., Ltd.;
—Xinwu Technology;
—SIWAVE;
—SIWAVE Technology;
—SIWAVE, INC.; and
—Si-Wave.
No. 333 Huangqing Road, Jiading District,
Shanghai, China.
Shanghai Skyverse Semiconductor Technology
Co., Ltd., a.k.a., the following one alias:
—Shanghai Nanolighting Semiconductor Technology Co., Ltd., Room 303, Building 13, No.
1211 Hongyin Road, Lingang New Area,
Shanghai, China.
*
*
Shanghai Xinsheng Jingrui Semiconductor Technology Co., Ltd., 2nd Floor, Building 1, No.
1000, Yunshui Road, Lingang New Area,
Shanghai, China.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR.
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
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Federal Register
citation
Shanghai Xinsheng Jingtou Semiconductor
Technology Co., Ltd., Floor 4, Building 6, No.
1000, Yunshui Road, Lingang New Area,
Shanghai, China.
Shanghai Xinsheng Jinko Semiconductor Technology Co., Ltd., Area B, 4th Floor, Building 4,
No. 1000, Yunshui Road, Lingang New Area,
Shanghai, China.
Shanghai Xinsheng Semiconductor Technology
Co., Ltd., a.k.a., the following two aliases:
—Zingsemi; and
—Zing Semiconductor Corporation.
Buildings 1–4, 6–19, No. 1000, Yunshui Road,
Lingang New Area, Shanghai, China.
Shanghai Yanquan Technology Co., Ltd., Building C, No. 888 Huanhu West 2nd Road,
Lingang New Area, Shanghai, China.
Shanghai Yuliangsheng Technology Co., Ltd.,
a.k.a., the following one alias:
—UEASCEND.
Building 1, No. 500 Mindong Road, Pudong New
District, Shanghai, China.
Shanghai Yuwei Semiconductor Technology
Co., Ltd, a.k.a., the following one alias:
—Shanghai Yuweitek.
Building 11, No. 899 Zuchong Road, Shanghai,
China.
Shanghai Zhichun Alloy Manufacturing Co., Ltd.,
Room 309, Building 1, No. 170 Zihai Road,
Minhang District, Shanghai, China.
Shanghai Zhichun Electronic Technology Co.,
Ltd., Room 302, Building 10, No. 1211
Hongyin Road, Lingang New Area, China
(Shanghai) Pilot Free Trade Zone, Shanghai,
China.
Shanghai Zhichun Optoelectronic Equipment
Co., Ltd., Room D, 2nd Floor, Building 3, No.
880 Ziyue Road, Minhang District, Shanghai,
China.
Shanghai Zhichun Precision Gas Co., Ltd.,
Room 301, Building 1, No. 170, Zihai Road,
Minhang District, Shanghai, China.
Shanghai Zhichun Precision Manufacturing Co.,
Ltd. a.k.a. the following one alias:
—Nanolink.
Room 305, Building 1, No. 170 Zihai Road,
Minhang District, Shanghai, China.
Shanghai Zhichun Purification System Technology Co., Ltd., a.k.a. the following five
aliases:
—Pure Technology;
—PNC Process;
—PNC Process Systems Co., Ltd.;
—PNC Technology Group and
—PNC.
No. 170 Zihai Road, Minhang District, Shanghai,
China.
Shanghai Zhichun Semiconductor Equipment
Co., Ltd., Room 304, Building 1, No. 170 Zihai
Road, Minhang District, Shanghai, China.
Shanghai Zhichun System Integration Co., Ltd.,
a.k.a., the following one alias:
—Pure Integration.
3rd and 4th floors, Building 2, No. 170 Zihai
Road, Minhang District, Shanghai, China.
Shanghai Zhijia Semiconductor Gas Co., Ltd.,
No. 912 J, Yecheng Road, Jiading Industrial
Zone, Shanghai, China.
Shanghai Zixi Optical Technology Co., Ltd.,
Building C, No. 888, Huanhu West 2nd Road,
Lingang New Area, China (Shanghai) Pilot
Free Trade Zone, Shanghai, China.
*
*
Shengmei Semiconductor Equipment (Beijing)
Co., Ltd., Room 905, Floor 9, Building 7, No.
15 Ronghua South Road, Beijing, China.
Shengmei Semiconductor Equipment Wuxi Co.,
Ltd., Room 6, Lot J1, Wuxi New District Export Processing Zone, Wuxi, China.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
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review policy
Federal Register
citation
Shengwei Semiconductor Equipment (Shanghai)
Co., Ltd., Building C, No. 888, Huanhu West
2nd Road, Nanhui New Town, Lingang New
Area, Shanghai, China.
Shenyang Xinyuan Micro Business Development
Co., Ltd., a.k.a., the following two aliases:
—Kingsemi Micro Business Development Co.,
Ltd.; and
—Core Source Business Development Co., Ltd.
Rooms 201 and 202, Building 1, No. 501 Xuri
Road, Lingang New Area, Shanghai, China.
Shenyang Xinyuan Microelectronic Equipment
Co., Ltd., a.k.a., the following three aliases:
—Kingsemi;
—Shenyang Kingsemi Microelectronics Equipment Co., Ltd.; and
—Shenyang Core Source.
No. 16 Feiyun Road, Hunnan District,
Shenyang, China.
*
*
Shenzhen Guowei Hongbo Technology Co.,
Ltd., Room 14C, Guoshi Building, No. 1801
Shahe West Road, High-tech Zone Community, Yuehai Street, Nanshan District,
Shenzhen, China.
Shenzhen Guowei Sensing Technology Co.,
Ltd., a.k.a., the following one alias:
—SMIT Sense.
Room 22B, Guoshi Building, No. 1801 Shahe
West Road, High-tech Zone Community,
Yuehai Street, Nanshan District, Shenzhen,
China and Floor 23, Building 3, Chongwen
Park, Nanshan Intelligent Valley, No. 3370
Liuxian Avenue, Shenzhen, China; and Floor
23, Building 3, Chongwen Park, Nanshan
Zhiyuan, No. 3370 Liuxian Avenue, Shenzhen,
China.
Shenzhen Guoweichip Technology Co., Ltd.,
a.k.a., the following five aliases:
—SMIT Xintech;
—Xintech;
—Guoweixin;
—GWX; and
—GWX Technologies.
15th Floor, Guoshi Building, No. 1801, Shahe
West Road, Nanshan District, Shenzhen,
China.
Shenzhen Huada Jiutianke Technology Co.,
Ltd., a.k.a., the following two aliases:
—Shenzhen Huada; and
—Shenzhen Empyrean.
10th floor, Building E, ShenZhen-Hong Kong
International Hi-Tech Park, No. 3 Binglang
Rd., Futian District, Shenzhen, China; and
Room 1001, Building 5, Northwest Shenjiu
Technology Pioneer Park, at the intersection
of Taohua Road and Betel Road, Fubao Community, Fubao Street, Futian District,
Shenzhen, China.
*
*
Shenzhen Jingyuan Information Technology Co.,
Ltd., No. 8 Hongmian Road, Room 401A,
Building C, Yingdali Technology Digital Park,
Fubao Community, Fubao Street, Futian District, Shenzhen, China and 301F, Suite C,
Yingdali Technology Shuma Park,
Hongmiandao, Fubao Sub-District, Futian District, Shenzhen, Guangdong, 518015, China.
*
*
Shenzhen Naura Microelectronics Equipment
Co., Ltd., a.k.a., the following two aliases:
—Shenzhen Naura; and
—Shenzhen Naura Microelectronics.
No. 11, Jinniu West Road, Longtian Street,
Pingshan District, Shenzhen, China; and
About 40 meters west of Haofang Jingyuan,
Yanziling 3rd Road, Pingshan District,
Shenzhen, China.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
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Entity
License
requirement
License
review policy
Federal Register
citation
Shenzhen Pengxinxu Technology Co., Ltd.,
a.k.a., the following five aliases:
—Peng Xin Xu;
—PingXinXu;
—PST;
—Shenzhen Pensun Technology Co., Ltd.; and
—PXX.
Floor 54–56, Building C, Digital Innovation Center, No. 328 Mintang Road, Longhua District,
Shenzhen City, Guangdong Province, China;
and Room 403, Podium Building, Innovation
Plaza, No. 2007, Pingshan Avenue, Liulian
Community Pingshan Street, Pingshan District, Shenzhen, China; and 3001 Jin Xiu West
Road Pingshan District, Shenzhen, China.
Shenzhen Qianhai Skyverse Semiconductor
Technology Co., Ltd., a.k.a., the following one
alias:
—Shenzhen Qianhai Nanolighting Semiconductor Technology Co., Ltd.
Room 201, Building A, No. 1 Qianwan 1st Road,
Qianhai Shenzhen-Hong Kong Cooperation
Zone, Shenzhen, China.
*
*
Shenzhen SiCarrier Technologies Co., Ltd.,
a.k.a., the following six aliases:
—Shenzhen Xinkailai Technology Co., Ltd.;
—Shenzhen Xinkailai;
—Xinkailai;
—SiCarrier;
—Huawei Starlight Engineering Department; and
—Huawei Starlight Department.
Zhongke Industrial Park, Zhonghuan Avenue,
Pinghu Street, Longgang District, Shenzhen,
China; and No. 91 Xuri East Road, Shanxia
Community, Pinghu Street, Longgang District,
Shenzhen, China; and Building 6, Zhongke
Valley, Longgang District, Shenzhen, China;
and No. 368 Tianjiao Road, Chengdu HighTech Zone, China; and No. 16, Pingle Street,
Changhe Street, Binjiang District, Hangzhou
City, China; and Building A, Xi’an Software
Park, No. 68, Keji 2nd Road, High-Tech Zone,
Xi’an City, Shaanxi Province, China; and
Building B4, Phase 1, Longshan Innovation
Park, Wuhan Future Science and Technology
City, No. 999 Gaoxin Avenue, Donghu New
Technology Development Zone, Wuhan City,
Hubei Province, China.
*
*
Shenzhen Xinkailai Industrial Machinery Co.,
Ltd., Room 1301, Building 6, Zhongkegu Industrial Park, Zhonghuan Avenue, Shanxia
Community, Pinghu Street, Shenzhen, China.
*
*
Shenzhen Zhangge Instrument Co., Ltd., a.k.a.,
the following three aliases:
—Shenzhen Zhangge;
—Zhangge; and
—Shenzhenshi Zhangge Yiqi Youxian Gongsi.
Room 135, Longguang Jiuyu Mansion, No. 115
Guanlan Avenue, Xinhe Community, Fucheng
Street, Longhua District, Shenzhen, China.
*
*
Si’En Qingdao Co. Ltd., a.k.a., the following five
aliases:
—Si’EN;
—SiEn (Qingdao) Semiconductor Corporation
Co.;
—SiEn (Qingdao) Integrated Circuits Co., Ltd.;
—SiEn; and
—XinEn.
Building M, No. 1088, Shanwanghe Road, West
Coast New District, Qingdao, China; and
Room 401, German Enterprise South Zone,
No. 19 Taibaishan Road, Huangdao District,
Qingdao, China.
*
*
SJ Semiconductor, a.k.a., the following two
aliases:
—SJ Semiconductor (Jiangyin) Corp.; and
—SJ Jiangyin.
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
Presumption of denial
except case-by-case
for items not described in ECCN
3B001.a.4, .c, .d,
f.1.b.2, .k to .p;
3B002.c, 3B993, or
3B994.
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
See §§ 744.11 and
744.23(d) of the
EAR.
*
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
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6 Dongsheng West Road, Building A8–4,
Jiangyin City, Jiangsu Province, 214437,
China.
*
*
Skyverse, a.k.a., the following two aliases:
—Shenzhen Nanolighting Technology Co., Ltd;
and
—Nanolighting Lab.
Room 101, 201, and 301, No. 2 Dalang Street,
Tongsheng Community, Shanghenglang
Fourth Industrial Zone, Shenzhen, China; and
Rooms 1401 through 1404, Floor 14, Building
7, No. 19 Beiyuan East Road, Chaoyang District, Beijing, China; and Room 102–B3, Building 8B, Shahu Science and Technology Park,
No. 183 Tinglan Lane, Suzhou, China; and
Building 2, Workshop Area, No. 1301–18,
Yinxing Technology Park, Longhua District,
Shenzhen, China.
Skyverse Limited, a.k.a., the following one alias:
—Hong Kong Zhongke Feice.
1008, Prosperity Millennia Plaza, 663 King’s Rd,
Tsat Tsz Mui, Hong Kong.
*
*
SMIC Advanced Technology R&D (Shanghai)
Corporation, a.k.a., the following seven
aliases:
—SMIC New Technology Research and Development (Shanghai) Corporation;
—SMIC New Technology R&D (Shanghai) Corporation;
—SMIC Advanced Technology Research & Development (Shanghai) Corporation;
—Zhongxin Guoji Jicheng Dianlu Xinjishu Yanfa
(Shanghai) Youxian Gongsi;
—SMIC Advanced Technology;
—SMIC New Technology; and
—SMIC New Technology Research & Development.
18 Zhangjiang Road, Pudong New Area, Shanghai, China; and 6th Floor, Building 3, No. 18,
Zhangjiang Road, China (Shanghai) Pilot Free
Trade Zone Shanghai, Shanghai, 201203
China.
SMIC Holdings Limited, Building 1, No. 1059
Dangui Road, China (Shanghai) Pilot Free
Trade Zone, Shanghai, China.
SMIC Hong Kong International Company Limited, a.k.a., the following one alias:
—SMIC Hong Kong.
Suite 3003, 30th Floor, No. 9 Queen’s Road,
Central, Hong Kong.
SMIC Northern Integrated Circuit Manufacturing
(Beijing) Co., Ltd., a.k.a., the following two
aliases:
—Semiconductor Manufacturing North China
(Beijing) Corporation; and
—SMIC North.
Building 9, No. 18 Wenchang Avenue, Beijing
Economic and Technological Development
Zone, Beijing, China.
SMIC Semiconductor Manufacturing (Shanghai)
Co., Ltd., a.k.a., the following one alias:
—Suzhou Design Center.
Room 602, Building 1, No.158 Suya Road,
Suzhou Industrial Park, China.
*
*
Suzhou Nanda Optoelectronic Materials Co.,
Ltd., a.k.a., the following two aliases:
—Suzhou Nata; and
—Suzhou Nanda.
No. 40, Pingsheng Road, Suzhou Industrial
Park, Suzhou, China; and No. 67, Pingsheng
Road, Suzhou Industrial Park, Suzhou, China.
*
*
VerDate Sep<11>2014
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*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
See §§ 744.11
744.23(d) of
EAR.
See §§ 744.11
744.23(d) of
EAR.
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
85 FR 83420, 12/22/20. 85 FR
83769, 12/23/20. 86 FR
12531, 3/4/21. 89 FR [INSERT FR PAGE NUMBER]
December 5, 2024.
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
Entity
16:58 Dec 04, 2024
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For all items subject to the EAR
(See § 744.11 of the EAR).
and
the
and
the
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
Presumption of denial
For all items subject to the EAR
(See § 744.11 of the EAR).
See §§ 744.11 and
744.23(d) of the
EAR.
85 FR 83420, 12/22/20. 89 FR
[INSERT FR PAGE NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
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requirement
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review policy
Federal Register
citation
SwaySure Technology Co., Ltd., a.k.a., the following four aliases:
—SwaySure;
—Shenzhen ShengWeixu Technology Company;
—Sheng Weixu; and
—SWX.
Xiangshan Science and Technology Park, No. 1
Guiping Road, Fucheng Street, Longua District, Shenzhen City, Guangdong Province,
China; and Floor 54–56, Building C, Digital Innovation Center, No. 328 Mintang Road,
Longhua District, Shenzhen City, Guangdong
Province, China; and Room 104, Building B,
No. 1 Xinyuan 3rd Lane, Fuchengao Community, Pinghu Street, Longgang District,
Shenzhen, China.
*
*
Taiyuan Jinke Semiconductor Technology Co.,
Ltd., Area A, 4th Floor, No. 5 Fengze Road,
Taiyuan, China.
*
*
Ulanqab Nanda Microelectronics Materials Co.,
Ltd., a.k.a., the following four aliases:
—Ulanqab Nata;
—Ulanqab Nanda;
—Ulanqab Nata Microelectronics; and
—Ulanqab Nanda Microelectronics.
Room 101, Building 5, Zone B, Business,
Science, Technology and Culture Center,
Jining District, Ulanqab, China.
*
*
Wingtech Technology Co., Ltd., a.k.a., the following one alias:
—WINGTECH.
No. 18 East Xincheng Road, Wangren Town,
Huangshi Development Zone, Tieshan District,
Hubei Province, China; and 4th through 6th
floors of Bldg. 4 of Juxin Yuan, No. 188
Pingfu Rd. Xuhui District, Shanghai, China;
and Zhongqing Mansion, No. 42 Gaoxin 6th
Rd. High Tech Zone, Xi’an, China; and No.
777 Yazhong Rd. Jiaxing, Zhejiang, China;
and 11 Changjiang South Rd. Xinwu Dist.,
Wuxi, Jiangsu, China; and 7 Shenzhou Rd.,
Science City Guangzhou High Tech Industrial
Development Zone, Guangzhou, China; and
5097 Luosha Road, Yinfeng Area, Shenzhen,
China; and No. 1003, Yanhe North Road,
Jingji Oriental Duhui Area, Shenzhen, China.
Wise Road Capital a.k.a., the following three
aliases:
—Beijing Wise Road Management Co., Ltd.;
—Beijing Zhilu Asset Management Co., Ltd.;
and
—Zhilu Asset.
2/F, Beijing International Club Office Tower, No.
21 Jian Guo Men Wai Street, Chaoyang District, Beijing, China and Room 1810, Bund
Center, 222 Yan An East, Huangpu District,
Shanghai, China and Room 901–3, 9th Floor,
Building 57, No. 2 Jingyuan North Street, Beijing Economic and Technological Development Zone, Beijing, China and Room 8–50,
Building 6, Ronghui Garden, Linkong Economic Core Zone, Shunyi District, Beijing,
China.
*
*
Wuhan Naura Microelectronics Equipment Co.,
Ltd., a.k.a. the following two aliases:
—Wuhan Naura; and
—Wuhan Naura Microelectronics.
Fifth Floor, Hubei Marine Engineering Equipment Research Institute, Taolin Road,
Jiangxia District, Wuhan, China.
*
*
Wuhan Skyverse Semiconductor Technology
Co., Ltd., a.k.a., the following one alias:
—Wuhan Nanolighting Semiconductor Technology Co., Ltd.
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
Presumption of denial
except case-by-case
for items not described in ECCN
3B001.a.4, .c, .d,
f.1.b.2, .k to .p;
3B002.c, 3B993, or
3B994.
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
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Room 201, 2nd Floor, Building C2, Phase I,
Longshan Innovation Park, Wuhan Future
Science and Technology City, No. 999 Gaoxin
Avenue, East Lake New Technology Development Zone, Wuhan, China.
Wuhan Xinxin Semiconductor Manufacturing
Company Limited, a.k.a., the following one
alias:
—XMC.
No. 18 Gaoxin Four Road, East Lake High-Tech
Development Zone, Wuhan, China; and 3rd
Floor, Area E, Shengyin Building, Shengxia
Road, Pudong New District, Shanghai, China;
and Room B504, Building B, International
Science and Technology Park Phase II, No.
1355 Jinjihu Avenue, Suzhou Industrial Park,
Suzhou, China; and T2 1909, Fangda City,
No. 2 Longzhu 4th Road, Nanshan District,
Shenzhen, China.
Wuhan Yiguang Technology Co., Ltd., a.k.a., the
following one alias:
—Wuhan eoptics Technology.
Building 6, No. 10, Financial Gang 4th Road,
East Lake New Technology Development
Zone, Wuhan, China.
Wuxi Kaishitong Technology Co., Ltd., a.k.a.,
the following one alias:
—Wuxi Kingstone Technology.
Room 201, plot on the west side of the new 312
National Highway, Shuofang, Wuxi New District, on the north side of Xijin Road (in the
Airport Industrial Park), Wuxi, China; and
Room 201, Building 14, Xutian Technology
Park, No. 53 Xiuxi Road, Binhu District, Wuxi,
China.
*
*
Wuxi Naura Microelectronics Equipment Co.,
Ltd., a.k.a., the following two aliases:
—Wuxi Naura; and
—Wuxi Naura Microelectronics.
IC Design Building B1007, 33 Xinda Road,
Xinwu District, Wuxi, China.
*
*
Xiamen Skyverse Technology Co., Ltd., a.k.a.,
the following one alias:
—Xiamen Nanolighting Technology Co., Ltd.,
Unit 1623, No. 567 Haicang Avenue, Xiamen,
China.
*
*
Xi’an Huada Jiutian Technology Co., Ltd., a.k.a.,
the following two aliases:
—Xi’an Huada; and
—Xi’an Empyrean.
Unit 8F, Floor G1, Xi’an Huanpu International
Technology Yuan, No. 211, Tiangu 8th Road,
High-tech Zone, Xi’an, China.
*
*
Xi’an Naura Microelectronics Equipment Co.,
Ltd., a.k.a., the following two aliases:
—Xi’an Naura; and
—Xi’an Naura Microelectronics.
Floor 4, Building D, National Service Outsourcing Demonstration Base, No. 11 Jinye 1st
Road, High-tech Zone, Xi’an, China.
*
*
Xinlian Rongchuang Integrated Circuit Industry
Development (Beijing) Co., Ltd., No. 19,
Ronghua Middle Road, Room 312, 3rd Floor,
Building B, Beijing Economic and Technological Development Zone, Beijing, China.
*
*
Yusheng Micro Semiconductor (Shanghai) Co.,
Ltd., 1F–A, 2F–A, Building 2, No. 365
Chuanhong Road, Pudong New District,
Shanghai, China.
*
*
Yuwei Semiconductor Technology Co., Ltd.,
a.k.a., the following two aliases:
—Yuweitek; and
—Yuwei Semiconductor.
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Federal Register
citation
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
See §§ 740.26,
744.11, and
744.23(d) of the
EAR.
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
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(See § 744.11 of the EAR).
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(See § 744.11 of the EAR).
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NUMBER] December 5, 2024.
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(See § 744.11 of the EAR).
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NUMBER] December 5, 2024.
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NUMBER] December 5, 2024.
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*
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(See § 744.11 of the EAR).
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NUMBER] December 5, 2024.
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*
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(See § 744.11 of the EAR).
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*
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NUMBER] December 5, 2024.
*
*
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(See § 744.11 of the EAR).
*
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*
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NUMBER] December 5, 2024.
*
*
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(See § 744.11 of the EAR).
*
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*
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(See § 744.11 of the EAR).
*
Presumption of denial
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NUMBER AND DATE OF
PUBLICATION IN THE FEDERAL REGISTER].
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NUMBER AND DATE OF
PUBLICATION IN THE FEDERAL REGISTER].
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JAPAN ...................
*
SINGAPORE .........
*
*
*
Kingsemi Japan K.K., a.k.a., the following two
aliases:
—Kingsemi Kyoto K.K.; and
—Kingsemi.
680–1, Omandokorocho, Sagaru, Bukkoji,
Karasumadoori, Shimogyo-Ku Daihachi Hase
Bldg. 9F–B Kyoto, Kyoto, 600–8413 Japan.
*
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requirement
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review policy
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citation
*
*
For all items subject to the EAR
(See §§ 734.4(a)(9),
734.9(e)(3), and 744.11 of the
EAR) 5.
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
*
Presumption of denial
*
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
Entity
Building 1, No. 469, Huatuo Lane, High-tech
Zone, Hefei, China; and Room 295, Building
1, No. 1531, Jincheng East Road, Jiangxi
Street, Xinwu District, Wuxi, China; and Room
302–1, Building E1, Saida Testing and Certification Park, No. 5, Xinghua Third Branch
Road, Xiqing Economic and Technological
Development Zone, Tianjin, China; and Room
404, Qingfeng Rongsheng Venture Capital
Building, No. 88–8, Bagua 3rd Road, Shanglin
Community, Yuanling Street, Futian District,
Shenzhen, China; and Room 309, Building 5,
No. 29, Qingxiang South Road, Daxing District, Beijing, China; and Room 202, 2nd Floor
and Room 01, Building 10, No. 899 Zuchong
Road, Shanghai, China.
*
*
Zhangjiang Laboratory, a.k.a., the following
three aliases:
—Zhangjiang Lab;
—Zhangjiang National Lab; and
—ZJLab.
No. 100, Haike Road, Pudong New Area,
Shanghai, China; and No. 99, Haike Road,
Pudong New Area, Shanghai, China.
*
*
Zhejiang Shenqihang Technology Co., Ltd., No.
17, Binhe Road, Qingshan Lake Street, Lin’an
District, Hangzhou, China.
*
*
Zhejiang Zhichun Precision Manufacturing Co.,
Ltd., Room 412, Building 1, No. 8, Xinzhong
Road, Haining Economic Development Zone
(Haichang Street), Haining City, Jiaxing, China.
Zhiwei Semiconductor (Shanghai) Co., Ltd.,
a.k.a., the following one alias:
—Ultron.
Room 306, Building 1, No. 170 Zihai Road,
Minhang District, Shanghai. China.
Zhiyi High Purity Electronic Materials (Shanghai)
Ltd., a.k.a., the following one alias:
—Finetron.
Room 306, Building 1, No. 170 Zihai Road,
Minhang District, Shanghai. China.
*
*
Zhuhai Cornerstone Technology Co., Ltd., a.k.a.,
the following one alias:
—Cornerstone Technologies Company.
Room 602, Building 1, No. 18, Nangang Middle
Road, Zhuhai, China.
Zhuhai Skyverse Technology Co., Ltd., a.k.a.,
the following one alias:
—Zhuhai Nanolighting Technology Co., Ltd.
Card No. 03, Room 401, Building 21, No. 1889
Huandao East Road, Hengqin New District,
Zhuhai, China.
*
*
Zibo Keyuanxin Fluorine Trading Ltd., No. 5,
Road 4, Gaoqing Chemical Industry Park,
Gaocheng Town, Gaoqing County, Zibo,
China.
*
*
*
*
Skyverse Pte. Ltd., a.k.a., the following one
alias:
—Skyverse.
#14–08, Keppel Bay Tower, 1 Harbourfront Avenue, 098632, Singapore.
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SOUTH KOREA ....
*
*
*
ACM Research Korea Co., Ltd., 402, Hyundai
City Plaza, 2106 Gyeong chung-daero, Bubaleup, Icheon-si, Gyeonggi-do, South Korea.
Empyrean Korea, No. 178, 602, Bangyoe-ro,
Bundang-gu, Seongnam-si, Gyeonggi-do
(Sampyeong-dong), South Korea.
*
*
*
*
*
License
review policy
*
*
*
Federal Register
citation
*
*
*
*
*
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
89 FR [INSERT FR PAGE
NUMBER] December 5, 2024.
For all items subject to the EAR
(See § 744.11 of the EAR).
Presumption of denial
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NUMBER] December 5, 2024.
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
5 For this entity, ‘‘items subject to the EAR’’ includes foreign-produced items that are subject to the EAR under § 734.9(e)(3) of the EAR. See § 744.11(a)(2)(v) for
related license requirements and license application review policy.
Comp., p. 783; Notice of August 13, 2024, 8
FR 66187 (August 15, 2024).
PART 748—APPLICATIONS
(CLASSIFICATION, ADVISORY, AND
LICENSE) AND DOCUMENTATION
Supplement No. 7 to Part 748—
[Amended]
3. The authority citation for part 748
is revised to read as follows:
■
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‘‘Advanced Micro-Fabrication
Equipment, Inc., China’’, ‘‘CSMC
Technologies Corporation’’, and
■
Authority: 50 U.S.C. 4801–4852; 50 U.S.C.
4601 et seq.; 50 U.S.C. 1701 et seq.; E.O.
13026, 61 FR 58767, 3 CFR, 1996 Comp., p.
228; E.O. 13222, 66 FR 44025, 3 CFR, 2001
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‘‘Shanghai Huahong Grace
Semiconductor Manufacturing
Corporation’’ in ‘‘China (People’s
Republic of)’’.
Matthew S. Borman,
Principal Deputy Assistant Secretary for
Strategic Trade and Technology Security.
[FR Doc. 2024–28267 Filed 12–2–24; 8:45 am]
BILLING CODE 3510–33–P
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Agencies
[Federal Register Volume 89, Number 234 (Thursday, December 5, 2024)]
[Rules and Regulations]
[Pages 96830-96854]
From the Federal Register Online via the Government Publishing Office [www.gpo.gov]
[FR Doc No: 2024-28267]
-----------------------------------------------------------------------
DEPARTMENT OF COMMERCE
Bureau of Industry and Security
15 CFR Parts 744 and 748
[Docket No. 241126-0303]
RIN 0694-AJ77
Additions and Modifications to the Entity List; Removals From the
Validated End-User (VEU) Program
AGENCY: Bureau of Industry and Security, Commerce.
ACTION: Final rule.
-----------------------------------------------------------------------
SUMMARY: In this final rule, the Bureau of Industry and Security (BIS)
amends the Export Administration Regulations (EAR) by adding 140
entities to the Entity List. These entries are listed on the Entity
List under the destinations of China, People's Republic of (China),
Japan, South Korea, and Singapore and have been determined by the U.S.
Government to be acting contrary to the national security and foreign
policy interests of the United States. This final rule also modifies 14
existing entries on the Entity List, consisting of revisions to 14
entries under China. This final rule publishes concurrently with BIS's
interim final rule, ``Foreign-Produced Direct Product Rule Additions,
and Refinements to Controls for Advanced Computing and Semiconductor
Manufacturing Items'' (0694-AJ74), which makes additional changes to
the EAR controls on advanced computing items and semiconductor
manufacturing items. This final rule is part of this larger effort to
ensure that appropriate EAR controls are in place on these items,
including in connection with transactions destined to or otherwise
involving the entities being added to the Entity List, as well as for
existing entries on the Entity List that are being modified. All of
these entities (those newly added and those being modified) are
involved with the development and production of ``advanced-node
integrated circuits'' (``advanced-node ICs'') and/or semiconductor
manufacturing items, and/or have supported the Chinese government's
Military-Civil Fusion (MCF) Development Strategy. Additionally, this
final rule designates nine of these entities being added and seven of
the entries being modified as entities for which entity-specific
restrictions involving foreign-produced items apply. This final rule
also amends the EAR by removing three entities from the Validated End-
User (VEU) Program.
DATES:
Effective date: This rule is effective December 2, 2024.
Compliance date: The changes being made in this final rule that
pertain to Entity List license requirements and other Entity List-
related requirements linked to Footnote 5 designations have a
compliance date of December 31, 2024.
FOR FURTHER INFORMATION CONTACT: For questions on the Entity List and
VEU Program changes in this final rule, contact Chair, End-User Review
Committee, Office of the Assistant Secretary for Export Administration,
Bureau of Industry and Security, Department of Commerce, Phone: (202)
482-5991, Email: [email protected].
SUPPLEMENTARY INFORMATION:
I. Background
A. Entity List and End-User Review Committee (ERC)
The Entity List (supplement no. 4 to part 744 of the EAR (15 CFR
parts 730 through 774)) identifies entities for which there is
reasonable cause to believe, based on specific and articulable facts,
that the entities have been involved, are involved, or pose a
significant risk of being or becoming involved in activities contrary
to the national security or foreign policy interests of the United
States, pursuant to Sec. 744.11(b). The EAR imposes additional license
requirements on, and limit the availability of, most license exceptions
for exports, reexports, and transfers (in-country) when an entity
listed on the Entity List is a party to the transaction. The license
review policy for each listed entity is identified in the ``License
Review Policy'' column on the Entity List, and the impact on the
availability of license exceptions is described in the relevant Federal
Register document that added the entity to the Entity List. BIS places
entities on the Entity List pursuant to parts 744 (Control Policy: End-
User and End-Use Based) and 746 (Embargoes and Other Special Controls)
of the EAR.
The ERC, composed of representatives of the Departments of Commerce
(Chair), State, Defense, Energy and, where appropriate, the Treasury,
makes all decisions regarding additions to, removals from, or other
modifications to the Entity List. The ERC makes all decisions to add an
entry to the Entity List by majority vote and makes all decisions to
remove or modify an entry by unanimous vote.
[[Page 96831]]
B. Addressing National Security and Foreign Policy Concerns Involving
Advanced Computing and Semiconductor Manufacturing Items
This final rule is published concurrently with the interim final
rule, ``Foreign-Produced Direct Product Rule Additions, and Refinements
to Controls for Advanced Computing and Semiconductor Manufacturing
Items'' (0694-AJ74) (FDP IFR), which makes additional changes to the
EAR controls on advanced computing items or semiconductor manufacturing
items, including new Foreign Direct Product (FDP) rules for certain
commodities to impair the capability of certain destinations or
entities of concern to produce ``advanced-node ICs.'' This final rule
is part of the larger effort reflected in the FDP IFR to ensure
appropriate EAR controls are in place on advanced computing items and
semiconductor manufacturing items, including in connection with the
entities being added to the Entity List, as well as for existing Entity
List entries that are being modified. All of these entities, both those
being added and those whose entries are being modified, are involved
with the development and production of these ``advanced-node ICs'' and/
or semiconductor manufacturing items, and/or have supported the Chinese
government's MCF Development Strategy, activities that have been
determined to be contrary to U.S. national security and foreign policy
interests. The FDP IFR also adds one new FDP rule to Sec. 734.9
(Foreign-Direct Product Rules) that will be set forth in paragraph
(e)(3) (Entity List FDP rule: Footnote 5). BIS has designated nine of
the 140 entities being added to the Entity List in this rule with a
Footnote 5, which extends the Entity List license requirements to
foreign direct products subject to the EAR on the basis of Sec.
734.9(e)(3). Foreign-made items specified in certain ECCNs that are
destined to an entity with a Footnote 5 designation may also be subject
to the EAR on the basis of the de minimis provision described in Sec.
734.4(a)(9). Entities designated with a Footnote 5 designation have
been determined by the ERC to be involved in, or risk becoming involved
in, the development or production of ``advance-node ICs'' that would
otherwise require a license under Sec. 744.23(a)(2). Section
744.23(a)(2) imposes a license requirement for any item subject to the
EAR when you know the items will be used in the ``development'' or
``production'' of ICs destined to a ``facility'' located in Macau or a
destination specified in Country Group D:5 where ``production'' of
``advanced-node ICs'' occurs.
II. Entity List Decisions
A. Additions to the Entity List
The ERC determined to add the following 106 entities to the Entity
List: ACM Research (Shanghai); Beijing E-Town Semiconductor Technology
Co., Ltd.; Beijing Guowei Integration Technology Co., Ltd.; Beijing
Huada Jiutian Technology Co., Ltd.; Beijing Kaishitong Semiconductor
Co., Ltd.; Beijing Naura Microelectronics Equipment Co., Ltd.; Beijing
Naura Semiconductor Equipment Co., Ltd.; Beijing Sevenstar Flowmeter
Co., Ltd.; Beijing Sevenstar Integrated Circuit Equipment Co., Ltd.;
Beijing Shuoke Zhongkexin Electronic Equipment Co., Ltd.; Beijing
Skyverse Technology Co., Ltd.; Beijing Zhongke Xin Electronic
Equipment; Changsha Zhichun Application Technology Co., Ltd.; Chengdu
Huada Jiutianke Technology Co., Ltd.; Chengdu Skyverse Technology Co.,
Ltd.; Guangzhou Huada Jiutian Technology Co., Ltd.; Guangzhou Skyverse
Technology Co., Ltd.; Guowei Group (Shenzhen) Co., Ltd.; Hefei
Kaishitong Semiconductor Co., Ltd.; Hefei Naura Microelectronics
Equipment Co., Ltd.; Hefei Zhihui Semiconductor Application Technology
Co., Ltd.; Hefei Zhiwei Microelectronics Co., Ltd.; Hefei Zhiwei
Semiconductor Co., Ltd.; Hwa Tsing (Beijing) Technology Co., Ltd.; Hwa
Tsing (Guangzhou) Semiconductor Co., Ltd.; Hwa Tsing (Shanghai)
Semiconductor Co., Ltd.; Hwa Tsing Technology Co., Ltd.; Jiangsu Nata
Optoelectronic Material Co., Ltd.; Jiangsu Qiwei Semiconductor
Equipment Co., Ltd.; Jiangsu Zhichun System Integration Co., Ltd.;
Kingstone Technology Hong Kong Limited; Nanda Optoelectronic
Semiconductor Materials Co., Ltd.; Nanjing Huada Jiutianke Technology
Co., Ltd.; Naura Technology Group Co., Ltd.; Ningbo Nanda
Optoelectronic Materials Ltd.; Piotech; Piotech (Beijing) Co., Ltd.;
Piotech (Shanghai) Co., Ltd.; Piotech Chuangyi (Shenyang) Semiconductor
Equipment Co., Ltd.; Piotech Jianke (Haining) Semiconductor Equipment
Co., Ltd.; Qingxin Technology Co., Ltd.; Quanjiao Nanda Optoelectronic
Materials Ltd.; Raintree Scientific Instruments (Shanghai) Corporation;
Ruili Microelectronics Equipment (Shanghai) Co., Ltd.; Shandong Feiyuan
Gas Co., Ltd.; Shanghai AGM Gas Co., Ltd.; Shanghai Aipusi Precision
Equipment Co., Ltd.; Shanghai Huada Jiutian Information Technology Co.,
Ltd.; Shanghai Jingce Semiconductor Technology Co., Ltd.; Shanghai
Jingzhuo Information Technology Co., Ltd.; Shanghai Kaishitong
Semiconductor Co., Ltd.; Shanghai Lingang Kaishitong Semiconductor Co.,
Ltd.; Shanghai Lizhi Technology Co., Ltd.; Shanghai Modern Advanced
Ultra-Precision Manufacturing Center Co., Ltd.; Shanghai Nanpre
Mechanics Co., Ltd.; Shanghai Naura Microelectronics Equipment Co.,
Ltd.; Shanghai Siwave Technology Co., Ltd.; Shanghai Skyverse
Semiconductor Technology Co., Ltd.; Shanghai Xinsheng Jingrui
Semiconductor Technology Co., Ltd.; Shanghai Xinsheng Jingtou
Semiconductor Technology Co., Ltd.; Shanghai Xinsheng Jinko
Semiconductor Technology Co., Ltd.; Shanghai Xinsheng Semiconductor
Technology Co., Ltd.; Shanghai Yanquan Technology Co., Ltd.; Shanghai
Yuwei Semiconductor Technology Co., Ltd; Shanghai Zhichun Alloy
Manufacturing Co., Ltd.; Shanghai Zhichun Electronic Technology Co.,
Ltd.; Shanghai Zhichun Optoelectronic Equipment Co., Ltd.; Shanghai
Zhichun Precision Gas Co., Ltd.; Shanghai Zhichun Precision
Manufacturing Co., Ltd.; Shanghai Zhichun Purification System
Technology Co., Ltd.; Shanghai Zhichun Semiconductor Equipment Co.,
Ltd; Shanghai Zhichun System Integration Co., Ltd.; Shanghai Zhijia
Semiconductor Gas Co., Ltd.; Shanghai Zixi Optical Technology Co.,
Ltd.; Shengmei Semiconductor Equipment (Beijing) Co., Ltd.; Shengmei
Semiconductor Equipment Wuxi Co., Ltd.; Shengwei Semiconductor
Equipment (Shanghai) Co., Ltd.; Shenyang Xinyuan Micro Business
Development Co., Ltd.; Shenyang Xinyuan Microelectronic Equipment Co.,
Ltd.; Shenzhen Guowei Hongbo Technology Co., Ltd.; Shenzhen Guowei
Sensing Technology Co., Ltd.; Shenzhen Guoweichip Technology Co., Ltd.;
Shenzhen Huada Jiutianke Technology Co., Ltd.; Shenzhen Naura
Microelectronics Equipment Co., Ltd.; Shenzhen Qianhai Skyverse
Semiconductor Technology Co., Ltd.; Skyverse; Skyverse Limited; Suzhou
Nanda Optoelectronic Materials Co., Ltd.; Taiyuan Jinke Semiconductor
Technology Co., Ltd.; Ulanqab Nanda Microelectronics Materials Co.,
Ltd.; Wuhan Naura Microelectronics Equipment Co., Ltd.; Wuhan Skyverse
Semiconductor Technology Co., Ltd.; Wuhan Yiguang Technology Co., Ltd.;
Wuxi Kaishitong Technology Co., Ltd.; Wuxi Naura Microelectronics
Equipment Co., Ltd.; Xiamen Skyverse Technology Co., Ltd.; Xi'an Huada
Jiutian Technology Co., Ltd.; Xi'an
[[Page 96832]]
Naura Microelectronics Equipment Co., Ltd.; Yusheng Micro Semiconductor
(Shanghai) Co., Ltd.; Yuwei Semiconductor Technology Co., Ltd.;
Zhejiang Shenqihang Technology Co., Ltd.; Zhejiang Zhichun Precision
Manufacturing Co., Ltd.; Zhiwei Semiconductor (Shanghai) Co., Ltd.;
Zhiyi High Purity Electronic Materials (Shanghai) Ltd.; Zhuhai Skyverse
Technology Co., Ltd.; and Zibo Keyuanxin Fluorine Trading Ltd. under
the destination of China. The ERC determined to add Kingsemi Japan K.K.
under the destination of Japan. The ERC determined to add Skyverse Pte.
Ltd. under the destination of Singapore. The ERC determined to add ACM
Research Korea Co., Ltd. and Empyrean Korea under the destination of
South Korea. These entities aid in the development or production of ICs
for military end use, activity that is contrary to the national
security and foreign policy interests of the United States under Sec.
744.11 of the EAR. A license will be required for all items subject to
the EAR, and a license application review policy of a presumption of
denial will apply.
The ERC also determined to add Shanghai Integrated Circuit
Equipment & Materials Industry Innovation Center Co., Ltd. and
Zhangjiang Laboratory, both under the destination of China, to the
Entity List, with a Footnote 5 designation. These entities aid in the
development or production of ICs for military end use and are involved
in the development or production of ``advanced-node ICs,'' activity
that is contrary to the national security and foreign policy interests
of the United States under Sec. Sec. 744.11 and 744.23 of the EAR. A
license will be required for all items subject to the EAR, including
those specified under Sec. 734.9(e)(3), which require a license under
Sec. 744.11(a)(2)(v) (Footnote 5). The license application review
policy is a presumption of denial.
The ERC determined to add Northern Integrated Circuit Technology
Innovation Center (Beijing) Co., Ltd., and SMIC Advanced Technology R&D
(Shanghai) Corporation, both under the destination of China, to the
Entity List with a Footnote 5 designation. These entities have acquired
or attempted to acquire U.S. tools or components, which risk supporting
the production of ``advanced-node ICs'' at facilities of entities that
are on the Entity List. This activity is contrary to the national
security and foreign policy interests of the United States under
Sec. Sec. 744.11 and 744.23 of the EAR. A license will be required for
all items subject to the EAR. Notably, this requirement applies to
items specified under Sec. 734.9(e)(3), which require a license under
Sec. 744.11(a)(2)(v). A license review policy of presumption of denial
will apply.
The ERC determined to add Changguang Jizhi Optical Technology Co.,
Ltd.; Shanghai Feiai Technology Co., Ltd.; Shanghai Yuliangsheng
Technology Co., Ltd.; Shenzhen Pengxinxu Technology Co., Ltd.; Shenzhen
SiCarrier Technologies Co., Ltd.; Shenzhen Xinkailai Industrial
Machinery Co., Ltd.; Shenzhen Zhangge Instrument Co., Ltd.; Si'En
Qingdao Co. Ltd.; SwaySure Technology Co., Ltd.; and Zhuhai Cornerstone
Technology Co., Ltd., all under the destination of China, to the Entity
List because they are, or pose a significant risk of becoming, involved
in activities contrary to the national security or foreign policy
interests of the United States. Specifically, these entities pose a
significant risk of contributing to the efforts of Huawei Technologies
Co., Ltd., a party on the Entity List, to support China's government's
goal of indigenous production of ``advanced-node ICs'' to support its
military modernization. This significant risk is a criterion for adding
entities to the Entity List under Sec. 744.11(b) of the EAR. For
Shenzhen Pengxinxu Technology Co., Ltd., Si'En Qingdao Co. Ltd., and
SwaySure Technology Co., Ltd., a license will be required for all items
subject to the EAR, including those specified under Sec. 734.9(e)(3),
which require a license under Sec. 744.11(a)(2)(v) (Footnote 5). For
Shenzhen Pengxinxu Technology Co., Ltd. and SwaySure Technology Co.,
Ltd., the license application review policy is a presumption of denial,
except case-by-case for review for applications involving items not
described in ECCN 3B001.a.4, .c, .d, f.1.b.2, .k to .p; 3B002.c, 3B993,
or 3B994. For Si'En Qingdao Co. Ltd., the license application review
policy is a presumption of denial. For Changguang Jizhi Optical
Technology Co., Ltd., Shanghai Feiai Technology Co., Ltd., Shanghai
Yuliangsheng Technology Co., Ltd., Shenzhen SiCarrier Technologies Co.,
Ltd., Shenzhen Xinkailai Industrial Machinery Co., Ltd., Shenzhen
Zhangge Instrument Co., Ltd., and Zhuhai Cornerstone Technology Co.,
Ltd., a license will be required for all items subject to the EAR. The
license application review policy will be a presumption of denial.
The ERC determined to add Wuhan Xinxin Semiconductor Manufacturing
Company Limited, under the destination of China, to the Entity List
with a Footnote 5 designation, for posing a significant risk of
becoming involved in activities contrary to the national security and
foreign policy interests of the United States under Sec. Sec. 744.11
and 744.23 of the EAR. This determination is based on information that
this company poses a significant risk of becoming involved in the
development or production of ``advanced-node ICs.'' A license will be
required for all items subject to the EAR, including those specified
under Sec. 734.9(e)(3), which require a license under Sec.
744.11(a)(2)(v) (Footnote 5). The license review standards set forth in
Sec. Sec. 744.11 and 744.23(d) will apply. This entity will be
eligible for license exception Restricted Fabrication Facility (RFF)
(Sec. 740.26), a new license exception added to part 740 (License
Exceptions) of the EAR pursuant to the FDP IFR published concurrently
with this final rule. License Exception RFF authorizes the export,
reexport, and in-country transfer of items described in ECCNs 3B991
(except 3B991.b.2.a through .b) and 3B992 that are not described in
ECCN 3B001.a.4, .c, .d, f.1.b.2, .k to .p; 3B002.c, 3B993, or 3B994,
subject to the requirements of Sec. 740.26.
The ERC determined to add JAC Capital, Wingtech Technology Co.,
Ltd., and Wise Road Capital under the destination of China to the
Entity List. These additions are being made because of these entities'
involvement in aiding China's government's efforts to acquire entities
with sensitive semiconductor manufacturing capability critical to the
defense industrial bases of the United States and its allies with the
objective of relocating these entities to China to help indigenize a
semiconductor manufacturing ecosystem. This activity is contrary to the
national security and foreign policy interests of the United States
under Sec. 744.11 of the EAR. A license will be required for all items
subject to the EAR, and a license review policy of a presumption of
denial will apply.
The ERC determined to add Beijing Guangke Xintu Technology Co.,
Ltd.; Beijing Jingyuan Microelectronics Technology Co., Ltd.; Dongfang
Jingyuan Electron Co., Ltd.; Oriental Crystal Microelectronics
Technology (Qingdao) Co., Ltd.; Oriental Crystal Microelectronics
Technology (Shanghai) Co., Ltd.; Shenzhen Jingyuan Information
Technology Co., Ltd.; and Xinlian Rongchuang Integrated Circuit
Industry Development (Beijing) Co., Ltd. under the destination of China
to the Entity List for activities contrary to the national security and
foreign policy interests of the United States under Sec. 744.11 of the
EAR. Specifically, these entities are co-developing lithography
[[Page 96833]]
technology with advanced-node fabrication facilities that produce chips
for military end use. A license will be required for all items subject
to the EAR, and a license review policy of a presumption of denial will
apply.
The ERC determined to add the Chinese Academy of Sciences Institute
of Microelectronics to the Entity List under the destination of China
with a Footnote 5 designation for its support of China's ``advanced-
node ICs'' and military modernization efforts, including the
development or production of ``advanced-node ICs'' for military end use
and collaboration with parties on the Entity List. This activity is
contrary to the national security and foreign policy interests of the
United States under Sec. Sec. 744.11 and 744.23 of the EAR. A license
will be required for all items subject to the EAR, including those
specified under Sec. 734.9(e)(3), which require a license under Sec.
744.11(a)(2)(v) (Footnote 5). A license review policy of presumption of
denial will apply.
The ERC determined to add AccoTest Technology Co., Ltd. (Hong
Kong), Beijing Huafeng Electronic Equipment Co., Ltd., Beijing Huafeng
Test & Control Technology Co., Ltd., and Huafeng Test & Control
Technology (Tianjin) Co., Ltd., all under the destination of China, to
the Entity List. These additions are being made because these entities
present a risk of diversion of U.S.-origin items to parties on the
Entity List, including entities that play a significant role in China's
military modernization. This activity is contrary to the national
security and foreign policy interests of the United States under Sec.
744.11 of the EAR. A license will be required for all items subject to
the EAR, and the license review policy will be a presumption of denial.
BIS estimates these additions to the Entity List will result in an
additional 200 license applications submitted to BIS annually.
For the reasons described above, this final rule adds the following
140 entities to the Entity List and includes, where appropriate,
aliases:
China
AccoTest Technology Co., Ltd. (Hong Kong);
ACM Research (Shanghai);
Beijing E-Town Semiconductor Technology Co., Ltd.;
Beijing Guangke Xintu Technology Co., Ltd.;
Beijing Guowei Integration Technology Co., Ltd.;
Beijing Huada Jiutian Technology Co., Ltd.;
Beijing Huafeng Electronic Equipment Co., Ltd.;
Beijing Huafeng Test & Control Technology Co., Ltd.;
Beijing Jingyuan Microelectronics Technology Co., Ltd.;
Beijing Kaishitong Semiconductor Co., Ltd.;
Beijing Naura Microelectronics Equipment Co., Ltd.;
Beijing Naura Semiconductor Equipment Co., Ltd.;
Beijing Sevenstar Flowmeter Co., Ltd.;
Beijing Sevenstar Integrated Circuit Equipment Co., Ltd.;
Beijing Shuoke Zhongkexin Electronic Equipment Co., Ltd.;
Beijing Skyverse Technology Co., Ltd.;
Beijing Zhongke Xin Electronic Equipment;
Changguang Jizhi Optical Technology Co., Ltd.;
Changsha Zhichun Application Technology Co., Ltd.;
Chengdu Huada Jiutianke Technology Co., Ltd.;
Chengdu Skyverse Technology Co., Ltd.;
Chinese Academy of Sciences Institute of Microelectronics;
Dongfang Jingyuan Electron Co., Ltd.;
Guangzhou Huada Jiutian Technology Co., Ltd.;
Guangzhou Skyverse Technology Co., Ltd.;
Guowei Group (Shenzhen) Co., Ltd.;
Hefei Kaishitong Semiconductor Co., Ltd.;
Hefei Naura Microelectronics Equipment Co., Ltd.;
Hefei Zhihui Semiconductor Application Technology Co.,
Ltd.;
Hefei Zhiwei Microelectronics Co., Ltd.;
Hefei Zhiwei Semiconductor Co., Ltd.;
Huafeng Test & Control Technology (Tianjin) Co., Ltd.;
Hwa Tsing (Beijing) Technology Co., Ltd.;
Hwa Tsing (Guangzhou) Semiconductor Co., Ltd.;
Hwa Tsing (Shanghai) Semiconductor Co., Ltd.;
Hwa Tsing Technology Co., Ltd.;
JAC Capital;
Jiangsu Nata Optoelectronic Material Co., Ltd.;
Jiangsu Qiwei Semiconductor Equipment Co., Ltd.;
Jiangsu Zhichun System Integration Co., Ltd.;
Kingstone Technology Hong Kong Limited;
Nanda Optoelectronic Semiconductor Materials Co., Ltd.;
Nanjing Huada Jiutianke Technology Co., Ltd.;
Naura Technology Group Co., Ltd.;
Ningbo Nanda Optoelectronic Materials Ltd.;
Northern Integrated Circuit Technology Innovation Center
(Beijing) Co., Ltd.;
Oriental Crystal Microelectronics Technology (Qingdao)
Co., Ltd.;
Oriental Crystal Microelectronics Technology (Shanghai)
Co., Ltd.;
Piotech;
Piotech (Beijing) Co., Ltd.;
Piotech (Shanghai) Co., Ltd.;
Piotech Chuangyi (Shenyang) Semiconductor Equipment Co.,
Ltd.;
Piotech Jianke (Haining) Semiconductor Equipment Co.,
Ltd.;
Qingxin Technology Co., Ltd.;
Quanjiao Nanda Optoelectronic Materials Ltd.;
Raintree Scientific Instruments (Shanghai) Corporation;
Ruili Microelectronics Equipment (Shanghai) Co., Ltd.;
Shandong Feiyuan Gas Co., Ltd.;
Shanghai AGM Gas Co., Ltd.;
Shanghai Aipusi Precision Equipment Co., Ltd.;
Shanghai Feiai Technology Co., Ltd.;
Shanghai Huada Jiutian Information Technology Co., Ltd.;
Shanghai Integrated Circuit Equipment & Materials Industry
Innovation Center Co., Ltd.;
Shanghai Jingce Semiconductor Technology Co., Ltd.;
Shanghai Jingzhuo Information Technology Co., Ltd.;
Shanghai Kaishitong Semiconductor Co., Ltd.;
Shanghai Lingang Kaishitong Semiconductor Co., Ltd.;
Shanghai Lizhi Technology Co., Ltd.;
Shanghai Modern Advanced Ultra-Precision Manufacturing
Center Co., Ltd.;
Shanghai Nanpre Mechanics Co., Ltd.;
Shanghai Naura Microelectronics Equipment Co., Ltd.;
Shanghai Siwave Technology Co., Ltd.;
Shanghai Skyverse Semiconductor Technology Co., Ltd.;
Shanghai Xinsheng Jingrui Semiconductor Technology Co.,
Ltd.;
Shanghai Xinsheng Jingtou Semiconductor Technology Co.,
Ltd.;
Shanghai Xinsheng Jinko Semiconductor Technology Co.,
Ltd.;
Shanghai Xinsheng Semiconductor Technology Co., Ltd.;
Shanghai Yanquan Technology Co., Ltd.;
Shanghai Yuliangsheng Technology Co., Ltd.;
[[Page 96834]]
Shanghai Yuwei Semiconductor Technology Co., Ltd.;
Shanghai Zhichun Alloy Manufacturing Co., Ltd.;
Shanghai Zhichun Electronic Technology Co., Ltd.;
Shanghai Zhichun Optoelectronic Equipment Co., Ltd.;
Shanghai Zhichun Precision Gas Co., Ltd.;
Shanghai Zhichun Precision Manufacturing Co., Ltd.;
Shanghai Zhichun Purification System Technology Co., Ltd.;
Shanghai Zhichun Semiconductor Equipment Co., Ltd;
Shanghai Zhichun System Integration Co., Ltd.;
Shanghai Zhijia Semiconductor Gas Co., Ltd.;
Shanghai Zixi Optical Technology Co., Ltd.;
Shengmei Semiconductor Equipment (Beijing) Co., Ltd.;
Shengmei Semiconductor Equipment Wuxi Co., Ltd.;
Shengwei Semiconductor Equipment (Shanghai) Co., Ltd.;
Shenyang Xinyuan Micro Business Development Co., Ltd.;
Shenyang Xinyuan Microelectronic Equipment Co., Ltd.;
Shenzhen Guowei Hongbo Technology Co., Ltd.;
Shenzhen Guowei Sensing Technology Co., Ltd.;
Shenzhen Guoweichip Technology Co., Ltd.;
Shenzhen Huada Jiutianke Technology Co., Ltd.;
Shenzhen Jingyuan Information Technology Co., Ltd.;
Shenzhen Naura Microelectronics Equipment Co., Ltd.;
Shenzhen Pengxinxu Technology Co., Ltd.;
Shenzhen Qianhai Skyverse Semiconductor Technology Co.,
Ltd.;
Shenzhen SiCarrier Technologies Co., Ltd.;
Shenzhen Xinkailai Industrial Machinery Co., Ltd.;
Shenzhen Zhangge Instrument Co., Ltd.;
Si'En Qingdao Co. Ltd.;
Skyverse;
Skyverse Limited;
SMIC Advanced Technology R&D (Shanghai) Corporation;
Suzhou Nanda Optoelectronic Materials Co., Ltd.;
SwaySure Technology Co., Ltd.,
Taiyuan Jinke Semiconductor Technology Co., Ltd.;
Ulanqab Nanda Microelectronics Materials Co., Ltd.;
Wingtech Technology Co., Ltd.;
Wise Road Capital;
Wuhan Naura Microelectronics Equipment Co., Ltd.;
Wuhan Skyverse Semiconductor Technology Co., Ltd.;
Wuhan Xinxin Semiconductor Manufacturing Company Limited;
Wuhan Yiguang Technology Co., Ltd.;
Wuxi Kaishitong Technology Co., Ltd.;
Wuxi Naura Microelectronics Equipment Co., Ltd.;
Xiamen Skyverse Technology Co., Ltd.;
Xi'an Huada Jiutian Technology Co., Ltd.;
Xi'an Naura Microelectronics Equipment Co., Ltd.;
Xinlian Rongchuang Integrated Circuit Industry Development
(Beijing) Co., Ltd.;
Yusheng Micro Semiconductor (Shanghai) Co., Ltd.;
Yuwei Semiconductor Technology Co., Ltd.;
Zhangjiang Laboratory;
Zhejiang Shenqihang Technology Co., Ltd.;
Zhejiang Zhichun Precision Manufacturing Co., Ltd.;
Zhiwei Semiconductor (Shanghai) Co., Ltd.;
Zhiyi High Purity Electronic Materials (Shanghai) Ltd.;
Zhuhai Cornerstone Technology Co., Ltd.;
Zhuhai Skyverse Technology Co., Ltd.; and
Zibo Keyuanxin Fluorine Trading Ltd.
Japan
Kingsemi Japan K.K.
Singapore
Skyverse Pte. Ltd.
South Korea
ACM Research Korea Co., Ltd.; and
Empyrean Korea.
B. Modifications to the Entity List
This final rule implements the decision of the ERC, or agency
members of the ERC, to modify certain entries by adding Footnote 5
designations, updating addresses, and/or revising license application
review policy. Footnote 5 designations are added to seven entities
under the destination of China: Fujian Jinhua Integrated Circuit
Company, Ltd.; PXW Semiconductor Manufactory Co., Ltd.; Semiconductor
Manufacturing International (Beijing) Corporation; Semiconductor
Manufacturing International Corporation (SMIC); Semiconductor
Manufacturing South China Corporation; Shanghai Integrated Circuit
Research and Development Center; and SMIC Northern Integrated Circuit
Manufacturing (Beijing) Co., Ltd. The ERC has determined that these
modifications for these entities are needed to further restrict their
ability to obtain foreign-produced items that could support the
production of ``advanced-node ICs'' as defined in Sec. 772.1 and
referenced in Sec. 744.23. China's indigenous ``advanced-node ICs''
and are associated with diversion or military modernization risks.
Inclusion on the Entity List under Sec. 744.11 of the EAR is
warranted, as these entities have been involved in activities that are
contrary to the national security and foreign policy interests of the
United States.
This rule also modifies the addresses for two entities under the
destination of China: Fujian Jinhua Integrated Circuit Company, Ltd.
and Semiconductor Manufacturing South China Corporation, to update
existing addresses and/or include additional addresses associated with
these entities.
In addition, this rule implements the decision of the ERC, or
agency members of the ERC, to modify the license review policy for
Semiconductor Manufacturing International (Beijing) Corporation;
Semiconductor Manufacturing South China Corporation; and SMIC Northern
Integrated Circuit Manufacturing (Beijing) Co., Ltd., to adopt a
presumption of denial license review policy. Lastly, this rule
implements the decision of the ERC to modify the license review policy
for Semiconductor Manufacturing International Corporation (SMIC), also
under the destination of China, to adopt a license review policy of a
presumption of denial for all items subject to the EAR, including items
described in ECCN 3B001.a.4, .c, .d, .f.1.b.2, .k to .p; 3B002.c,
3B993, or 3B994. Case-by-case will apply for items used for production
of 200mm wafers destined to a 200mm production facility.
The ERC also determined to modify the license review policy for
seven SMIC entries on the Entity List under the destination of China:
Ningbo Semiconductor International Corporation (NSI); Semiconductor
Manufacturing International (Shenzhen) Corporation; Semiconductor
Manufacturing International (Tianjin) Corporation; SJ Semiconductor;
SMIC Holdings Limited; SMIC Hong Kong International Company Limited;
and SMIC Semiconductor Manufacturing (Shanghai) Co. The license review
policy further restricts these parties' ``development'' or
``production'' of ``advanced-node ICs'' at semiconductor fabrication
``facilities'' in China. The license review standards set forth in
[[Page 96835]]
Sec. Sec. 744.11 and 744.23(d) will apply. The license review policy
is presumption of denial, except case-by-case when Sec. 744.23(d)(3)
of the EAR applies.
III. Validated End-User (VEU) Program Decisions
A. Authorization Validated End-User (VEU)
Validated End-Users (VEUs) are designated entities located in
eligible destinations to which eligible items subject to the EAR may be
exported, reexported, or transferred (in-country) under a general EAR
authorization instead of a license (see Sec. 748.15 (Authorization
Validated End-User (VEU)). The names of the VEUs, as well as the dates
they were designated, and the associated eligible destinations (i.e.,
facilities) and items are identified in supplement no. 7 to part 748 of
the EAR. Pursuant to Sec. 748.15, VEU-eligible destinations may obtain
eligible items without the need for the VEU's supplier to obtain an
export, reexport, or transfer (in-country) license from BIS. VEU-
eligible items vary among VEUs and may include commodities, software,
and/or technology, apart from items controlled for missile technology
or crime control reasons on the Commerce Control List (CCL) (supplement
no. 1 to part 774 of the EAR).
VEUs are reviewed and approved by the U.S. Government in accordance
with the provisions of Sec. 748.15 and supplement nos. 8 and 9 to part
748 of the EAR. The ERC is responsible for administering the VEU
program. BIS amended the EAR in a final rule published on June 19, 2007
(72 FR 33646) to create Authorization VEU.
B. Removals From the VEU Program Under China
Pursuant to Sec. 748.15 and supplement no. 9 to part 748 of the
EAR, the ERC determined to remove CSMC Technologies Corporation (CSMC);
Shanghai Huahong Grace Semiconductor Manufacturing Corporation
(HHGrace); and Advanced Micro-Fabrication Equipment, Inc., China,
a.k.a., Advanced Micro-Electronics Corporation (AMEC). AMEC also
requested to be removed from the VEU Program. This final rule
accordingly removes these three entities' entries from supplement no. 7
to part 748 (Authorization Validated End-User (VEU): List of Validated
End-Users, Respective Items Eligible for Export, Reexport and Transfer
(In-Country), and Eligible Destinations).
Savings Clause
For the changes being made in this final rule, apart from the
Entity List license requirements and other Entity List-related
requirements linked to Footnote 5 designations, shipments of items
removed from eligibility for a license exception or export, reexport,
or transfer (in-country) without a license (NLR) as a result of this
regulatory action that were en route aboard a carrier to a port of
export, reexport, or transfer (in-country), on December 2, 2024,
pursuant to actual orders for export, reexport, or transfer (in-
country) to or within a foreign destination, may proceed to that
destination under the previous eligibility for a License Exception or
export, reexport, or transfer (in-country) without a license (NLR),
provided the export, reexport, or transfer (in-country) is completed no
later than on January 2, 2025.
For the changes being made in this final rule that pertain to
Entity List license requirements and other Entity List-related
requirements linked to Footnote 5 designations, shipments of items
removed from eligibility for a license exception or export, reexport,
or transfer (in-country) without a license (NLR) as a result of this
regulatory action that were en route aboard a carrier to a port of
export, reexport, or transfer (in-country), on January 2, 2025,
pursuant to actual orders for export, reexport, or transfer (in-
country) to or within a foreign destination, may proceed to that
destination under the previous eligibility for a license exception or
export, reexport, or transfer (in-country) without a license (NLR),
provided the export, reexport, or transfer (in-country) is completed no
later than on January 31, 2025.
Export Control Reform Act of 2018
On August 13, 2018, the President signed into law the John S.
McCain National Defense Authorization Act for Fiscal Year 2019, which
included the Export Control Reform Act of 2018 (ECRA) (codified, as
amended, at 50 U.S.C. 4801-4852). ECRA provides the legal basis for
BIS's principal authorities and serves as the authority under which BIS
issues this rule. In particular, Section 1753 of ECRA (50 U.S.C. 4812)
authorizes the regulation of exports, reexports, and transfers (in-
country) of items subject to U.S. jurisdiction. Further, Section
1754(a)(1)-(16) of ECRA (50 U.S.C. 4813(a)(1)-(16)) authorizes, inter
alia, establishing and maintaining a list of foreign persons and end
uses that are determined to be a threat to the national security and
foreign policy of the United States pursuant to the policy set forth in
Section 1752(2)(A), and restricting exports, reexports, and in-country
transfers of any controlled items to any foreign person or end-use so
listed; apprising the public of changes in policy, regulations, and
procedures; and any other action necessary to carry out ECRA that is
not otherwise prohibited by law. Pursuant to Section 1762(a) of ECRA
(50 U.S.C. 4821(a)), these changes can be imposed in a final rule
without prior notice and comment.
Rulemaking Requirements
Executive Orders 12866, 13563, and 14094 direct agencies to assess
all costs and benefits of available regulatory alternatives and, if
regulation is necessary, to select regulatory approaches that maximize
net benefits (including potential economic, environmental, public
health and safety effects and distributive impacts and equity).
Executive Order 13563 emphasizes the importance of quantifying both
costs and benefits and of reducing costs, harmonizing rules, and
promoting flexibility. This rule has been determined to be not
significant for purposes of Executive Order 12866.
2. Notwithstanding any other provision of law, no person is
required to respond to, nor shall any person be subject to a penalty
for failure to comply with, a collection of information subject to the
requirements of the Paperwork Reduction Act of 1995 (PRA) (44 U.S.C.
3501 et seq.), unless that collection of information displays a
currently valid Office of Management and Budget (OMB) Control Number.
This rule involves the following OMB-approved collections of
information subject to the PRA:
0694-0088, ``Simple Network Application Process and
Multipurpose Application Form,'' which carries a burden hour estimate
of 29.4 minutes for a manual or electronic submission;
0694-0096 ``Five Year Records Retention Period,'' which
carries a burden hour estimate of less than 1 minute; and
0607-0152 ``Automated Export System (AES) Program,'' which
carries a burden hour estimate of 3 minutes per electronic submission.
BIS estimates that these Entity List additions and modifications
and three removals of entities from the VEU Program under the EAR will
result in an increase of 200 license applications submitted annually to
BIS. However, the additional burden falls within the existing estimates
currently associated with these control numbers. Additional information
regarding these collections of information, including all
[[Page 96836]]
background materials, can be found at: https://www.reginfo.gov/public/do/PRAMain by using the search function to enter either the title of
the collection or the OMB Control Number.
3. This rule does not contain policies with federalism implications
as that term is defined in Executive Order 13132.
4. Pursuant to section 1762 of the Export Control Reform Act of
2018, this action is exempt from the Administrative Procedure Act (APA)
(5 U.S.C. 553) requirements for notice of proposed rulemaking,
opportunity for public participation, and delay in effective date.
While Section 1762 of ECRA provides sufficient authority for such an
exemption, this action is also independently exempt from these APA
requirements because it involves a military or foreign affairs function
of the United States (5 U.S.C. 553(a)(1)).
5. Because a notice of proposed rulemaking and an opportunity for
public comment are not required to be given for this rule by 5 U.S.C.
553, or by any other law, the analytical requirements of the Regulatory
Flexibility Act (5 U.S.C. 601, et seq.) are not applicable.
Accordingly, no regulatory flexibility analysis is required, and none
has been prepared.
List of Subjects
15 CFR Part 744
Exports, Reporting and recordkeeping requirements, Terrorism.
15 CFR Part 748
Administrative practice and procedure, Exports, Reporting and
recordkeeping requirements.
Accordingly, parts 744 and 748 of the Export Administration
Regulations (15 CFR parts 730 through 774) are amended as follows:
PART 744--CONTROL POLICY: END-USER AND END-USE BASED
0
1. The authority citation for part 744 continues to read as follows:
Authority: 50 U.S.C. 4801-4852; 50 U.S.C. 4601 et seq.; 50
U.S.C. 1701 et seq.; 22 U.S.C. 3201 et seq.; 42 U.S.C. 2139a; 22
U.S.C. 7201 et seq.; 22 U.S.C. 7210; E.O. 12058, 43 FR 20947, 3 CFR,
1978 Comp., p. 179; E.O. 12851, 58 FR 33181, 3 CFR, 1993 Comp., p.
608; E.O. 12938, 59 FR 59099, 3 CFR, 1994 Comp., p. 950; E.O. 13026,
61 FR 58767, 3 CFR, 1996 Comp., p. 228; E.O. 13099, 63 FR 45167, 3
CFR, 1998 Comp., p. 208; E.O. 13222, 66 FR 44025, 3 CFR, 2001 Comp.,
p. 783; E.O. 13224, 66 FR 49079, 3 CFR, 2001 Comp., p. 786; Notice
of September 18, 2024, 89 FR 77011 (September 20, 2024); Notice of
November 7, 2024, 89 FR 88867 (November 8, 2024).
0
2. Amend supplement no. 4 to part 744 by:
0
a. Under CHINA, PEOPLE'S REPUBLIC OF, by:
0
i. Adding, in alphabetical order, entries for ``AccoTest Technology
Co., Ltd. (Hong Kong)''; ``ACM Research (Shanghai)''; ``Beijing E-Town
Semiconductor Technology Co., Ltd.''; ``Beijing Guangke Xintu
Technology Co., Ltd.''; ``Beijing Guowei Integration Technology Co.,
Ltd.''; ``Beijing Huada Jiutian Technology Co., Ltd.''; ``Beijing
Huafeng Electronic Equipment Co., Ltd.''; ``Beijing Huafeng Test &
Control Technology Co., Ltd.''; ``Beijing Jingyuan Microelectronics
Technology Co., Ltd.''; ``Beijing Kaishitong Semiconductor Co., Ltd.'';
``Beijing Naura Microelectronics Equipment Co., Ltd.''; ``Beijing Naura
Semiconductor Equipment Co., Ltd.''; ``Beijing Sevenstar Flowmeter Co.,
Ltd.''; ``Beijing Sevenstar Integrated Circuit Equipment Co., Ltd.'';
``Beijing Shuoke Zhongkexin Electronic Equipment Co., Ltd.''; ``Beijing
Skyverse Technology Co., Ltd.''; ``Beijing Zhongke Xin Electronic
Equipment''; ``Changguang Jizhi Optical Technology Co., Ltd.'';
``Changsha Zhichun Application Technology Co., Ltd.''; ``Chengdu Huada
Jiutianke Technology Co., Ltd.''; ``Chengdu Skyverse Technology Co.,
Ltd.''; ``Chinese Academy of Sciences Institute of Microelectronics'';
and ``Dongfang Jingyuan Electron Co., Ltd.'';
0
ii. Revising the entry for ``Fujian Jinhua Integrated Circuit Company,
Ltd.'';
0
iii. Adding, in alphabetical order, entries for ``Guangzhou Huada
Jiutian Technology Co., Ltd.''; ``Guangzhou Skyverse Technology Co.,
Ltd.''; ``Guowei Group (Shenzhen) Co., Ltd.''; ``Hefei Kaishitong
Semiconductor Co., Ltd.''; ``Hefei Naura Microelectronics Equipment
Co., Ltd.''; ``Hefei Zhihui Semiconductor Application Technology Co.,
Ltd.''; ``Hefei Zhiwei Microelectronics Co., Ltd.''; ``Hefei Zhiwei
Semiconductor Co., Ltd.''; ``Huafeng Test & Control Technology
(Tianjin) Co., Ltd.''; ``Hwa Tsing (Beijing) Technology Co., Ltd.'';
``Hwa Tsing (Guangzhou) Semiconductor Co., Ltd.''; ``Hwa Tsing
(Shanghai) Semiconductor Co., Ltd.''; ``Hwa Tsing Technology Co.,
Ltd.''; ``JAC Capital''; ``Jiangsu Nata Optoelectronic Material Co.,
Ltd.''; ``Jiangsu Qiwei Semiconductor Equipment Co., Ltd.''; ``Jiangsu
Zhichun System Integration Co., Ltd.''; ``Kingstone Technology Hong
Kong Limited''; ``Nanda Optoelectronic Semiconductor Materials Co.,
Ltd.''; ``Nanjing Huada Jiutianke Technology Co., Ltd.''; ``Naura
Technology Group Co., Ltd.''; and ``Ningbo Nanda Optoelectronic
Materials Ltd.'';
0
iv. Revising the entry for ``Ningbo Semiconductor International
Corporation (NSI)'';
0
v. Adding, in alphabetical order, entries for ``Northern Integrated
Circuit Technology Innovation Center (Beijing) Co., Ltd.''; ``Oriental
Crystal Microelectronics Technology (Qingdao) Co., Ltd.''; ``Oriental
Crystal Microelectronics Technology (Shanghai) Co., Ltd.'';
``Piotech''; ``Piotech (Beijing) Co., Ltd.''; ``Piotech (Shanghai) Co.,
Ltd.''; ``Piotech Chuangyi (Shenyang) Semiconductor Equipment Co.,
Ltd.; and ``Piotech Jianke (Haining) Semiconductor Equipment Co.,
Ltd.'';
0
vi. Revising the entry for ``PXW Semiconductor Manufactory Co., Ltd.'';
0
vii. Adding, in alphabetical order, entries for ``Qingxin Technology
Co., Ltd.''; ``Quanjiao Nanda Optoelectronic Materials Ltd.'';
``Raintree Scientific Instruments (Shanghai) Corporation''; ``Ruili
Microelectronics Equipment (Shanghai) Co., Ltd.''; and ``S2C Limited'';
0
viii. Revising the entries for ``Semiconductor Manufacturing
International (Beijing) Corporation''; ``Semiconductor Manufacturing
International Corporation (SMIC)''; ``Semiconductor Manufacturing
International (Shenzhen) Corporation''; ``Semiconductor Manufacturing
International (Tianjin) Corporation''; and ``Semiconductor
Manufacturing South China Corporation'';
0
ix. Adding, in alphabetical order, entries for ``Shandong Feiyuan Gas
Co., Ltd.''; ``Shanghai AGM Gas Co., Ltd.''; ``Shanghai Aipusi
Precision Equipment Co., Ltd.''; ``Shanghai Feiai Technology Co.,
Ltd.''; ``Shanghai Huada Jiutian Information Technology Co., Ltd.'';
and ``Shanghai Integrated Circuit Equipment & Materials Industry
Innovation Center Co., Ltd.'';
0
x. Revising the entry for ``Shanghai Integrated Circuit Research and
Development Center'';
0
xi. Adding, in alphabetical order, entries for ``Shanghai Jingce
Semiconductor Technology Co., Ltd.''; ``Shanghai Jingzhuo Information
Technology Co., Ltd.''; ``Shanghai Kaishitong Semiconductor Co.,
Ltd.''; ``Shanghai Lingang Kaishitong Semiconductor Co., Ltd.'';
``Shanghai Lizhi Technology Co., Ltd.'';
0
xii. Revising the entry for ``Shanghai Micro Electronics Equipment
(Group) Co., Ltd.'';
0
xiii. Adding, in alphabetical order, entries for ``Shanghai Modern
Advanced Ultra-Precision Manufacturing Center Co., Ltd.''; ``Shanghai
Nanpre Mechanics Co., Ltd.''; ``Shanghai Naura
[[Page 96837]]
Microelectronics Equipment Co., Ltd.''; ``Shanghai Siwave Technology
Co., Ltd.''; ``Shanghai Skyverse Semiconductor Technology Co., Ltd.'';
``Shanghai Xinsheng Jingrui Semiconductor Technology Co., Ltd.'';
``Shanghai Xinsheng Jingtou Semiconductor Technology Co., Ltd.'';
``Shanghai Xinsheng Jinko Semiconductor Technology Co., Ltd.'';
``Shanghai Xinsheng Semiconductor Technology Co., Ltd.''; ``Shanghai
Yanquan Technology Co., Ltd.''; ``Shanghai Yuliangsheng Technology
Co.'', Ltd.''; ``Shanghai Yuwei Semiconductor Technology Co., Ltd'';
``Shanghai Zhichun Alloy Manufacturing Co., Ltd.''; ``Shanghai Zhichun
Electronic Technology Co., Ltd.''; ``Shanghai Zhichun Optoelectronic
Equipment Co., Ltd.''; ``Shanghai Zhichun Precision Gas Co., Ltd.'';
``Shanghai Zhichun Precision Manufacturing Co., Ltd.''; ``Shanghai
Zhichun Purification System Technology Co., Ltd.''; ``Shanghai Zhichun
Semiconductor Equipment Co., Ltd''; ``Shanghai Zhichun System
Integration Co., Ltd.''; ``Shanghai Zhijia Semiconductor Gas Co.,
Ltd.''; ``Shanghai Zixi Optical Technology Co., Ltd.''; ``Shengmei
Semiconductor Equipment (Beijing) Co., Ltd.''; ``Shengmei Semiconductor
Equipment Wuxi Co., Ltd.''; ``Shengwei Semiconductor Equipment
(Shanghai) Co., Ltd.''; ``Shenyang Xinyuan Micro Business Development
Co., Ltd.'', ``Shenyang Xinyuan Microelectronic Equipment Co., Ltd.'';
``Shenzhen Guowei Hongbo Technology Co., Ltd.''; ``Shenzhen Guowei
Sensing Technology Co., Ltd.''; ``Shenzhen Guoweichip Technology Co.,
Ltd.''; ``Shenzhen Huada Jiutianke Technology Co., Ltd.''; ``Shenzhen
Jingyuan Information Technology Co., Ltd.''; ``Shenzhen Naura
Microelectronics Equipment Co., Ltd.''; ``Shenzhen Pengxinxu Technology
Co., Ltd.''; ``Shenzhen Qianhai Skyverse Semiconductor Technology Co.,
Ltd.''; ``Shenzhen SiCarrier Technologies Co., Ltd.''; ``Shenzhen
Xinkailai Industrial Machinery Co., Ltd.''; ``Shenzhen Zhangge
Instrument Co., Ltd.''; and ``Si'En Qingdao Co. Ltd.'';
0
xiv. Revising the entry for ``SJ Semiconductor'';
0
xv. Adding, in alphabetical order, entries for ``Skyverse''; ``Skyverse
Limited''; and ``SMIC Advanced Technology R&D (Shanghai) Corporation'';
0
xvi. Revising the entries for ``SMIC Holdings Limited''; ``SMIC Hong
Kong International Company Limited''; ``SMIC Northern Integrated
Circuit Manufacturing (Beijing) Co., Ltd.''; and ``SMIC Semiconductor
Manufacturing (Shanghai) Co., Ltd.''; and
0
xvii. Adding, in alphabetical order, entries for ``Suzhou Nanda
Optoelectronic Materials Co., Ltd.''; ``SwaySure Technology Co.,
Ltd.''; ``Taiyuan Jinke Semiconductor Technology Co., Ltd.''; ``Ulanqab
Nanda Microelectronics Materials Co., Ltd.''; ``Wingtech Technology
Co., Ltd.''; ``Wise Road Capital''; ``Wuhan Naura Microelectronics
Equipment Co., Ltd.'', ``Wuhan Skyverse Semiconductor Technology Co.,
Ltd.''; ``Wuhan Xinxin Semiconductor Manufacturing Company Limited'';
``Wuhan Yiguang Technology Co., Ltd.''; ``Wuxi Kaishitong Technology
Co., Ltd.''; ``Wuxi Naura Microelectronics Equipment Co., Ltd.'';
``Xiamen Skyverse Technology Co., Ltd.''; ``Xi'an Huada Jiutian
Technology Co., Ltd.''; and ``Xi'an Naura Microelectronics Equipment
Co., Ltd.''; Xinlian Rongchuang Integrated Circuit Industry Development
(Beijing) Co., Ltd.''; ``Yusheng Micro Semiconductor (Shanghai) Co.,
Ltd.''; ``Yuwei Semiconductor Technology Co., Ltd.''; ``Zhangjiang
Laboratory''; ``Zhejiang Shenqihang Technology Co., Ltd.'', ``Zhejiang
Zhichun Precision Manufacturing Co., Ltd.''; ``Zhiwei Semiconductor
(Shanghai) Co., Ltd.''; ``Zhiyi High Purity Electronic Materials
(Shanghai) Ltd.''; ``Zhuhai Cornerstone Technology Co., Ltd.'';
``Zhuhai Skyverse Technology Co., Ltd.''; and ``Zibo Keyuanxin Fluorine
Trading Ltd.'';
0
b. Under Japan, by adding, in alphabetical order, an entry for
``Kingsemi Japan K.K.'';
0
c. Under Singapore, adding, in alphabetical order, an entry for
``Skyverse Pte. Ltd.'';
0
d. Under South Korea, adding, in alphabetical order, entries for ``ACM
Research Korea Co., Ltd.''; and ``Empyrean Korea''; and
0
e. Adding Footnote 5.
The additions and revisions read as follows:
Supplement No. 4 to Part 744--Entity List
* * * * *
----------------------------------------------------------------------------------------------------------------
License review Federal Register
Country Entity License requirement policy citation
----------------------------------------------------------------------------------------------------------------
* * * * * * *
----------------------------------------------------------------------------------------------------------------
CHINA, PEOPLE'S REPUBLIC * * * * * *
OF.
AccoTest Technology For all items Presumption of 89 FR [INSERT FR
Co., Ltd. (Hong subject to the EAR denial. PAGE NUMBER]
Kong), Rm. 211 2/F (See Sec. 744.11 December 5, 2024.
MIRROR CTR, Tsim of the EAR).
Sha Tsui East, Hong
Kong.
* * * * * *
ACM Research For all items Presumption of 89 FR [INSERT FR
(Shanghai), a.k.a., subject to the EAR denial. PAGE NUMBER]
the following four (See Sec. 744.11 December 5, 2024.
aliases: of the EAR).
--Shengmei Shanghai;
--ACM Shanghai;.....
--Shengmei
Semiconductor
Equipment
(Shanghai) Co.,
Ltd.; and.
--ACMSH.............
Building 4, No. 1690
Cailun Road,
Zhangjiang High-
Tech Park,
Shanghai, China;
and 604-1 IC Design
Building, No. 33
Xinda Road, Wuxi,
China; and About
170 meters
northeast of the
intersection of
Luwu Highway and
Xinyuan South Road,
Pudong New
District, Shanghai,
China.
* * * * * *
[[Page 96838]]
Beijing E-Town For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER ]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following four
aliases:
--BEST;.............
--BEST
Semiconductor;.
--Beijing Yitang
Semiconductor
Technology; and.
--Yitang
Semiconductor..
No. 9 Ruihe West 2nd
Road, Beijing,
China and Building
8, No. 28 Jinghai
2nd Road, Beijing,
China; and Rooms
610 and 611, 6th
Floor, Main
Building, Customs
Clearance Service
Center, No. 5
Tonghai 1st Road,
Xiliu Street
Office, Xi'an,
China; and No. 601
and 605, Building
A, Huaxin
Headquarters Base,
No. 426 Gaoxin
Avenue, Wuhan,
China; and Room
706, IC Design
Building A 33-2,
Xinda Road, Xinwu
District, Wuxi,
China; and Floor 4-
5, Building D,
Import and Export
Commodity
Exhibition and
Trading Center, at
the intersection of
Dongfang Avenue and
Dayu Road, Xinzhan
District, Hefei,
China.
* * * * * *
Beijing Guangke For all items Presumption of 89 FR [INSERT FR
Xintu Technology subject to the EAR denial. PAGE NUMBER]
Co., Ltd., No. 22, (See Sec. 744.11 December 5, 2024.
Ronghua Middle of the EAR).
Road, Room 3101,
31F, Building 1,
Beijing Economic
and Technological
Development Zone,
Beijing, China and
3101 Floor 31,
Building 1, No. 22
Courtyard, Ronghua
M. Road, Beijing
Economic Technology
Development Zone,
Beijing 100000
China.
Beijing Guowei For all items Presumption of 89 FR [INSERT FR
Integration subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., 10th Floor, of the EAR).
Building 1, No. 24,
Jiuxianqiao Middle
Road, Chaoyang
District, Beijing,
China.
* * * * * *
Beijing Huada For all items Presumption of 89 FR [INSERT FR
Jiutian Technology subject to the EAR denial. PAGE NUMBER]
Co., Ltd., a.k.a., (See Sec. 744.11 December 5, 2024.
the following five of the EAR).
aliases:
--Empyrean;.........
--Huada Empyrean;...
--Empyrean
Technology;.
--Huada Jiutian; and
--BGI Jiutian.......
2nd Floor, Building
A, No. 2, Lizezhong
2nd Road, Chaoyang
District, Beijing,
China.
Beijing Huafeng For all items Presumption of 89 FR [INSERT FR
Electronic subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., 10/F, 2 of the EAR).
Bldg., 1# Haiying
Rd., Fengtai Dist.,
Beijing, 100070,
China.
Beijing Huafeng Test For all items Presumption of 89 FR [INSERT FR
& Control subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a. the of the EAR).
following three
aliases:
--AccoTEST;.........
--AccoTEST BU. of
Huafeng Test &
Control Co., Ltd.;
and.
--HFTC..............
101, 102, 103, Floor
5, 1, Building 5,
No. 9 Courtyard,
Fenghao E. Road,
Haidian District,
Beijing 100094,
China; and Building
5, IC Park, No. 9
Fenghao East Road,
Haidian District,
Beijing 100094,
China; and 17th
Floor, Building 2,
Qimeng Cross-border
Xiangfu Park, No.
116 Xianghong Road,
Gongshu District,
Hangzhou, Zhejiang
Province, China;
and 1102, Tianan
Smart City A3, No.
228 Linghu Avenue,
Xinwu District,
Wuxi, Jiangsu
Province, China;
and Room 414, No.
1, 88 Shengrong
Road, Pudong New
Area, Shanghai,
China; and 1603-
1604, Mega Plaza,
No. 1027 Changning
Road, Changning
District, Shanghai,
China; and Room A1-
309, Tower
Building, Ascendas
Innovation Park,
No. 388 Xinping
Street, Suzhou
Industrial Park,
Jiangsu Province,
China; and Room
805, Lianyi Center,
No. 83 Mingguang
Road, Weiyang
District, Xi'an,
Shaanxi Province,
China; and Shenzhen
Software Park, Keji
Middle 2nd Road,
Nanshan District,
Shenzhen, Guangdong
Province, China.
* * * * * *
Beijing Jingyuan For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Zhongke Jingyuan
Microelectronics
Technology
(Beijing) Co.,
Ltd.; and.
--Casue.............
[[Page 96839]]
No. 156, Jinghai 4th
Road, Building 12,
5th Floor, Beijing
Economic and
Technological
Development Zone,
Beijing, China.
* * * * * *
Beijing Kaishitong For all items Presumption of 89 FR [INSERT FR
Semiconductor Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Beijing Kingstone
Semiconductor..
Floor 1, Building 2,
No. 15, Jingsheng
South 4th Street,
Beijing Economic
and Technological
Development Zone
(Tongzhou),
Beijing, China; and
3rd Floor, Block
A2, Digital Manor,
No. 1 Disheng West
Road, Beijing
Economic and
Technological
Development Zone,
Beijing, China.
* * * * * *
Beijing Naura For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a. the of the EAR).
following five
aliases:
--Beijing Naura;....
--Northern Huachuang
Microelectronics
Equipment;.
--Beijing Naura
Microele Eq Co.;.
--Beifang Huachuang
Microelectronics
Equipment; and.
--Beijing Naura
Microelectronics..
No. 8, Wenchang
Avenue, Beijing
Economic and
Technological
Development Zone,
Beijing, China; and
No. 1 Jiuxianqiao
East Road, Chaoyang
District, Beijing,
China; and Room
101, Floor 1 to 4,
Building 1, No. 20,
Jinshi Road, Mafang
Town, Pinggu
District, Beijing,
China.
Beijing Naura For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., Room 101, of the EAR).
Floor 1 to 4,
Building 1, No. 20,
Jinshi Road, Mafang
Town, Pinggu
District, Beijing,
China.
* * * * * *
Beijing Sevenstar For all items Presumption of 89 FR [INSERT FR
Flowmeter Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Beijing Qixing
Flowmeter Co., Ltd..
4S01, 4th Floor,
Building 1, No. 8
Wenchang Avenue,
Beijing, China.
Beijing Sevenstar For all items Presumption of 89 FR [INSERT FR
Integrated Circuit subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following one
alias:
--Beijing Qixing
Integrated Circuit
Equipment Co., Ltd..
No. 6 Zhuyuan 3rd
Street, Shunyi
District, Beijing,
China.
Beijing Shuoke For all items Presumption of 89 FR [INSERT FR
Zhongkexin subject to the EAR denial. PAGE NUMBER]
Electronic (See Sec. 744.11 December 5, 2024.
Equipment Co., of the EAR).
Ltd., a.k.a., the
following one
alias:
--SemiCore ZKX......
1st Floor, Building
1, No. 6, Xingguang
2nd Street,
Tongzhou District,
Beijing, China and
Room 2301,
Luguyuyuan
Entrepreneurship
Building, No. 27
Wenxuan Road,
Changsha, China.
* * * * * *
Beijing Skyverse For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Beijing
Nanolighting
Technology Co.,
Ltd..
Room 101-18, Floor
1, Building B1, No.
3 Disheng Middle
Road, Beijing,
China.
* * * * * *
Beijing Zhongke Xin For all items Presumption of 89 FR [INSERT FR
Electronic subject to the EAR. denial. PAGE NUMBER]
Equipment, a.k.a., (See Sec. 744.11 December 5, 2024.
the following three of the EAR).
aliases:
--ZKX;..............
--Zhongkexin; and...
--CETC Beijing
Zhongke Xin
Electronic
Equipment..
No. 6, Xingguang 2nd
Street,
Zhongguancun
Science and
Technology Park,
Tongzhou District,
Beijing, China and
Office Building No.
44, North Gate, No.
20 Fuxing Road,
Haidian District,
Beijing, China.
* * * * * *
Changguang Jizhi For all items Presumption of 89 FR [INSERT FR
Optical Technology subject to the EAR denial. PAGE NUMBER]
Co., Ltd., a.k.a., (See Sec. 744.11 December 5, 2024.
the following one of the EAR).
alias:
--Zetop.............
Building 1, No. 3033
Pudong Road,
Changchun Economic
and Technological
Development Zone,
Changchun, China.
* * * * * *
[[Page 96840]]
Changsha Zhichun For all items Presumption of 89 FR [INSERT FR
Application subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., No. 204, 2nd of the EAR).
Floor, Building 1,
Peak, Gushan Sports
Park, Jinjiachong
Road, Wangcheng
District, Changsha,
China.
* * * * * *
Chengdu Huada For all items Presumption of 89 FR [INSERT FR
Jiutianke subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Chengdu Huada; and
--Chengdu Empyrean..
No. 518, Guoxin
Avenue, Shuangliu
District, Chengdu,
China.
Chengdu Skyverse For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Chengdu
Nanolighting
Technology Co.,
Ltd., Room 1307,
Floor 13, Unit 1,
Building 1, No. 99
Tianfu 2nd Street,
Chengdu, China.
* * * * * *
Chinese Academy of For all items Presumption of 89 FR [INSERT FR
Sciences Institute subject to the EAR. denial. PAGE NUMBER]
of (See Sec. Sec. December 5, 2024.
Microelectronics, 734.4(a)(9),
a.k.a., the 734.9(e)(3), and
following 6 744.11 of the EAR)
aliases: \5\.
--CAS IME;..........
--IME CAS;..........
--IMECAS;...........
--CAS Institute of
Microelectronics;.
--CAS
Microelectronics
Institute; and.
--Institute of
Microelectronics of
the Chinese Academy
of Sciences..
#3 Beitucheng West
Road, Chaoyang
District, Beijing,
China; and No. 3,
North Tucheng West
Road, Chaoyang
District, Beijing,
China.
* * * * * *
Dongfang Jingyuan For all items Presumption of 89 FR [INSERT FR
Electron Co., Ltd., subject to the EAR denial. PAGE NUMBER]
a.k.a., the (See Sec. 744.11 December 5, 2024.
following five of the EAR).
aliases:
--DJEL;.............
--Dongfang Jingyuan
Electron Limited;.
--Oriental Crystal
Microelectronics
Technology (Beijing
Co., Ltd.);.
--Dongfang Jingyuan
Micro-Electronic
Technology
(Beijing) Co.,
Ltd.; and.
--Oriental Crystal
Source..
No. 156 Jinghai 4th
Road, Building 12,
Beijing Economic
and Technological
Development Zone,
Beijing, China and
No. 156 Jinghai 4th
Road, Building A4,
Beijing Economic
and Technological
Development Zone,
Beijing, China and
Room 301F, Block C,
Yingdali Technology
Digital Park,
Futian Free Trade
Zone, Fubao Street,
Futian District,
Shenzhen, China and
Building 12, Yard
156, Jinghai 4th
Road, Economic and
Technological
Development Zone
Beijing, 100001,
China.
* * * * * *
Fujian Jinhua For all items Presumption of 83 FR 54521, 10/30/
Integrated Circuit subject to the EAR denial. 18. 89 FR [INSERT
Company, Ltd., (See Sec. Sec. FR PAGE NUMBER]
a.k.a., the 734.4(a)(9), December 5, 2024.
following one 734.9(e)(3), and
alias: 744.11 of the EAR)
--JHICC............. \5\.
Sanchuang Park,
Century Avenue
Jinjiang City,
Fujian Province,
China; and No. 88,
Lianhua Avenue,
Jinjiang Integrated
Circuit Science
Park, Quanzhou
City, Fujian
Province, China.
* * * * * *
Guangzhou Huada For all items Presumption of 89 FR [INSERT FR
Jiutian Technology subject to the EAR denial. PAGE NUMBER]
Co., Ltd., a.k.a., (See Sec. 744.11 December 5, 2024.
the following two of the EAR).
aliases:
--Guangzhou Huada;
and.
--Guangzhou
Empyrean..
Room 1006, Building
A, No. 18 Keke
Avenue, Huangpu
District,
Guangzhou, China.
* * * * * *
Guangzhou Skyverse For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Guangzhou
Nanolighting
Technology Co.,
Ltd..
Room 406-502, No. 1
Yichuang Street,
Huangpu District,
Guangzhou, China.
* * * * * *
Guowei Group For all items Presumption of 89 FR [INSERT FR
(Shenzhen) Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following three of the EAR).
aliases:
--Guowei Group;.....
--SMIT Group; and...
--SMIT Shenzhen.....
Room 22A, Guoshi
Building, No. 1801
Shahe West Road,
High-tech Zone
Community, Nanshan
District, Shenzhen,
China.
* * * * * *
[[Page 96841]]
Hefei Kaishitong For all items Presumption of 89 FR [INSERT FR
Semiconductor Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Hefei Kingstone
Semiconductor..
Room 102-3, R&D
Building, Xinqiao
Integrated Circuit
Technology Park,
No. 1 Shuofang
Road, Airport
Economic
Demonstration Zone,
Hefei, China.
* * * * * *
Hefei Naura For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Hefei Naura; and..
--Hefei Naura
Microelectronics..
2nd Floor, Building
A, Electronic
Factory, West of
Tianzhushan Avenue
and South of
Shuofang Road,
Airport Economic
Demonstration Zone,
Hefei, China.
Hefei Zhihui For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Application (See Sec. 744.11 December 5, 2024.
Technology Co., of the EAR).
Ltd., Electronic
Factory Building A,
West of Tianzhushan
Avenue and South of
Shuofang Road,
Hefei Airport
Economic
Demonstration Zone,
Hefei Economic and
Technological
Development Zone,
Hefei, China.
Hefei Zhiwei For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Co., Ltd., 2nd (See Sec. 744.11 December 5, 2024.
Floor, Building B, of the EAR).
Hefei Zhiwei
Semiconductor Co.,
Ltd., No. 3699 Dayu
Road, Xinzhan
District, Hefei,
China.
Hefei Zhiwei For all items Presumption of 89 FR [INSERT FR
Semiconductor Co., subject to the EAR denial. PAGE NUMBER]
Ltd., No. 3699 Dayu (See Sec. 744.11 December 5, 2024.
Road, Xinzhan of the EAR).
District, Hefei,
China.
* * * * * *
Huafeng Test & For all items Presumption of 89 FR [INSERT FR
Control Technology subject to the EAR denial. PAGE NUMBER]
(Tianjin) Co., (See Sec. 744.11 December 5, 2024.
Ltd., 1201 Chuanbo of the EAR).
Road, Zhongxin
Ecological City,
Binhai, Tianjin,
300480, China; and
1201 Chuanbo Road,
Sino-Singapore Eco-
city, Binhai New
Area, Tianjin,
China.
* * * * * *
Hwa Tsing (Beijing) For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following three of the EAR).
aliases:
--Huahai Qingke
(Beijing)
Technology Co.,
Ltd.;.
--Beijing Huahai
Qingke; and.
--Beijing Hwa Tsing.
Room 1107, Floor 11,
Building 40, No. 1
Courtyard, Disheng
North Street,
Beijing, China and
Room 505, Floor 5,
Building 40, 1st
Courtyard, Disheng
North Road,
Beijing, China.
Hwa Tsing For all items Presumption of 89 FR [INSERT FR
(Guangzhou) subject to the EAR denial. PAGE NUMBER]
Semiconductor Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a. the of the EAR).
following three
aliases:
--Huahai Qingke
(Guangzhou)
Semiconductor Co.,
Ltd.;.
--Guangzhou Huahai
Qingke; and.
--Guangzhou Hwa
Tsing..
Room 508, Building
A, No. 136 Kaiyuan
Avenue, Guangzhou,
China.
Hwa Tsing (Shanghai) For all items Presumption of 89 FR [INSERT FR
Semiconductor Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following three of the EAR).
aliases:
--Huahai Qingke
(Shanghai)
Semiconductor Co.,
Ltd.;.
--Shanghai Huahai
Qingke; and.
--Shanghai Hwa
Tsing..
2nd Floor, 979
Yunhan Road,
Lingang Innovation
Zone, Shanghai,
China.
Hwa Tsing Technology For all items Presumption of 89 FR [INSERT FR
Co., Ltd., a.k.a., subject to the EAR denial. PAGE NUMBER]
the following three (See Sec. 744.11 December 5, 2024.
aliases: of the EAR).
--Huahai Qingke
Technology Co.,
Ltd.;.
--Huahai Qingke; and
--Hwa Tsing.........
No. 11, Juxing Road,
Xianshuigu Town,
Jinnan District,
Tianjin, China; and
Building 8, Haihe
Creative Center,
No. 9 Juxing Road,
Jinnan District,
Tianjin, China; and
Electronics Factory
R&D Building, west
of Zhushan Avenue
and south of
Shuofang Road,
Hefei, China; and
Room 362, Floor 18,
Building B4, Wuhan
Future Science and
Technology City
Overseas Talents
Area, 999 Gaoxin
Avenue, Wuhan,
China.
* * * * * *
JAC Capital, a.k.a., For all items Presumption of 89 FR [INSERT FR
the following one subject to the EAR denial. PAGE NUMBER]
alias: (See Sec. 744.11 December 5, 2024.
--Beijing Jianguang of the EAR).
Asset Management
Co., Ltd..
[[Page 96842]]
Floor 8, Beijing
International Club
Office Tower A, No.
21 Jian Wai Avenue,
Chaoyang District,
Beijing, China and
Room 9-46, Building
6, Ronghui Garden,
Linkong Economic
Core Zone, Shunyi
District, Beijing,
China.
* * * * * *
Jiangsu Nata For all items Presumption of 89 FR [INSERT FR
Optoelectronic subject to the EAR denial. PAGE NUMBER]
Material Co., Ltd., (See Sec. 744.11 December 5, 2024.
a.k.a., the of the EAR).
following six
aliases:
--Nata
Optoelectronic;.
--Nata;.............
--Nata Chem;........
--Nanda Chem;.......
--Nanda; and........
--Nanda
Optoelectronic..
No. 67, Pingsheng
Road, Shengpu,
Suzhou Industrial
Park, Suzhou, China.
Jiangsu Qiwei For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., No. 2015, of the EAR).
Linyang Road,
Qidong Economic
Development Zone,
Qidong, China.
* * * * * *
Jiangsu Zhichun For all items Presumption of 89 FR [INSERT FR
System Integration subject to the EAR denial. PAGE NUMBER]
Co., Ltd., No. 500, (See Sec. 744.11 December 5, 2024.
Linyang Road, of the EAR).
Qidong Economic
Development Zone,
Qidong, Jiangsu
Province, China.
* * * * * *
Kingstone Technology For all items Presumption of 89 FR [INSERT FR
Hong Kong Limited, subject to the EAR denial. PAGE NUMBER]
a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Kingstone Hong
Kong.
Unit 12, 11/F, Metro
Centre II, Number
21 Lam Hing Street,
Kowloon Bay, Hong
Kong.
* * * * * *
Nanda Optoelectronic For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Materials Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following four
aliases:
--Nata
Optoelectronic
Semiconductor;.
--Nata
Semiconductor;.
--Nanda
Semiconductor; and.
--Nanda
Optoelectronic
Semiconductor..
No. 117, Xincheng
Avenue, Shitan
Industrial Park,
Shizi Town,
Quanjiao County,
Chuzhou, Anhui
Province, China;
and No. 686-688,
Xincheng Avenue,
Quanjiao County,
Chuzhou, Anhui
Province, China.
* * * * * *
Nanjing Huada For all items Presumption of 89 FR [INSERT FR
Jiutianke subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Nanjing Huada; and
--Nanjing Empyrean..
Tower A, 8th floor,
Chuangzhi Building,
No. 17 Xinghuo Rd.,
Gaoxin District
Nanjing, China.
* * * * * *
Naura Technology For all items Presumption of 89 FR [INSERT FR
Group Co., Ltd., subject to the EAR denial. PAGE NUMBER]
a.k.a., the (See Sec. 744.11 December 5, 2024.
following four of the EAR).
aliases:
--Northern
Huachuang;.
--Beifang Huachuang;
--Naura; and........
--Naura Science &
Technology Group..
No. 1 Jiuxianqiao
East Road, Chaoyang
District, Beijing,
China.
* * * * * *
Ningbo Nanda For all items Presumption of 89 FR [INSERT FR
Optoelectronic subject to the EAR denial. PAGE NUMBER]
Materials Ltd., (See Sec. 744.11 December 5, 2024.
a.k.a., the of the EAR).
following three
aliases:
--Ningbo Nata;......
--Ningbo NTU; and...
--Ningbo NTU
Optoelectronics..
No. 233, Yangzhou'ao
Road, Chaiqiao
Street, Beilun
District, Ningbo,
China.
Ningbo Semiconductor For all items See Sec. Sec. 85 FR 83420, 12/22/
International subject to the EAR 744.11 and 20. 89 FR [INSERT
Corporation (NSI), (See Sec. 744.11 744.23(d) of the FR PAGE NUMBER]
No. 331-335 Anju of the EAR). EAR. December 5, 2024.
Road, Xiaogang
Street, Beilun
District, Ningbo,
Zhejiang, China;
and 1MC07, Jiuzhou
Center, No. 95,
Lane 85, Cailun
Road, Pudong New
Area, Shanghai,
China.
[[Page 96843]]
Northern Integrated For all items Presumption of 89 FR [INSERT FR
Circuit Technology subject to the EAR denial. PAGE NUMBER]
Innovation Center (See Sec. Sec. December 5, 2024.
(Beijing) Co., 734.4(a)(9),
Ltd., a.k.a., the 734.9(e)(3), and
following five 744.11 of the EAR)
aliases: \5\.
--Semiconductor
Technology
Innovation Center
(Beijing) Corp.;.
--STIC;.............
--STIC BJ;..........
--Northern
Integrated Circuit
Innovation Center;
and.
--STIC Northern
Integrated Circuit
Technology
Innovation Center
(Beijing) Co., Ltd..
First Floor,
Building 9, No. 18
Wenchang Avenue,
Beijing Economic
and Technological
Development Zone,
China; and 34M3
plot of land in the
core area of
Beijing Economic
and Technological
Development Zone,
Beijing, China.
* * * * * *
Oriental Crystal For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Technology (See Sec. 744.11 December 5, 2024.
(Qingdao) Co., of the EAR).
Ltd., a.k.a., the
following one
alias:
--Dongfang
Jingyuanwei
Electronic Science
& Technology
(Qingdao) Co., Ltd..
No. 9 Chengye Road,
Room 306, 3rd
Floor, Office
Building, West
Coast Comprehensive
Bonded Zone,
Qingdao, China and
Room 306, Floor 3,
No. 9 Chengye Road,
Xihaian Integrated
Free Trade Zone,
Qingdaopian
District, China
Pilot Free Trade
Zone, Qingdao,
Shandong, 266000,
China.
Oriental Crystal For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Technology (See Sec. 744.11 December 5, 2024.
(Shanghai) Co., of the EAR).
Ltd., a.k.a., the
following one
alias:
--Dongfang
Jingyuanwei
Electronic Science
and Technology
(Shanghai) Co.,
Ltd..
No. 888, Huanhu West
2nd Road, Building
C, Lingang New
Area, Shanghai,
China and Floor C,
No. 888 Huanhu W
2nd Road, Lingang
Xinpian District,
China Pilot Free
Trade Zone,
Shanghai, China.
* * * * * *
Piotech., a.k.a., For all items Presumption of 89 FR [INSERT FR
the following two subject to the EAR denial. PAGE NUMBER]
aliases: (See Sec. 744.11 December 5, 2024.
--Tuojing of the EAR).
Technology; and.
--Shenyang Tuojing
Technology Co.,
Ltd..
No. 900, Shuijia,
Hunnan District,
Shenyang, China;
and No. 1 Xinyuan
Street, Shenyang,
China; and A072,
Floor 3, Building
3, International
Enterprise Center
Phase 3, No. 1
Guanggu Avenue,
Wuhan, China; and
Room 217, 2nd
Floor, Building 6,
No. 16 Hongda North
Road, Beijing,
China; and Room
403, Floor 4,
Building 1, No. 501
Xuri Road, Lingang
New Area, Shanghai,
China.
Piotech (Beijing) For all items Presumption of 89 FR [INSERT FR
Co., Ltd., a.k.a., subject to the EAR denial. PAGE NUMBER]
the following one (See Sec. 744.11 December 5, 2024.
alias: of the EAR).
--Tuojing (Beijing)
Co., Ltd..
Room 217, Building
6, No. 16 Hongda
North Road,
Beijing, China.
Piotech (Shanghai) For all items Presumption of 89 FR [INSERT FR
Co., Ltd., a.k.a., subject to the EAR denial. PAGE NUMBER]
the following one (See Sec. 744.11 December 5, 2024.
alias: of the EAR).
--Tuojing (Shanghai)
Co., Ltd..
Room 304, Building
10, No. 1211
Hongyin Road,
Lingang New Area,
Shanghai, China.
Piotech Chuangyi For all items Presumption of 89 FR [INSERT FR
(Shenyang) subject to the EAR denial. PAGE NUMBER]
Semiconductor (See Sec. 744.11 December 5, 2024.
Equipment Co., of the EAR).
Ltd., a.k.a., the
following one
alias:
--Tuojing Chuangyi
(Shenyang)
Semiconductor
Equipment Co., Ltd..
Building 2 and
Building 3, No.
900, Shuijia,
Hunnan District,
Shenyang, China.
Piotech Jianke For all items Presumption of 89 FR [INSERT FR
(Haining) subject to the EAR denial. PAGE NUMBER]
Semiconductor (See Sec. 744.11 December 5, 2024.
Equipment Co., of the EAR).
Ltd., a.k.a., the
following three
aliases:
--Tuojing Jianke
(Haining)
Semiconductor
Equipment Co.,
Ltd.;.
--Tuojing Keyscience
(Haining)
Semiconductor
Equipment Co.,
Ltd.; and.
--Piotech Keyscience
(Haining)
Semiconductor
Equipment Co., Ltd..
Building 3, No. 8
Xinzhong Road,
Haining Economic
Development Zone,
Jiaxing, China.
* * * * * *
[[Page 96844]]
PXW Semiconductor For all items Presumption of 87 FR 77508, 12/19/
Manufactory Co., subject to the EAR denial. 2022. 89 FR
Ltd., a.k.a., the (See Sec. Sec. [INSERT FR PAGE
following seven 734.4(a)(9), NUMBER] December
aliases: 734.9(e)(3), and 5, 2024.
--Peng Chip;........ 744.11 of the EAR)
--Shenzhen Peng Xin \5\.
Wei IC
Manufacturing;.
--Shenzhen Pengxin
Micro Integrated
Circuit
Manufacturing Co.,
Ltd.;.
--PengXinWei;.......
--PXW;..............
--PXWSemi; and......
--Pengxin Micro.....
Room 727, Shanxia
Building, No. 160,
Xinxia Avenue,
Shanxia Community,
Pinghu Street,
Longgang District,
Shenzhen, 518111,
China; and Building
D, Zhongke Valley
Industrial Park,
Zhonghuan Avenue,
Shanxia Community,
Pinghu Street,
Longgang District,
Shenzhen, China.
* * * * * *
Qingxin Technology For all items Presumption of 89 FR [INSERT FR
Co., Ltd., a.k.a. subject to the EAR denial. PAGE NUMBER]
the following two (See Sec. 744.11 December 5, 2024.
aliases: of the EAR).
--Clean Chip; and...
--Clean Chip HK.....
15th Floor, Wan
Zhaofeng Centre,
133 Hoi Bun Road,
Kwun Tong, Kowloon,
Hong Kong.
Quanjiao Nanda For all items Presumption of 89 FR [INSERT FR
Optoelectronic subject to the EAR denial. PAGE NUMBER]
Materials Ltd. (See Sec. 744.11 December 5, 2024.
a.k.a., the of the EAR).
following one
alias:
--Quanjiao Nata.....
No. 686-688,
Xincheng Avenue,
Shitan Industrial
Park, Shizi Town,
Quanjiao County,
Chuzhou, China.
* * * * * *
Raintree Scientific For all items Presumption of 89 FR [INSERT FR
Instruments subject to the EAR denial. PAGE NUMBER]
(Shanghai) (See Sec. 744.11 December 5, 2024.
Corporation, of the EAR).
a.k.a., the
following two
aliases:
--RSIC Scientific
Instruments
(Shanghai) Co.,
Ltd.; and.
--Ruili Scientific
Instruments
(Shanghai) Co.,
Ltd..
Building 6,
Zhangjiang Pioneer
Park, No. 68 Huatuo
Road, Pudong New
Area, Shanghai,
China; and First
Floor, Building 2,
Chenghe Innovation
Research Center,
No. 48 Gubo Road,
Pudong New
District, Shanghai,
China; and Building
A8 No. 38 Dongsheng
Road, Shanghai
Xinfa Chuangyun
Industrial Park
(Northeast Gate 2),
Pudong New Area,
Shanghai, China;
and No. 777,
Jianshe West Road,
Binhu District,
Jiangsu Zhuosheng
Microelectronics
Co., Ltd., Binhu
District, Wuxi,
China.
* * * * * *
Ruili For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Equipment (See Sec. 744.11 December 5, 2024.
(Shanghai) Co., of the EAR).
Ltd., a.k.a, the
following two
aliases:
--Raintree
Microelectronics;
and.
--RSIC
Microelectronics..
B1, 2nd Floor, No.
88 Taigu Road,
Shanghai, China;
and Kailong
Technology
Building, Lane
3166, Longdong
Avenue, Pudong New
District, Shanghai,
China.
* * * * * *
Semiconductor For all items Presumption of 85 FR 83420, 12/22/
Manufacturing subject to the EAR denial. 20. 89 FR [INSERT
International (See Sec. Sec. FR PAGE NUMBER]
(Beijing) 734.4(a)(9), December 5, 2024.
Corporation, 734.9(e)(3), and
a.k.a., the 744.11 of the EAR)
following one \5\.
alias:
--SMIC Beijing......
No. 18 Wen Chang
Road, Beijing
Economic-
Technological
Development Area,
Beijing 100176.
Semiconductor For all items Presumption of 85 FR 83420, 12/22/
Manufacturing subject to the EAR denial for all 20. 89 FR [INSERT
International (See Sec. Sec. items to include FR PAGE NUMBER]
Corporation (SMIC), 734.4(a)(9), items described in December 5, 2024.
a.k.a., the 734.9(e)(3), and ECCN 3B001.a.4, .c,
following three 744.11 of the EAR) .d, f.1.b.2, .k to
aliases: \5\. .p; 3B002.c, 3B993,
--Semiconductor or 3B994. Case-by-
Manufacturing case for items
International designed for
(Shanghai) production of 200mm
Corporation;. wafers destined to
--SMIC Shanghai; and a 200mm wafer
--Semiconductor Mfg production facility.
International Corp..
No. 18 Zhang Jiang
Road, Pudong New
Area, Shanghai
201203, China.
[[Page 96845]]
Semiconductor For all items See Sec. Sec. 85 FR 83420, 12/22/
Manufacturing subject to the EAR 744.11 and 20. 89 FR [INSERT
International (See Sec. 744.11 744.23(d) of the FR PAGE NUMBER]
(Shenzhen) of the EAR). EAR. December 5, 2024.
Corporation,
a.k.a., the
following one
alias:
--SMIC Shenzhen.....
No. 18 Gaoxin Road,
Export Processing
Zone, Pingshan New
Area, Shenzhen,
518118, China; and
1st Lanzhu Avenue,
Pingshan Town,
Longgang District,
Shenzhen,
Guangdong, 518118,
China; and Qier
Road, Export
Processing Zone,
Pingshan New Area,
Shenzhen, China.
Semiconductor For all items See Sec. Sec. 85 FR 83420, 12/22/
Manufacturing subject to the EAR 744.11 and 20. 89 FR [INSERT
International (See Sec. 744.11 744.23(d) of the FR PAGE NUMBER]
(Tianjin) of the EAR). EAR. December 5, 2024.
Corporation,
a.k.a., the
following one
alias:
--SMIC Tianjin......
No. 19 Xing Hua
Avenue, Xiqing
Economic
Development Area,
Tianjin, 300385,
China.
Semiconductor For all items Presumption of 85 FR 83420, 12/22/
Manufacturing South subject to the EAR denial. 20. 89 FR [INSERT
China Corporation, (See Sec. Sec. FR PAGE NUMBER]
a.k.a., the 734.4(a)(9), December 5, 2024.
following four 734.9(e)(3), and
aliases: 744.11 of the EAR)
--SMSC;............. \5\.
--SMIC Southern
Integrated Circuit
Manufacturing Co.,
Ltd.;.
--SMIC South; and...
--SMIC Southern.....
5th Floor, Building
3, No. 18 Zhang
Jiang Road, China
(Shanghai) Pilot
Free Trade Zone,
China; and 18
Zhangjiang Road,
Pudong New Area,
Shanghai, China.
* * * * * *
Shandong Feiyuan Gas For all items Presumption of 89 FR [INSERT FR
Co., Ltd., a.k.a., subject to the EAR denial. PAGE NUMBER]
the following one (See Sec. 744.11 December 5, 2024.
alias: of the EAR).
--Feiyuan Gas.......
No. 5, Road 4,
Gaoqing Chemical
Industry Park,
Gaocheng Town,
Gaoqing County,
Zibo, China.
* * * * * *
Shanghai AGM Gas For all items Presumption of 89 FR [INSERT FR
Co., Ltd., a.k.a., subject to the EAR denial. PAGE NUMBER]
the following one (See Sec. 744.11 December 5, 2024.
alias: of the EAR).
--AGM Gas...........
Room 220, 2F, No.
1799-6, Wuzhong
Road, Minhang
District, Shanghai,
China.
* * * * * *
Shanghai Aipusi For all items Presumption of 89 FR [INSERT FR
Precision Equipment subject to the EAR denial. PAGE NUMBER]
Co., Ltd., Room (See Sec. 744.11 December 5, 2024.
402, Building 1, of the EAR).
No. 170 Zihai Road,
Minhang District,
Shanghai, China.
* * * * * *
Shanghai Feiai For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., Room 204A, (See Sec. 744.11 December 5, 2024.
Building 5, No. of the EAR).
600, Ningqiao Road,
Shanghai, China.
* * * * * *
Shanghai Huada For all items Presumption of 89 FR [INSERT FR
Jiutian Information subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Shanghai Huada;
and.
--Shanghai Empyrean.
Floor 10, Building
C, No. 1867,
Zhongke Road,
Pudong New Area,
Shanghai, China;
and Building C, No.
888, Huanhu West
2nd Road, Lingang
New Area, China.
* * * * * *
Shanghai Integrated For all items Presumption of 89 FR [INSERT FR
Circuit Equipment & subject to the EAR denial. PAGE NUMBER]
Materials Industry (See Sec. Sec. December 5, 2024.
Innovation Center 734.4(a)(9),
Co., Ltd., a.k.a., 734.9(e)(3), and
the following five 744.11 of the EAR)
aliases: \5\.
--CICEM;............
--ICRD Innovation
Center;.
--National
Integrated Circuit
Equipment and
Materials
Industrial
Innovation Center;.
--ICRD Phase II; and
--ICRD Phase 2......
No. 497, Loulu Road,
Jiading District,
Shanghai, China;
and No. 497, Gauss
Road, Shanghai,
China; and No. 497,
Gaosi Road,
Shanghai, China.
Shanghai Integrated For all items Presumption of 87 FR 77508, 12/19/
Circuit Research subject to the EAR denial. 2022. 89 FR
and Development (See Sec. Sec. [INSERT FR PAGE
Center, a.k.a., the 734.4(a)(9), NUMBER] December
following two 734.9(e)(3), and 5, 2024.
aliases: 744.11 of the EAR)
--Shanghai IC R&D \5\.
Center; and.
--ICRD..............
No. 497, Gaosi Road,
Zhangjiang Hi-Tech
Park, Pudong New
Area, Shanghai,
China; and No.
3000, Longdong
Avenue, Pilot Free
Trade Zone,
Shanghai, China.
* * * * * *
[[Page 96846]]
Shanghai Jingce For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following three
aliases:
--Shanghai Precision
Measurement;.
--Shanghai Jingce;
and.
--PMISH.............
No. 2875, Huqingping
Highway, Qingpu
District, Shanghai,
China; and Floor 1
and 3, Building 1,
No. 269 and 299,
Shuangbang Road,
Xujing Town, Qingpu
District, Shanghai,
China.
Shanghai Jingzhuo For all items Presumption of 89 FR [INSERT FR
Information subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., 12th Floor, of the EAR).
Building B, No. 1-
72, Lane 2855,
Huqingping Highway,
Zhaoxiang Town,
Qingpu District,
Shanghai, China.
Shanghai Kaishitong
Semiconductor Co.,
Ltd., a.k.a., the
following two
aliases:
--Kaishitong
Semiconductor; and.
--Kingstone
Semiconductor..
Unit 1, Building 7, For all items Presumption of 89 FR [INSERT FR
No. 200 Newton subject to the EAR denial. PAGE NUMBER]
Road, China (See Sec. 744.11 December 5, 2024.
(Shanghai) Pilot of the EAR).
Free Trade Zone,
Shanghai, China;
and Unit 1,
Building 7, 200
Niudun Road,
Shanghai, China;
and 211 Qinqiao
Road, Shanghai,
China.
Shanghai Lingang For all items Presumption of 89 FR [INSERT FR
Kaishitong subject to the EAR denial. PAGE NUMBER]
Semiconductor Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Lingang Kaishitong
Semiconductor; and.
--Lingang Kingstone
Semiconductor..
Area A, Building 1,
No. 88 Wansong
Road, Lingang New
Area, Shanghai,
China; and No. 750,
Zhubai Road, Nanhui
New Town, Pudong
New Area, Shanghai,
China.
Shanghai Lizhi For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., Room 0248, (See Sec. 744.11 December 5, 2024.
2nd Floor, Ji of the EAR).
Building, No. 555
Dongchuan Road,
Minhang District,
Shanghai, China.
Shanghai Modern
Advanced Ultra-
Precision
Manufacturing
Center Co., Ltd.,
a.k.a., the
following three
aliases:
--Ultra-Precision
Manufacturing
Center;.
--UPEC; and.........
--SHUPEC............
No. 396, Minfeng For all items Presumption of 89 FR [INSERT FR
Road, Pudong New subject to the EAR denial. PAGE NUMBER]
District, Shanghai, (See Sec. 744.11 December 5, 2024.
China and Building of the EAR).
63 East, 100 Handan
Road, Shanghai,
China.
* * * * * *
Shanghai Nanpre For all items Presumption of 89 FR [INSERT FR
Mechanics Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following four of the EAR).
aliases:
--Micro-Yuan Qimi;..
--Shanghai Weigao;..
--Shanghai Microhigh
Precision
Mechanical
Engineering Co.,
Ltd.; and.
--Shanghai Micro-
High Precision
Machinery..
No. 1525, Zhangdong
Road, Shanghai,
China.
Shanghai Naura For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a. the of the EAR).
following two
aliases:
--Shanghai Naura;
and.
--Shanghai Naura
Microelectronics..
Building C, No. 888,
Huanhu West 2nd
Road, Lingang New
Area, Shanghai,
China.
* * * * * *
Shanghai Siwave For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a. the (See Sec. 744.11 December 5, 2024.
following six of the EAR).
aliases:
--Shanghai Xinwu
Technology Co.,
Ltd.;.
--Xinwu Technology;.
--SIWAVE;...........
--SIWAVE Technology;
--SIWAVE, INC.; and.
--Si-Wave...........
No. 333 Huangqing
Road, Jiading
District, Shanghai,
China.
Shanghai Skyverse For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following one
alias:
--Shanghai
Nanolighting
Semiconductor
Technology Co.,
Ltd., Room 303,
Building 13, No.
1211 Hongyin Road,
Lingang New Area,
Shanghai, China..
* * * * * *
Shanghai Xinsheng For all items Presumption of 89 FR [INSERT FR
Jingrui subject to the EAR. denial. PAGE NUMBER]
Semiconductor (See Sec. 744.11 December 5, 2024.
Technology Co., of the EAR).
Ltd., 2nd Floor,
Building 1, No.
1000, Yunshui Road,
Lingang New Area,
Shanghai, China.
[[Page 96847]]
Shanghai Xinsheng For all items Presumption of 89 FR [INSERT FR
Jingtou subject to the EAR denial. PAGE NUMBER]
Semiconductor (See Sec. 744.11 December 5, 2024.
Technology Co., of the EAR).
Ltd., Floor 4,
Building 6, No.
1000, Yunshui Road,
Lingang New Area,
Shanghai, China.
Shanghai Xinsheng For all items Presumption of 89 FR [INSERT FR
Jinko Semiconductor subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., Area B, 4th of the EAR).
Floor, Building 4,
No. 1000, Yunshui
Road, Lingang New
Area, Shanghai,
China.
Shanghai Xinsheng For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Zingsemi; and.....
--Zing Semiconductor
Corporation..
Buildings 1-4, 6-19,
No. 1000, Yunshui
Road, Lingang New
Area, Shanghai,
China.
Shanghai Yanquan For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., Building C, (See Sec. 744.11 December 5, 2024.
No. 888 Huanhu West of the EAR).
2nd Road, Lingang
New Area, Shanghai,
China.
Shanghai For all items Presumption of 89 FR [INSERT FR
Yuliangsheng subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following one
alias:
--UEASCEND..........
Building 1, No. 500
Mindong Road,
Pudong New
District, Shanghai,
China.
Shanghai Yuwei For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd, a.k.a., the of the EAR).
following one
alias:
--Shanghai Yuweitek.
Building 11, No. 899
Zuchong Road,
Shanghai, China.
Shanghai Zhichun For all items Presumption of 89 FR [INSERT FR
Alloy Manufacturing subject to the EAR denial. PAGE NUMBER]
Co., Ltd., Room (See Sec. 744.11 December 5, 2024.
309, Building 1, of the EAR).
No. 170 Zihai Road,
Minhang District,
Shanghai, China.
Shanghai Zhichun For all items Presumption of 89 FR [INSERT FR
Electronic subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., Room 302, of the EAR).
Building 10, No.
1211 Hongyin Road,
Lingang New Area,
China (Shanghai)
Pilot Free Trade
Zone, Shanghai,
China.
Shanghai Zhichun For all items Presumption of 89 FR [INSERT FR
Optoelectronic subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., Room D, 2nd of the EAR).
Floor, Building 3,
No. 880 Ziyue Road,
Minhang District,
Shanghai, China.
Shanghai Zhichun For all items Presumption of 89 FR [INSERT FR
Precision Gas Co., subject to the EAR denial. PAGE NUMBER]
Ltd., Room 301, (See Sec. 744.11 December 5, 2024.
Building 1, No. of the EAR).
170, Zihai Road,
Minhang District,
Shanghai, China.
Shanghai Zhichun For all items Presumption of 89 FR [INSERT FR
Precision subject to the EAR denial. PAGE NUMBER]
Manufacturing Co., (See Sec. 744.11 December 5, 2024.
Ltd. a.k.a. the of the EAR).
following one
alias:
--Nanolink..........
Room 305, Building
1, No. 170 Zihai
Road, Minhang
District, Shanghai,
China.
Shanghai Zhichun For all items Presumption of 89 FR [INSERT FR
Purification System subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a. the of the EAR).
following five
aliases:
--Pure Technology;..
--PNC Process;......
--PNC Process
Systems Co., Ltd.;.
--PNC Technology
Group and.
--PNC...............
No. 170 Zihai Road,
Minhang District,
Shanghai, China.
Shanghai Zhichun For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., Room 304, of the EAR).
Building 1, No. 170
Zihai Road, Minhang
District, Shanghai,
China.
Shanghai Zhichun For all items Presumption of 89 FR [INSERT FR
System Integration subject to the EAR denial. PAGE NUMBER]
Co., Ltd., a.k.a., (See Sec. 744.11 December 5, 2024.
the following one of the EAR).
alias:
--Pure Integration..
3rd and 4th floors,
Building 2, No. 170
Zihai Road, Minhang
District, Shanghai,
China.
Shanghai Zhijia For all items Presumption of 89 FR [INSERT FR
Semiconductor Gas subject to the EAR denial. PAGE NUMBER]
Co., Ltd., No. 912 (See Sec. 744.11 December 5, 2024.
J, Yecheng Road, of the EAR).
Jiading Industrial
Zone, Shanghai,
China.
Shanghai Zixi For all items Presumption of 89 FR [INSERT FR
Optical Technology subject to the EAR denial. PAGE NUMBER]
Co., Ltd., Building (See Sec. 744.11 December 5, 2024.
C, No. 888, Huanhu of the EAR).
West 2nd Road,
Lingang New Area,
China (Shanghai)
Pilot Free Trade
Zone, Shanghai,
China.
* * * * * *
Shengmei For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Equipment (Beijing) (See Sec. 744.11 December 5, 2024.
Co., Ltd., Room of the EAR).
905, Floor 9,
Building 7, No. 15
Ronghua South Road,
Beijing, China.
Shengmei For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Equipment Wuxi Co., (See Sec. 744.11 December 5, 2024.
Ltd., Room 6, Lot of the EAR).
J1, Wuxi New
District Export
Processing Zone,
Wuxi, China.
[[Page 96848]]
Shengwei For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Equipment (See Sec. 744.11 December 5, 2024.
(Shanghai) Co., of the EAR).
Ltd., Building C,
No. 888, Huanhu
West 2nd Road,
Nanhui New Town,
Lingang New Area,
Shanghai, China.
Shenyang Xinyuan For all items Presumption of 89 FR [INSERT FR
Micro Business subject to the EAR denial. PAGE NUMBER]
Development Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Kingsemi Micro
Business
Development Co.,
Ltd.; and.
--Core Source
Business
Development Co.,
Ltd..
Rooms 201 and 202,
Building 1, No. 501
Xuri Road, Lingang
New Area, Shanghai,
China.
Shenyang Xinyuan For all items Presumption of 89 FR [INSERT FR
Microelectronic subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following three
aliases:
--Kingsemi;.........
--Shenyang Kingsemi
Microelectronics
Equipment Co.,
Ltd.; and.
--Shenyang Core
Source..
No. 16 Feiyun Road,
Hunnan District,
Shenyang, China.
* * * * * *
Shenzhen Guowei For all items Presumption of 89 FR [INSERT FR
Hongbo Technology subject to the EAR denial. PAGE NUMBER]
Co., Ltd., Room (See Sec. 744.11 December 5, 2024.
14C, Guoshi of the EAR).
Building, No. 1801
Shahe West Road,
High-tech Zone
Community, Yuehai
Street, Nanshan
District, Shenzhen,
China.
Shenzhen Guowei For all items Presumption of 89 FR [INSERT FR
Sensing Technology subject to the EAR denial. PAGE NUMBER]
Co., Ltd., a.k.a., (See Sec. 744.11 December 5, 2024.
the following one of the EAR).
alias:
--SMIT Sense........
Room 22B, Guoshi
Building, No. 1801
Shahe West Road,
High-tech Zone
Community, Yuehai
Street, Nanshan
District, Shenzhen,
China and Floor 23,
Building 3,
Chongwen Park,
Nanshan Intelligent
Valley, No. 3370
Liuxian Avenue,
Shenzhen, China;
and Floor 23,
Building 3,
Chongwen Park,
Nanshan Zhiyuan,
No. 3370 Liuxian
Avenue, Shenzhen,
China.
Shenzhen Guoweichip For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following five of the EAR).
aliases:
--SMIT Xintech;.....
--Xintech;..........
--Guoweixin;........
--GWX; and..........
--GWX Technologies..
15th Floor, Guoshi
Building, No. 1801,
Shahe West Road,
Nanshan District,
Shenzhen, China.
Shenzhen Huada For all items Presumption of 89 FR [INSERT FR
Jiutianke subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Shenzhen Huada;
and.
--Shenzhen Empyrean.
10th floor, Building
E, ShenZhen-Hong
Kong International
Hi-Tech Park, No. 3
Binglang Rd.,
Futian District,
Shenzhen, China;
and Room 1001,
Building 5,
Northwest Shenjiu
Technology Pioneer
Park, at the
intersection of
Taohua Road and
Betel Road, Fubao
Community, Fubao
Street, Futian
District, Shenzhen,
China.
* * * * * *
Shenzhen Jingyuan For all items Presumption of 89 FR [INSERT FR
Information subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., No. 8 of the EAR).
Hongmian Road, Room
401A, Building C,
Yingdali Technology
Digital Park, Fubao
Community, Fubao
Street, Futian
District, Shenzhen,
China and 301F,
Suite C, Yingdali
Technology Shuma
Park, Hongmiandao,
Fubao Sub-District,
Futian District,
Shenzhen,
Guangdong, 518015,
China.
* * * * * *
Shenzhen Naura For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Shenzhen Naura;
and.
--Shenzhen Naura
Microelectronics..
No. 11, Jinniu West
Road, Longtian
Street, Pingshan
District, Shenzhen,
China; and About 40
meters west of
Haofang Jingyuan,
Yanziling 3rd Road,
Pingshan District,
Shenzhen, China.
* * * * * *
[[Page 96849]]
Shenzhen Pengxinxu For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial except case- PAGE NUMBER]
Ltd., a.k.a., the (See Sec. Sec. by-case for items December 5, 2024.
following five 734.4(a)(9), not described in
aliases: 734.9(e)(3), and ECCN 3B001.a.4, .c,
--Peng Xin Xu;...... 744.11 of the EAR) .d, f.1.b.2, .k to
--PingXinXu;........ \5\. .p; 3B002.c, 3B993,
--PST;.............. or 3B994.
--Shenzhen Pensun
Technology Co.,
Ltd.; and.
--PXX...............
Floor 54-56,
Building C, Digital
Innovation Center,
No. 328 Mintang
Road, Longhua
District, Shenzhen
City, Guangdong
Province, China;
and Room 403,
Podium Building,
Innovation Plaza,
No. 2007, Pingshan
Avenue, Liulian
Community Pingshan
Street, Pingshan
District, Shenzhen,
China; and 3001 Jin
Xiu West Road
Pingshan District,
Shenzhen, China.
Shenzhen Qianhai For all items Presumption of 89 FR [INSERT FR
Skyverse subject to the EAR denial. PAGE NUMBER]
Semiconductor (See Sec. 744.11 December 5, 2024.
Technology Co., of the EAR).
Ltd., a.k.a., the
following one
alias:
--Shenzhen Qianhai
Nanolighting
Semiconductor
Technology Co.,
Ltd..
Room 201, Building
A, No. 1 Qianwan
1st Road, Qianhai
Shenzhen-Hong Kong
Cooperation Zone,
Shenzhen, China.
* * * * * *
Shenzhen SiCarrier For all items Presumption of 89 FR [INSERT FR
Technologies Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following six of the EAR).
aliases:
--Shenzhen Xinkailai
Technology Co.,
Ltd.;.
--Shenzhen
Xinkailai;.
--Xinkailai;........
--SiCarrier;........
--Huawei Starlight
Engineering
Department; and.
--Huawei Starlight
Department..
Zhongke Industrial
Park, Zhonghuan
Avenue, Pinghu
Street, Longgang
District, Shenzhen,
China; and No. 91
Xuri East Road,
Shanxia Community,
Pinghu Street,
Longgang District,
Shenzhen, China;
and Building 6,
Zhongke Valley,
Longgang District,
Shenzhen, China;
and No. 368
Tianjiao Road,
Chengdu High-Tech
Zone, China; and
No. 16, Pingle
Street, Changhe
Street, Binjiang
District, Hangzhou
City, China; and
Building A, Xi'an
Software Park, No.
68, Keji 2nd Road,
High-Tech Zone,
Xi'an City, Shaanxi
Province, China;
and Building B4,
Phase 1, Longshan
Innovation Park,
Wuhan Future
Science and
Technology City,
No. 999 Gaoxin
Avenue, Donghu New
Technology
Development Zone,
Wuhan City, Hubei
Province, China.
* * * * * *
Shenzhen Xinkailai For all items Presumption of 89 FR [INSERT FR
Industrial subject to the EAR denial. PAGE NUMBER]
Machinery Co., (See Sec. 744.11 December 5, 2024.
Ltd., Room 1301, of the EAR).
Building 6,
Zhongkegu
Industrial Park,
Zhonghuan Avenue,
Shanxia Community,
Pinghu Street,
Shenzhen, China.
* * * * * *
Shenzhen Zhangge For all items Presumption of 89 FR [INSERT FR
Instrument Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following three of the EAR).
aliases:
--Shenzhen Zhangge;.
--Zhangge; and......
--Shenzhenshi
Zhangge Yiqi
Youxian Gongsi..
Room 135, Longguang
Jiuyu Mansion, No.
115 Guanlan Avenue,
Xinhe Community,
Fucheng Street,
Longhua District,
Shenzhen, China.
* * * * * *
Si'En Qingdao Co. For all items Presumption of 89 FR [INSERT FR
Ltd., a.k.a., the subject to the EAR denial. PAGE NUMBER]
following five (See Sec. Sec. December 5, 2024.
aliases: 734.4(a)(9),
--Si'EN;............ 734.9(e)(3), and
--SiEn (Qingdao) 744.11 of the EAR)
Semiconductor \5\.
Corporation Co.;.
--SiEn (Qingdao)
Integrated Circuits
Co., Ltd.;.
--SiEn; and.........
--XinEn.............
Building M, No.
1088, Shanwanghe
Road, West Coast
New District,
Qingdao, China; and
Room 401, German
Enterprise South
Zone, No. 19
Taibaishan Road,
Huangdao District,
Qingdao, China.
* * * * * *
SJ Semiconductor, For all items See Sec. Sec. 85 FR 83420, 12/22/
a.k.a., the subject to the EAR 744.11 and 20. 89 FR [INSERT
following two (See Sec. 744.11 744.23(d) of the FR PAGE NUMBER]
aliases: of the EAR). EAR. December 5, 2024.
--SJ Semiconductor
(Jiangyin) Corp.;
and.
--SJ Jiangyin.......
[[Page 96850]]
6 Dongsheng West
Road, Building A8-
4, Jiangyin City,
Jiangsu Province,
214437, China.
* * * * * *
Skyverse, a.k.a., For all items Presumption of 89 FR [INSERT FR
the following two subject to the EAR denial. PAGE NUMBER]
aliases: (See Sec. 744.11 December 5, 2024.
--Shenzhen of the EAR).
Nanolighting
Technology Co.,
Ltd; and.
--Nanolighting Lab..
Room 101, 201, and
301, No. 2 Dalang
Street, Tongsheng
Community,
Shanghenglang
Fourth Industrial
Zone, Shenzhen,
China; and Rooms
1401 through 1404,
Floor 14, Building
7, No. 19 Beiyuan
East Road, Chaoyang
District, Beijing,
China; and Room 102-
B3, Building 8B,
Shahu Science and
Technology Park,
No. 183 Tinglan
Lane, Suzhou,
China; and Building
2, Workshop Area,
No. 1301-18,
Yinxing Technology
Park, Longhua
District, Shenzhen,
China.
Skyverse Limited, For all items Presumption of 89 FR [INSERT FR
a.k.a., the subject to the EAR denial. PAGE NUMBER]
following one (See Sec. 744.11 December 5, 2024.
alias: of the EAR).
--Hong Kong Zhongke
Feice..
1008, Prosperity
Millennia Plaza,
663 King's Rd, Tsat
Tsz Mui, Hong Kong.
* * * * * *
SMIC Advanced For all items Presumption of 89 FR [INSERT FR
Technology R&D subject to the EAR denial. PAGE NUMBER]
(Shanghai) (See Sec. Sec. December 5, 2024.
Corporation, 734.4(a)(9),
a.k.a., the 734.9(e)(3), and
following seven 744.11 of the EAR)
aliases: \5\.
--SMIC New
Technology Research
and Development
(Shanghai)
Corporation;.
--SMIC New
Technology R&D
(Shanghai)
Corporation;.
--SMIC Advanced
Technology Research
& Development
(Shanghai)
Corporation;.
--Zhongxin Guoji
Jicheng Dianlu
Xinjishu Yanfa
(Shanghai) Youxian
Gongsi;.
--SMIC Advanced
Technology;.
--SMIC New
Technology; and.
--SMIC New
Technology Research
& Development..
18 Zhangjiang Road,
Pudong New Area,
Shanghai, China;
and 6th Floor,
Building 3, No. 18,
Zhangjiang Road,
China (Shanghai)
Pilot Free Trade
Zone Shanghai,
Shanghai, 201203
China.
SMIC Holdings For all items See Sec. Sec. 85 FR 83420, 12/22/
Limited, Building subject to the EAR 744.11 and 20. 89 FR [INSERT
1, No. 1059 Dangui (See Sec. 744.11 744.23(d) of the FR PAGE NUMBER]
Road, China of the EAR). EAR. December 5, 2024.
(Shanghai) Pilot
Free Trade Zone,
Shanghai, China.
SMIC Hong Kong For all items See Sec. Sec. 85 FR 83420, 12/22/
International subject to the EAR 744.11 and 20. 85 FR 83769,
Company Limited, (See Sec. 744.11 744.23(d) of the 12/23/20. 86 FR
a.k.a., the of the EAR). EAR. 12531, 3/4/21. 89
following one FR [INSERT FR PAGE
alias: NUMBER] December
--SMIC Hong Kong.... 5, 2024.
Suite 3003, 30th
Floor, No. 9
Queen's Road,
Central, Hong Kong.
SMIC Northern For all items Presumption of 85 FR 83420, 12/22/
Integrated Circuit subject to the EAR denial. 20. 89 FR [INSERT
Manufacturing (See Sec. Sec. FR PAGE NUMBER]
(Beijing) Co., 734.4(a)(9), December 5, 2024.
Ltd., a.k.a., the 734.9(e)(3), and
following two 744.11 of the EAR)
aliases: \5\.
--Semiconductor
Manufacturing North
China (Beijing)
Corporation; and.
--SMIC North........
Building 9, No. 18
Wenchang Avenue,
Beijing Economic
and Technological
Development Zone,
Beijing, China.
SMIC Semiconductor For all items See Sec. Sec. 85 FR 83420, 12/22/
Manufacturing subject to the EAR 744.11 and 20. 89 FR [INSERT
(Shanghai) Co., (See Sec. 744.11 744.23(d) of the FR PAGE NUMBER]
Ltd., a.k.a., the of the EAR). EAR. December 5, 2024.
following one
alias:
--Suzhou Design
Center..
Room 602, Building
1, No.158 Suya
Road, Suzhou
Industrial Park,
China.
* * * * * *
Suzhou Nanda For all items Presumption of 89 FR [INSERT FR
Optoelectronic subject to the EAR denial. PAGE NUMBER]
Materials Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Suzhou Nata; and..
--Suzhou Nanda......
No. 40, Pingsheng
Road, Suzhou
Industrial Park,
Suzhou, China; and
No. 67, Pingsheng
Road, Suzhou
Industrial Park,
Suzhou, China.
* * * * * *
[[Page 96851]]
SwaySure Technology For all items Presumption of 89 FR [INSERT FR
Co., Ltd., a.k.a., subject to the EAR denial except case- PAGE NUMBER]
the following four (See Sec. Sec. by-case for items December 5, 2024.
aliases: 734.4(a)(9), not described in
--SwaySure;......... 734.9(e)(3), and ECCN 3B001.a.4, .c,
--Shenzhen 744.11 of the EAR) .d, f.1.b.2, .k to
ShengWeixu \5\. .p; 3B002.c, 3B993,
Technology Company;. or 3B994.
--Sheng Weixu; and..
--SWX...............
Xiangshan Science
and Technology
Park, No. 1 Guiping
Road, Fucheng
Street, Longua
District, Shenzhen
City, Guangdong
Province, China;
and Floor 54-56,
Building C, Digital
Innovation Center,
No. 328 Mintang
Road, Longhua
District, Shenzhen
City, Guangdong
Province, China;
and Room 104,
Building B, No. 1
Xinyuan 3rd Lane,
Fuchengao
Community, Pinghu
Street, Longgang
District, Shenzhen,
China.
* * * * * *
Taiyuan Jinke For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., Area A, 4th of the EAR).
Floor, No. 5 Fengze
Road, Taiyuan,
China.
* * * * * *
Ulanqab Nanda For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Materials Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following four
aliases:
--Ulanqab Nata;.....
--Ulanqab Nanda;....
--Ulanqab Nata
Microelectronics;
and.
--Ulanqab Nanda
Microelectronics..
Room 101, Building
5, Zone B,
Business, Science,
Technology and
Culture Center,
Jining District,
Ulanqab, China.
* * * * * *
Wingtech Technology For all items Presumption of 89 FR [INSERT FR
Co., Ltd., a.k.a., subject to the EAR denial. PAGE NUMBER]
the following one (See Sec. 744.11 December 5, 2024.
alias: of the EAR).
--WINGTECH..........
No. 18 East Xincheng
Road, Wangren Town,
Huangshi
Development Zone,
Tieshan District,
Hubei Province,
China; and 4th
through 6th floors
of Bldg. 4 of Juxin
Yuan, No. 188
Pingfu Rd. Xuhui
District, Shanghai,
China; and
Zhongqing Mansion,
No. 42 Gaoxin 6th
Rd. High Tech Zone,
Xi'an, China; and
No. 777 Yazhong Rd.
Jiaxing, Zhejiang,
China; and 11
Changjiang South
Rd. Xinwu Dist.,
Wuxi, Jiangsu,
China; and 7
Shenzhou Rd.,
Science City
Guangzhou High Tech
Industrial
Development Zone,
Guangzhou, China;
and 5097 Luosha
Road, Yinfeng Area,
Shenzhen, China;
and No. 1003, Yanhe
North Road, Jingji
Oriental Duhui
Area, Shenzhen,
China.
Wise Road Capital For all items Presumption of 89 FR [INSERT FR
a.k.a., the subject to the EAR denial. PAGE NUMBER]
following three (See Sec. 744.11 December 5, 2024.
aliases: of the EAR).
--Beijing Wise Road
Management Co.,
Ltd.;.
--Beijing Zhilu
Asset Management
Co., Ltd.; and.
--Zhilu Asset.......
2/F, Beijing
International Club
Office Tower, No.
21 Jian Guo Men Wai
Street, Chaoyang
District, Beijing,
China and Room
1810, Bund Center,
222 Yan An East,
Huangpu District,
Shanghai, China and
Room 901-3, 9th
Floor, Building 57,
No. 2 Jingyuan
North Street,
Beijing Economic
and Technological
Development Zone,
Beijing, China and
Room 8-50, Building
6, Ronghui Garden,
Linkong Economic
Core Zone, Shunyi
District, Beijing,
China.
* * * * * *
Wuhan Naura For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a. the of the EAR).
following two
aliases:
--Wuhan Naura; and..
--Wuhan Naura
Microelectronics..
Fifth Floor, Hubei
Marine Engineering
Equipment Research
Institute, Taolin
Road, Jiangxia
District, Wuhan,
China.
* * * * * *
Wuhan Skyverse For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER]
Technology Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following one
alias:
--Wuhan Nanolighting
Semiconductor
Technology Co.,
Ltd..
[[Page 96852]]
Room 201, 2nd Floor,
Building C2, Phase
I, Longshan
Innovation Park,
Wuhan Future
Science and
Technology City,
No. 999 Gaoxin
Avenue, East Lake
New Technology
Development Zone,
Wuhan, China.
Wuhan Xinxin For all items See Sec. Sec. 89 FR [INSERT FR
Semiconductor subject to the EAR 740.26, 744.11, and PAGE NUMBER]
Manufacturing (See Sec. Sec. 744.23(d) of the December 5, 2024.
Company Limited, 734.4(a)(9), EAR.
a.k.a., the 734.9(e)(3), and
following one 744.11 of the EAR)
alias: \5\.
--XMC...............
No. 18 Gaoxin Four
Road, East Lake
High-Tech
Development Zone,
Wuhan, China; and
3rd Floor, Area E,
Shengyin Building,
Shengxia Road,
Pudong New
District, Shanghai,
China; and Room
B504, Building B,
International
Science and
Technology Park
Phase II, No. 1355
Jinjihu Avenue,
Suzhou Industrial
Park, Suzhou,
China; and T2 1909,
Fangda City, No. 2
Longzhu 4th Road,
Nanshan District,
Shenzhen, China.
Wuhan Yiguang For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Wuhan eoptics
Technology..
Building 6, No. 10,
Financial Gang 4th
Road, East Lake New
Technology
Development Zone,
Wuhan, China.
Wuxi Kaishitong For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Wuxi Kingstone
Technology..
Room 201, plot on
the west side of
the new 312
National Highway,
Shuofang, Wuxi New
District, on the
north side of Xijin
Road (in the
Airport Industrial
Park), Wuxi, China;
and Room 201,
Building 14, Xutian
Technology Park,
No. 53 Xiuxi Road,
Binhu District,
Wuxi, China.
* * * * * *
Wuxi Naura For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Wuxi Naura; and...
--Wuxi Naura
Microelectronics..
IC Design Building
B1007, 33 Xinda
Road, Xinwu
District, Wuxi,
China.
* * * * * *
Xiamen Skyverse For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Xiamen
Nanolighting
Technology Co.,
Ltd., Unit 1623,
No. 567 Haicang
Avenue, Xiamen,
China..
* * * * * *
Xi'an Huada Jiutian For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following two of the EAR).
aliases:
--Xi'an Huada; and..
--Xi'an Empyrean....
Unit 8F, Floor G1,
Xi'an Huanpu
International
Technology Yuan,
No. 211, Tiangu 8th
Road, High-tech
Zone, Xi'an, China.
* * * * * *
Xi'an Naura For all items Presumption of 89 FR [INSERT FR
Microelectronics subject to the EAR denial. PAGE NUMBER]
Equipment Co., (See Sec. 744.11 December 5, 2024.
Ltd., a.k.a., the of the EAR).
following two
aliases:
--Xi'an Naura; and..
--Xi'an Naura
Microelectronics..
Floor 4, Building D,
National Service
Outsourcing
Demonstration Base,
No. 11 Jinye 1st
Road, High-tech
Zone, Xi'an, China.
* * * * * *
Xinlian Rongchuang For all items Presumption of 89 FR [INSERT FR
Integrated Circuit subject to the EAR denial. PAGE NUMBER]
Industry (See Sec. 744.11 December 5, 2024.
Development of the EAR).
(Beijing) Co.,
Ltd., No. 19,
Ronghua Middle
Road, Room 312, 3rd
Floor, Building B,
Beijing Economic
and Technological
Development Zone,
Beijing, China.
* * * * * *
Yusheng Micro For all items Presumption of 89 FR [INSERT FR
Semiconductor subject to the EAR denial. PAGE NUMBER AND
(Shanghai) Co., (See Sec. 744.11 DATE OF
Ltd., 1F-A, 2F-A, of the EAR). PUBLICATION IN THE
Building 2, No. 365 FEDERAL REGISTER].
Chuanhong Road,
Pudong New
District, Shanghai,
China.
* * * * * *
Yuwei Semiconductor For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER AND
Ltd., a.k.a., the (See Sec. 744.11 DATE OF
following two of the EAR). PUBLICATION IN THE
aliases: FEDERAL REGISTER].
--Yuweitek; and.....
--Yuwei
Semiconductor..
[[Page 96853]]
Building 1, No. 469,
Huatuo Lane, High-
tech Zone, Hefei,
China; and Room
295, Building 1,
No. 1531, Jincheng
East Road, Jiangxi
Street, Xinwu
District, Wuxi,
China; and Room 302-
1, Building E1,
Saida Testing and
Certification Park,
No. 5, Xinghua
Third Branch Road,
Xiqing Economic and
Technological
Development Zone,
Tianjin, China; and
Room 404, Qingfeng
Rongsheng Venture
Capital Building,
No. 88-8, Bagua 3rd
Road, Shanglin
Community, Yuanling
Street, Futian
District, Shenzhen,
China; and Room
309, Building 5,
No. 29, Qingxiang
South Road, Daxing
District, Beijing,
China; and Room
202, 2nd Floor and
Room 01, Building
10, No. 899 Zuchong
Road, Shanghai,
China.
* * * * * *
Zhangjiang For all items Presumption of 89 FR [INSERT FR
Laboratory, a.k.a., subject to the EAR denial. PAGE NUMBER]
the following three (See Sec. Sec. December 5, 2024.
aliases: 734.4(a)(9),
--Zhangjiang Lab;... 734.9(e)(3), and
--Zhangjiang 744.11 of the EAR)
National Lab; and. \5\.
--ZJLab.............
No. 100, Haike Road,
Pudong New Area,
Shanghai, China;
and No. 99, Haike
Road, Pudong New
Area, Shanghai,
China.
* * * * * *
Zhejiang Shenqihang For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., No. 17, Binhe (See Sec. 744.11 December 5, 2024.
Road, Qingshan Lake of the EAR).
Street, Lin'an
District, Hangzhou,
China.
* * * * * *
Zhejiang Zhichun For all items Presumption of 89 FR [INSERT FR
Precision subject to the EAR denial. PAGE NUMBER]
Manufacturing Co., (See Sec. 744.11 December 5, 2024.
Ltd., Room 412, of the EAR).
Building 1, No. 8,
Xinzhong Road,
Haining Economic
Development Zone
(Haichang Street),
Haining City,
Jiaxing, China.
Zhiwei Semiconductor For all items Presumption of 89 FR [INSERT FR
(Shanghai) Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Ultron............
Room 306, Building
1, No. 170 Zihai
Road, Minhang
District, Shanghai.
China.
Zhiyi High Purity For all items Presumption of 89 FR [INSERT FR
Electronic subject to the EAR denial. PAGE NUMBER]
Materials (See Sec. 744.11 December 5, 2024.
(Shanghai) Ltd., of the EAR).
a.k.a., the
following one
alias:
--Finetron..........
Room 306, Building
1, No. 170 Zihai
Road, Minhang
District, Shanghai.
China.
* * * * * *
Zhuhai Cornerstone For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Cornerstone
Technologies
Company..
Room 602, Building
1, No. 18, Nangang
Middle Road,
Zhuhai, China.
Zhuhai Skyverse For all items Presumption of 89 FR [INSERT FR
Technology Co., subject to the EAR denial. PAGE NUMBER]
Ltd., a.k.a., the (See Sec. 744.11 December 5, 2024.
following one of the EAR).
alias:
--Zhuhai
Nanolighting
Technology Co.,
Ltd..
Card No. 03, Room
401, Building 21,
No. 1889 Huandao
East Road, Hengqin
New District,
Zhuhai, China.
* * * * * *
Zibo Keyuanxin For all items Presumption of 89 FR [INSERT FR
Fluorine Trading subject to the EAR denial. PAGE NUMBER]
Ltd., No. 5, Road (See Sec. 744.11 December 5, 2024.
4, Gaoqing Chemical of the EAR).
Industry Park,
Gaocheng Town,
Gaoqing County,
Zibo, China.
----------------------------------------------------------------------------------------------------------------
* * * * * * *
----------------------------------------------------------------------------------------------------------------
JAPAN.................... * * * * * *
Kingsemi Japan K.K., For all items Presumption of 89 FR [INSERT FR
a.k.a., the subject to the EAR denial. PAGE NUMBER]
following two (See Sec. 744.11 December 5, 2024.
aliases: of the EAR).
--Kingsemi Kyoto
K.K.; and.
--Kingsemi..........
680-1,
Omandokorocho,
Sagaru, Bukkoji,
Karasumadoori,
Shimogyo-Ku
Daihachi Hase Bldg.
9F-B Kyoto, Kyoto,
600-8413 Japan.
----------------------------------------------------------------------------------------------------------------
* * * * * * *
----------------------------------------------------------------------------------------------------------------
SINGAPORE................ * * * * * *
Skyverse Pte. Ltd., For all items Presumption of 89 FR [INSERT FR
a.k.a., the subject to the EAR denial. PAGE NUMBER]
following one (See Sec. 744.11 December 5, 2024.
alias: of the EAR).
--Skyverse..........
#14-08, Keppel Bay
Tower, 1
Harbourfront
Avenue, 098632,
Singapore.
[[Page 96854]]
* * * * * *
----------------------------------------------------------------------------------------------------------------
* * * * * * *
----------------------------------------------------------------------------------------------------------------
SOUTH KOREA.............. ACM Research Korea For all items Presumption of 89 FR [INSERT FR
Co., Ltd., 402, subject to the EAR denial. PAGE NUMBER]
Hyundai City Plaza, (See Sec. 744.11 December 5, 2024.
2106 Gyeong chung- of the EAR).
daero, Bubal-eup,
Icheon-si, Gyeonggi-
do, South Korea.
Empyrean Korea, No. For all items Presumption of 89 FR [INSERT FR
178, 602, Bangyoe- subject to the EAR denial. PAGE NUMBER]
ro, Bundang-gu, (See Sec. 744.11 December 5, 2024.
Seongnam-si, of the EAR).
Gyeonggi-do
(Sampyeong-dong),
South Korea.
* * * * * *
----------------------------------------------------------------------------------------------------------------
* * * * * * *
----------------------------------------------------------------------------------------------------------------
* * * * * * *
\5\ For this entity, ``items subject to the EAR'' includes foreign-produced items that are subject to the EAR
under Sec. 734.9(e)(3) of the EAR. See Sec. 744.11(a)(2)(v) for related license requirements and license
application review policy.
PART 748--APPLICATIONS (CLASSIFICATION, ADVISORY, AND LICENSE) AND
DOCUMENTATION
0
3. The authority citation for part 748 is revised to read as follows:
Authority: 50 U.S.C. 4801-4852; 50 U.S.C. 4601 et seq.; 50
U.S.C. 1701 et seq.; E.O. 13026, 61 FR 58767, 3 CFR, 1996 Comp., p.
228; E.O. 13222, 66 FR 44025, 3 CFR, 2001 Comp., p. 783; Notice of
August 13, 2024, 8 FR 66187 (August 15, 2024).
Supplement No. 7 to Part 748--[Amended]
0
4. Amend Supplement No. 7 to Part 748 by removing the entire entries
for ``Advanced Micro-Fabrication Equipment, Inc., China'', ``CSMC
Technologies Corporation'', and ``Shanghai Huahong Grace Semiconductor
Manufacturing Corporation'' in ``China (People's Republic of)''.
Matthew S. Borman,
Principal Deputy Assistant Secretary for Strategic Trade and Technology
Security.
[FR Doc. 2024-28267 Filed 12-2-24; 8:45 am]
BILLING CODE 3510-33-P