Foreign-Trade Zone (FTZ) 75-Phoenix, Arizona; Notification of Proposed Production Activity; TSMC Arizona Corporation (Semiconductor Wafers); Phoenix, Arizona, 79856-79857 [2022-28219]

Download as PDF 79856 Federal Register / Vol. 87, No. 248 / Wednesday, December 28, 2022 / Notices DEPARTMENT OF COMMERCE Office of the Secretary Agency Information Collection Activities; Submission to the Office of Management and Budget (OMB) for Review and Approval; Comment Request; Generic Clearance for the Collection of Qualitative Feedback on Agency Service Delivery Office of the Secretary, Commerce. ACTION: Notice of information collection, request for comment. AGENCY: The Department of Commerce, in accordance with the Paperwork Reduction Act of 1995 (PRA), invites the general public and other Federal agencies to comment on proposed, and continuing information collections, which helps us assess the impact of our information collection requirements and minimize the public’s reporting burden. The purpose of this notice is to allow for 60 days of public comment preceding submission of the collection to OMB. DATES: To ensure consideration, comments regarding this proposed information collection must be received on or before February 27, 2023. ADDRESSES: Interested persons are invited to submit written comments to the Department Paperwork Reduction Act Clearance Officer, Department of Commerce, Room 6616, 14th and Constitution Avenue NW, Washington, DC 20230 (or via the internet at PRAcomments@doc.gov. All comments received are part of the public record. Comments will generally be posted without change. Please reference OMB Control Number 0690–0030 in the subject line of your comments. Do not submit Confidential Business Information or otherwise sensitive or protected information. FOR FURTHER INFORMATION CONTACT: Requests for additional information or copies of the information collection instrument and instructions should be directed to S. Dumas, DOC PRA Clearance Officer, Office of Policy and Governance, 14th and Constitution Avenue NW, Room 6616, Washington, DC 20230 (202) 482–3306 or at PRAcomments@doc.gov. SUPPLEMENTARY INFORMATION: ddrumheller on DSK6VXHR33PROD with NOTICES SUMMARY: I. Abstract Executive Order 12862 directs Federal agencies to provide service to the public that matches or exceeds the best service available in the private sector. In order to work continuously to ensure that the Department of Commerce (DOC) VerDate Sep<11>2014 18:26 Dec 27, 2022 Jkt 259001 programs are effective and meet our customers’ needs we use a generic clearance process to collect qualitative feedback on our service delivery. This collection of information is necessary to enable DOC to garner customer and stakeholder feedback in an efficient, timely manner, in accordance with our commitment to improving service delivery. The information collected from our customers and stakeholders will help ensure that users have an effective, efficient, and satisfying experience with the programs. This feedback will provide insights into customer or stakeholder perceptions, experiences and expectations, provide an early warning of issues with service, or focus attention on areas where communication, training or changes in operations might improve delivery of products or services. These collections will allow for ongoing, collaborative and actionable communications between DOC and its customers and stakeholders. It will also allow feedback to contribute directly to the improvement of program management. Feedback collected under this generic clearance will provide useful information, but it will not yield data that can be generalized to the overall population. This type of generic clearance for qualitative information will not be used for quantitative information collections that are designed to yield reliably actionable results, such as monitoring trends over time or documenting program performance. II. Method of Collection The methods of collection include but are not limited to in-person surveys, telephone interviews or questionnaires, mail and email surveys, web-based products, focus groups, and comment cards. III. Data OMB Control Number: 0690–0030. Form Number(s): None. Type of Review: Regular submission (Extension and revision of a current information collection). Affected Public: Individuals or Households, Businesses or for-profit organizations, State, Local or Tribal Government, etc. Estimated Number of Respondents: 215,100. Estimated Time per Response: 5 to 30 minutes for surveys; 1 to 2 hours for focus groups; 30 minutes to 1 hour for interviews. Estimated Total Annual Burden Hours: 18,492. Estimated Total Annual Cost to Public: $517,961. PO 00000 Frm 00008 Fmt 4703 Sfmt 4703 Respondent’s Obligation: Voluntary. Frequency of Requests: One-time. Legal Authority: 44 U.S.C. 3501 et seq. IV. Request for Comments We are soliciting public comments to permit the Department/Bureau to: (a) Evaluate whether the proposed information collection is necessary for the proper functions of the Department, including whether the information will have practical utility; (b) Evaluate the accuracy of our estimate of the time and cost burden for this proposed collection, including the validity of the methodology and assumptions used; (c) Evaluate ways to enhance the quality, utility, and clarity of the information to be collected; and (d) Minimize the reporting burden on those who are to respond, including the use of automated collection techniques or other forms of information technology. Comments that you submit in response to this notice are a matter of public record. We will include or summarize each comment in our request to OMB to approve this ICR. Before including your address, phone number, email address, or other personal identifying information in your comment, you should be aware that your entire comment—including your personal identifying information—may be made publicly available at any time. While you may ask us in your comment to withhold your personal identifying information from public review, we cannot guarantee that we will be able to do so. Dated: December 22, 2022. Sheleen Dumas, Department PRA Clearance Officer, Office of the Chief Information Officer, Commerce Department. [FR Doc. 2022–28243 Filed 12–27–22; 8:45 am] BILLING CODE 3510–17–P DEPARTMENT OF COMMERCE Foreign-Trade Zones Board [B–64–2022] Foreign-Trade Zone (FTZ) 75— Phoenix, Arizona; Notification of Proposed Production Activity; TSMC Arizona Corporation (Semiconductor Wafers); Phoenix, Arizona TSMC Arizona Corporation submitted a notification of proposed production activity to the FTZ Board (the Board) for its facility in Phoenix, Arizona within Subzone 75O. The notification conforming to the requirements of the Board’s regulations (15 CFR 400.22) was received on December 13, 2022. E:\FR\FM\28DEN1.SGM 28DEN1 ddrumheller on DSK6VXHR33PROD with NOTICES Federal Register / Vol. 87, No. 248 / Wednesday, December 28, 2022 / Notices Pursuant to 15 CFR 400.14(b), FTZ production activity would be limited to the specific foreign-status material(s)/ component(s) and specific finished product(s) described in the submitted notification (summarized below) and subsequently authorized by the Board. The benefits that may stem from conducting production activity under FTZ procedures are explained in the background section of the Board’s website—accessible via www.trade.gov/ ftz. The proposed finished product is semiconductor wafers (duty rate is dutyfree). The proposed foreign-status materials and components include: methane (liquid; gas); chlorine; hydrogen; helium; xenon; nitrogen; acids (hydrochloric; nitric; phosphoric; hydrofluoric also known as hydrogen fluoride); hydrogen chloride; acid based solutions (phosphoric; acetic; nitric); silicate reagent; hydrogen bromide; carbon dioxide; silica; carbon monoxide; dinitrogen monoxide also known as nitrous oxide; nitric oxide; sulfur dioxide; boron trichloride; dichlorosilane; silane; silicon tetrachloride; chlorine trifluoride; diiodosilane; nitrogen trifluoride; anhydrous ammonia; ammonia; potassium hydroxide; slurries (potassium hydroxide based; cerium hydroxide based; polyglycerol polymer based; acetic acid based; ammonium hydroxide based; amorphous silica based; cerium dioxide based; potassium hydroxide based; silica based; tetraethylammonium hydroxide based; silica and phosphoric acid based); sulfur hexafluoride gas; tungsten hexafluoride; titanium tetrachloride; carbonyl sulfide; solutions (copper sulphate; potassium chloride electrode filling; hydrocarbon deposition; N-methylethanolamine; potassium chloride based; methyl 2hydroxyisobutyrate based photoresist; propylene glycol monomethyl ether acetate based photoresist; surfactant; triethanolamine based; 4-morpholine carbaldehyde based; ammonium fluoride based; cobalt based; ethylene glycol based; tetrahydrothiophene-1,1dioxide based); hydrogen peroxide; disilane; n-octane; ethyne also known as acetylene; trifluoromethane; tetrafluoromethane also known as perfluromethane; hexafluoro-1,3butadiene; octafluorocyclobutane; alcohols (isopropyl; tert-butyl); hexachlorodisilane; 2-heptanone; cyclohexanone; cyclopentanone; butyl acetate; propylene glycol monomethyl ether acetate; pentakis(dime thylamino)tantalum(V) powder; tetrakis(methylethylamino)zirconium; developer solutions (tetramethy VerDate Sep<11>2014 18:26 Dec 27, 2022 Jkt 259001 lammonium hydroxide; isobutyl propionate based); bis(diethylamino)silane; hexamethyldisilazane photoresist; N,Nbis(1-methylethyl)silanamine; tetramethylsilane; triethylaluminum; trimethylaluminum; trimethylsilane; butyrolactone; 2-propanol, 1-methoxy-, 2-acetate based undercoat material; wafer cleaning solutions (butoxyethanol based; ethanolamine based; hydroxyethanediphosphonic acid based); mixtures (photoresist chemical; diborane and argon; diborane and hydrogen; fluorine and nitrogen; helium and nitrogen; helium based compressed gas; hydrogen and argon; hydrogen and helium; hydrogen and nitrogen; methane and argon; oxygen and helium; xenon and hydrogen); cleaning solvents (dimethyl sulfoxide based; tetramethy lammonium hydroxide based); propylene glycol monomethylether based solvents; semi-processed semiconductor silicon wafers (doped; raw; reclaimed); benzotriazole based cleaning solutions; anti-reflective photoresist chemical coatings; copper anode discs; and, sputtering targets (cobalt; copper; tantalum; titanium) (duty rate ranges from duty-free to 6.5%). The request indicates that certain materials/components are subject to duties under section 301 of the Trade Act of 1974 (section 301), depending on the country of origin. The applicable section 301 decisions require subject merchandise to be admitted to FTZs in privileged foreign status (19 CFR 146.41). Public comment is invited from interested parties. Submissions shall be addressed to the Board’s Executive Secretary and sent to: ftz@trade.gov. The closing period for their receipt is February 6, 2023. A copy of the notification will be available for public inspection in the ‘‘Online FTZ Information System’’ section of the Board’s website. For further information, contact Juanita Chen at juanita.chen@trade.gov. Dated: December 21, 2022. Andrew McGilvray, Executive Secretary. [FR Doc. 2022–28219 Filed 12–27–22; 8:45 am] BILLING CODE 3510–DS–P PO 00000 Frm 00009 Fmt 4703 Sfmt 4703 79857 DEPARTMENT OF COMMERCE Foreign-Trade Zones Board [B–63–2022] Foreign-Trade Zone (FTZ) 9—Honolulu, Hawaii; Notification of Proposed Production Activity; Par Hawaii Refining, LLC (Renewable Fuels); Kapolei, Hawaii Par Hawaii Refining, LLC submitted a notification of proposed production activity to the FTZ Board (the Board) for its facility in Kapolei, Hawaii within Subzone 9A. The notification conforming to the requirements of the Board’s regulations (15 CFR 400.22) was received on December 14, 2022. Pursuant to 15 CFR 400.14(b), FTZ production activity would be limited to the specific foreign-status material(s)/ component(s) and specific finished product(s) described in the submitted notification (summarized below) and subsequently authorized by the Board. The benefits that may stem from conducting production activity under FTZ procedures are explained in the background section of the Board’s website—accessible via www.trade.gov/ ftz. The proposed finished product(s) and material(s)/component(s) would be added to the production authority that the Board previously approved for the operation, as reflected on the Board’s website. The proposed finished products include renewable diesel fuel, sustainable aviation fuel, renewable naphtha and carbon dioxide (duty rates—10.5 cents per barrel and 3.7%). The proposed foreign-status materials and components are crude and refined soybean oil (duty rate 19.1%). The request indicates that the materials/ components are subject to duties under section 301 of the Trade Act of 1974 (section 301), depending on the country of origin. The applicable section 301 decisions require subject merchandise to be admitted to FTZs in privileged foreign status (19 CFR 146.41). Public comment is invited from interested parties. Submissions shall be addressed to the Board’s Executive Secretary and sent to: ftz@trade.gov. The closing period for their receipt is February 6, 2023. A copy of the notification will be available for public inspection in the ‘‘Online FTZ Information System’’ section of the Board’s website. For further information, contact Diane Finver at Diane.Finver@trade.gov. E:\FR\FM\28DEN1.SGM 28DEN1

Agencies

[Federal Register Volume 87, Number 248 (Wednesday, December 28, 2022)]
[Notices]
[Pages 79856-79857]
From the Federal Register Online via the Government Publishing Office [www.gpo.gov]
[FR Doc No: 2022-28219]


-----------------------------------------------------------------------

DEPARTMENT OF COMMERCE

Foreign-Trade Zones Board

[B-64-2022]


Foreign-Trade Zone (FTZ) 75--Phoenix, Arizona; Notification of 
Proposed Production Activity; TSMC Arizona Corporation (Semiconductor 
Wafers); Phoenix, Arizona

    TSMC Arizona Corporation submitted a notification of proposed 
production activity to the FTZ Board (the Board) for its facility in 
Phoenix, Arizona within Subzone 75O. The notification conforming to the 
requirements of the Board's regulations (15 CFR 400.22) was received on 
December 13, 2022.

[[Page 79857]]

    Pursuant to 15 CFR 400.14(b), FTZ production activity would be 
limited to the specific foreign-status material(s)/component(s) and 
specific finished product(s) described in the submitted notification 
(summarized below) and subsequently authorized by the Board. The 
benefits that may stem from conducting production activity under FTZ 
procedures are explained in the background section of the Board's 
website--accessible via www.trade.gov/ftz.
    The proposed finished product is semiconductor wafers (duty rate is 
duty-free).
    The proposed foreign-status materials and components include: 
methane (liquid; gas); chlorine; hydrogen; helium; xenon; nitrogen; 
acids (hydrochloric; nitric; phosphoric; hydrofluoric also known as 
hydrogen fluoride); hydrogen chloride; acid based solutions 
(phosphoric; acetic; nitric); silicate reagent; hydrogen bromide; 
carbon dioxide; silica; carbon monoxide; dinitrogen monoxide also known 
as nitrous oxide; nitric oxide; sulfur dioxide; boron trichloride; 
dichlorosilane; silane; silicon tetrachloride; chlorine trifluoride; 
diiodosilane; nitrogen trifluoride; anhydrous ammonia; ammonia; 
potassium hydroxide; slurries (potassium hydroxide based; cerium 
hydroxide based; polyglycerol polymer based; acetic acid based; 
ammonium hydroxide based; amorphous silica based; cerium dioxide based; 
potassium hydroxide based; silica based; tetraethylammonium hydroxide 
based; silica and phosphoric acid based); sulfur hexafluoride gas; 
tungsten hexafluoride; titanium tetrachloride; carbonyl sulfide; 
solutions (copper sulphate; potassium chloride electrode filling; 
hydrocarbon deposition; N-methylethanolamine; potassium chloride based; 
methyl 2-hydroxyisobutyrate based photoresist; propylene glycol 
monomethyl ether acetate based photoresist; surfactant; triethanolamine 
based; 4-morpholinecarbaldehyde based; ammonium fluoride based; cobalt 
based; ethylene glycol based; tetrahydrothiophene-1,1-dioxide based); 
hydrogen peroxide; disilane; n-octane; ethyne also known as acetylene; 
trifluoromethane; tetrafluoromethane also known as perfluromethane; 
hexafluoro-1,3-butadiene; octafluorocyclobutane; alcohols (isopropyl; 
tert-butyl); hexachlorodisilane; 2-heptanone; cyclohexanone; 
cyclopentanone; butyl acetate; propylene glycol monomethyl ether 
acetate; pentakis(dimethylamino)tantalum(V) powder; 
tetrakis(methylethylamino)zirconium; developer solutions 
(tetramethylammonium hydroxide; isobutyl propionate based); 
bis(diethylamino)silane; hexamethyldisilazane photoresist; N,N-bis(1-
methylethyl)silanamine; tetramethylsilane; triethylaluminum; 
trimethylaluminum; trimethylsilane; butyrolactone; 2-propanol, 1-
methoxy-, 2-acetate based undercoat material; wafer cleaning solutions 
(butoxyethanol based; ethanolamine based; hydroxyethanediphosphonic 
acid based); mixtures (photoresist chemical; diborane and argon; 
diborane and hydrogen; fluorine and nitrogen; helium and nitrogen; 
helium based compressed gas; hydrogen and argon; hydrogen and helium; 
hydrogen and nitrogen; methane and argon; oxygen and helium; xenon and 
hydrogen); cleaning solvents (dimethyl sulfoxide based; 
tetramethylammonium hydroxide based); propylene glycol monomethylether 
based solvents; semi-processed semiconductor silicon wafers (doped; 
raw; reclaimed); benzotriazole based cleaning solutions; anti-
reflective photoresist chemical coatings; copper anode discs; and, 
sputtering targets (cobalt; copper; tantalum; titanium) (duty rate 
ranges from duty-free to 6.5%). The request indicates that certain 
materials/components are subject to duties under section 301 of the 
Trade Act of 1974 (section 301), depending on the country of origin. 
The applicable section 301 decisions require subject merchandise to be 
admitted to FTZs in privileged foreign status (19 CFR 146.41).
    Public comment is invited from interested parties. Submissions 
shall be addressed to the Board's Executive Secretary and sent to: 
[email protected]. The closing period for their receipt is February 6, 
2023.
    A copy of the notification will be available for public inspection 
in the ``Online FTZ Information System'' section of the Board's 
website.
    For further information, contact Juanita Chen at 
[email protected].

    Dated: December 21, 2022.
Andrew McGilvray,
Executive Secretary.
[FR Doc. 2022-28219 Filed 12-27-22; 8:45 am]
BILLING CODE 3510-DS-P
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