Notice of intent to grant exclusive license, 65751 [2011-27464]
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Federal Register / Vol. 76, No. 205 / Monday, October 24, 2011 / Notices
Ms.
Susan M. Burch, Advisory Committee
Management Division, Office of
International and Interagency Relations,
(202) 358–0550, National Aeronautics
and Space Administration, Washington,
DC 20546–0001.
FOR FURTHER INFORMATION CONTACT:
October 18, 2011.
P. Diane Rausch,
Advisory Committee Management Officer,
National Aeronautics and Space
Administration.
[FR Doc. 2011–27407 Filed 10–21–11; 8:45 am]
BILLING CODE 7510–13–P
NATIONAL AERONAUTICS AND
SPACE ADMINISTRATION
the public for inspection and, to the
extent permitted by law, will not be
released under the Freedom of
Information Act, 5 U.S.C. 552.
ADDRESSES: Objections relating to the
prospective license may be submitted to
Mr. James J. McGroary, Chief Patent
Counsel/LS01, Marshall Space Flight
Center, Huntsville, AL 35812, (256)
544–0013.
FOR FURTHER INFORMATION CONTACT:
Sammy A. Nabors, Technology Transfer
Office/ED10, Marshall Space Flight
Center, Huntsville, AL 35812, (256)
544–5226. Information about other
NASA inventions available for licensing
can be found online at https://
technology.nasa.gov.
Dated: October 18, 2011.
Richard W. Sherman,
Deputy General Counsel.
[Notice 11–102]
Notice of intent to grant exclusive
license
[FR Doc. 2011–27465 Filed 10–21–11; 8:45 am]
National Aeronautics and
Space Administration.
ACTION: Notice of intent to grant
exclusive license.
BILLING CODE 7510–13–P
This notice is issued in
accordance with 35 U.S.C. 209(e) and 37
CFR 404.7(a)(1)(i). NASA hereby gives
notice of its intent to grant an exclusive
license in the United States to practice
the invention described and claimed in
MFS–32870–1 ‘‘Greener ElectroMechanical Slide Valve’’ to QM Power,
Inc, having its principal place of
business in Lee’s Summit, MO. The
intellectual property rights in this
invention have been assigned to the
United States of America as represented
by the Administrator of the National
Aeronautics and Space Administration.
The prospective exclusive license will
comply with the terms and conditions
of 35 U.S.C. 209 and 37 CFR 404.7.
NASA has not yet made a determination
to grant the requested license and may
deny the requested license even if no
objections are submitted within the
comment period.
DATES: The prospective exclusive
license may be granted unless, within
fifteen (15) days from the date of this
published notice, NASA receives
written objections including evidence
and argument that establish that the
grant of the license would not be
consistent with the requirements of
35 U.S.C. 209 and 37 CFR 404.7.
Competing applications completed and
received by NASA within fifteen (15)
days of the date of this published notice
will also be treated as objections to the
grant of the contemplated exclusive
license.
Objections submitted in response to
this notice will not be made available to
[Notice (11–103)]
AGENCY:
tkelley on DSK3SPTVN1PROD with NOTICES
SUMMARY:
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NATIONAL AERONAUTICS AND
SPACE ADMINISTRATION
Notice of intent to grant exclusive
license
National Aeronautics and
Space Administration.
ACTION: Notice of intent to grant
exclusive license.
AGENCY:
This notice is issued in
accordance with 35 U.S.C. 209(e) and
37 CFR 404.7(a)(1)(i). NASA hereby
gives notice of its intent to grant an
exclusive license in the United States to
practice the inventions described and
claimed in U.S. Patent No. 7,341,883 B2
entitled ‘‘Silicon Germanium
Semiconductive Alloy and Method of
Fabricating Same,’’ U.S. Patent No.
7,514,726 B2 entitled ‘‘Graded Index
Silicon Germanium on Lattice Matched
Silicon Germanium Semiconductive
Alloy,’’ U.S. Patent No. 7,558,371 B2
entitled ‘‘Method of Generating X–Ray
Diffraction Data for Integral Detection of
Twin Defects in Super-Hetero-Epitaxial
Materials,’’ U.S. Patent No. 7,906,358 B2
entitled ‘‘Epitaxial Growth of Cubic
Crystalline Semiconductor Alloys on
Basal Plane of Trigonal or Hexagonal
Crystal,’’ U.S. Patent Application No.
12/254,134 entitled ‘‘Hybrid Bandgap
Engineering for Super-Hetero-Epitaxial
Semiconductor Materials, and Products
Thereof,’’ U.S. Patent Application No.
12/288,379 entitled ‘‘Rhombohedral
Cubic Semiconductor Materials on
Trigonal Substrate with Single Crystal
Properties and Devices Based on Such
Materials,’’ U.S. Patent No. 7,769,135 B2
SUMMARY:
PO 00000
Frm 00071
Fmt 4703
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65751
entitled ‘‘X-ray Diffraction Wafer
Mapping Method for Rhombohedral
Super-Hetero-Epitaxy; and U.S. Patent
Application No. 12/254,016 entitled
‘‘Thermoelectric Materials and
Devices,’’ to innoEpi Incorporated
having its principal place of business in
Santa Clara, California. The patent
rights in these inventions have been
assigned to the United States of America
as represented by the Administrator of
the National Aeronautics and Space
Administration. The prospective
exclusive license will comply with the
terms and conditions of 35 U.S.C. 209
and 37 CFR 404.7.
The prospective exclusive
license may be granted unless, within
fifteen (15) days from the date of this
published notice, NASA receives
written objections including evidence
and argument that establish that the
grant of the license would not be
consistent with the requirements of
35 U.S.C. 209 and 37 CFR 404.7.
Competing applications completed and
received by NASA within fifteen (15)
days of the date of this published notice
will also be treated as objections to the
grant of the contemplated partially
exclusive license.
Objections submitted in response to
this notice will not be made available to
the public for inspection and, to the
extent permitted by law, will not be
released under the Freedom of
Information Act, 5 U.S.C. 552.
DATES:
Objections relating to the
prospective license may be submitted to
Patent Attorney, Office of Chief
Counsel, NASA Langley Research
Center, MS 30, Hampton, VA 23681;
(757) 864–5057 (phone), (757) 864–9190
(fax).
ADDRESSES:
FOR FURTHER INFORMATION CONTACT:
Thomas K. McBride Jr., Patent Attorney,
Office of Chief Counsel, NASA Langley
Research Center, MS 30, Hampton, VA
23681; (757) 864–5057; Fax: (757) 864–
9190. Information about other NASA
inventions available for licensing can be
found online at https://
technology.nasa.gov.
Dated: October 18, 2011.
Richard W. Sherman,
Deputy General Counsel.
[FR Doc. 2011–27464 Filed 10–21–11; 8:45 am]
BILLING CODE 7510–13–P
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24OCN1
Agencies
[Federal Register Volume 76, Number 205 (Monday, October 24, 2011)]
[Notices]
[Page 65751]
From the Federal Register Online via the Government Printing Office [www.gpo.gov]
[FR Doc No: 2011-27464]
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NATIONAL AERONAUTICS AND SPACE ADMINISTRATION
[Notice (11-103)]
Notice of intent to grant exclusive license
AGENCY: National Aeronautics and Space Administration.
ACTION: Notice of intent to grant exclusive license.
-----------------------------------------------------------------------
SUMMARY: This notice is issued in accordance with 35 U.S.C. 209(e) and
37 CFR 404.7(a)(1)(i). NASA hereby gives notice of its intent to grant
an exclusive license in the United States to practice the inventions
described and claimed in U.S. Patent No. 7,341,883 B2 entitled
``Silicon Germanium Semiconductive Alloy and Method of Fabricating
Same,'' U.S. Patent No. 7,514,726 B2 entitled ``Graded Index Silicon
Germanium on Lattice Matched Silicon Germanium Semiconductive Alloy,''
U.S. Patent No. 7,558,371 B2 entitled ``Method of Generating X-Ray
Diffraction Data for Integral Detection of Twin Defects in Super-
Hetero-Epitaxial Materials,'' U.S. Patent No. 7,906,358 B2 entitled
``Epitaxial Growth of Cubic Crystalline Semiconductor Alloys on Basal
Plane of Trigonal or Hexagonal Crystal,'' U.S. Patent Application No.
12/254,134 entitled ``Hybrid Bandgap Engineering for Super-Hetero-
Epitaxial Semiconductor Materials, and Products Thereof,'' U.S. Patent
Application No. 12/288,379 entitled ``Rhombohedral Cubic Semiconductor
Materials on Trigonal Substrate with Single Crystal Properties and
Devices Based on Such Materials,'' U.S. Patent No. 7,769,135 B2
entitled ``X-ray Diffraction Wafer Mapping Method for Rhombohedral
Super-Hetero-Epitaxy; and U.S. Patent Application No. 12/254,016
entitled ``Thermoelectric Materials and Devices,'' to innoEpi
Incorporated having its principal place of business in Santa Clara,
California. The patent rights in these inventions have been assigned to
the United States of America as represented by the Administrator of the
National Aeronautics and Space Administration. The prospective
exclusive license will comply with the terms and conditions of 35
U.S.C. 209 and 37 CFR 404.7.
DATES: The prospective exclusive license may be granted unless, within
fifteen (15) days from the date of this published notice, NASA receives
written objections including evidence and argument that establish that
the grant of the license would not be consistent with the requirements
of 35 U.S.C. 209 and 37 CFR 404.7. Competing applications completed and
received by NASA within fifteen (15) days of the date of this published
notice will also be treated as objections to the grant of the
contemplated partially exclusive license.
Objections submitted in response to this notice will not be made
available to the public for inspection and, to the extent permitted by
law, will not be released under the Freedom of Information Act, 5
U.S.C. 552.
ADDRESSES: Objections relating to the prospective license may be
submitted to Patent Attorney, Office of Chief Counsel, NASA Langley
Research Center, MS 30, Hampton, VA 23681; (757) 864-5057 (phone),
(757) 864-9190 (fax).
FOR FURTHER INFORMATION CONTACT: Thomas K. McBride Jr., Patent
Attorney, Office of Chief Counsel, NASA Langley Research Center, MS 30,
Hampton, VA 23681; (757) 864-5057; Fax: (757) 864-9190. Information
about other NASA inventions available for licensing can be found online
at https://technology.nasa.gov.
Dated: October 18, 2011.
Richard W. Sherman,
Deputy General Counsel.
[FR Doc. 2011-27464 Filed 10-21-11; 8:45 am]
BILLING CODE 7510-13-P